Todd Bailey

1.1k total citations
39 papers, 804 citations indexed

About

Todd Bailey is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Todd Bailey has authored 39 papers receiving a total of 804 indexed citations (citations by other indexed papers that have themselves been cited), including 32 papers in Electrical and Electronic Engineering, 21 papers in Biomedical Engineering and 14 papers in Surfaces, Coatings and Films. Recurrent topics in Todd Bailey's work include Advancements in Photolithography Techniques (31 papers), Integrated Circuits and Semiconductor Failure Analysis (15 papers) and Nanofabrication and Lithography Techniques (11 papers). Todd Bailey is often cited by papers focused on Advancements in Photolithography Techniques (31 papers), Integrated Circuits and Semiconductor Failure Analysis (15 papers) and Nanofabrication and Lithography Techniques (11 papers). Todd Bailey collaborates with scholars based in United States, Japan and South Korea. Todd Bailey's co-authors include John G. Ekerdt, C. Grant Willson, S. V. Sreenivasan, Matthew Colburn, Stephen C. Johnson, Bernard Choi, Shilpa Damle, M. D. Stewart, Timothy B. Michaelson and Michael D. Wedlake and has published in prestigious journals such as Journal of Micro/Nanolithography MEMS and MOEMS, PubMed and Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena.

In The Last Decade

Todd Bailey

36 papers receiving 741 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Todd Bailey United States 11 668 598 215 90 55 39 804
K. Pfeiffer Germany 16 608 0.9× 513 0.9× 212 1.0× 92 1.0× 58 1.1× 56 781
Kevin J. Nordquist United States 17 541 0.8× 679 1.1× 243 1.1× 76 0.8× 74 1.3× 58 830
T. C. Bailey United States 12 791 1.2× 630 1.1× 267 1.2× 104 1.2× 68 1.2× 15 901
Gabi Grützner Germany 13 494 0.7× 351 0.6× 120 0.6× 86 1.0× 40 0.7× 31 593
M.J. Verheijen Netherlands 5 514 0.8× 405 0.7× 181 0.8× 71 0.8× 50 0.9× 11 583
David P. Mancini United States 14 489 0.7× 452 0.8× 153 0.7× 63 0.7× 31 0.6× 35 576
Hans Loeschner Austria 12 264 0.4× 384 0.6× 98 0.5× 121 1.3× 61 1.1× 73 534
Timothy B. Michaelson United States 5 447 0.7× 407 0.7× 153 0.7× 78 0.9× 24 0.4× 5 522
Arne Schleunitz Switzerland 11 336 0.5× 217 0.4× 93 0.4× 68 0.8× 23 0.4× 27 406
Theodor Nielsen Denmark 13 174 0.3× 958 1.6× 617 2.9× 85 0.9× 48 0.9× 44 1.2k

Countries citing papers authored by Todd Bailey

Since Specialization
Citations

This map shows the geographic impact of Todd Bailey's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Todd Bailey with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Todd Bailey more than expected).

Fields of papers citing papers by Todd Bailey

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Todd Bailey. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Todd Bailey. The network helps show where Todd Bailey may publish in the future.

Co-authorship network of co-authors of Todd Bailey

This figure shows the co-authorship network connecting the top 25 collaborators of Todd Bailey. A scholar is included among the top collaborators of Todd Bailey based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Todd Bailey. Todd Bailey is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Dadabayev, Alisher R., et al.. (2018). Addressing the Needs of Patients With Chronic Pain.. PubMed. 35(2). 43–49.
2.
Sun, Yuyang, et al.. (2018). SRAF requirements, relevance, and impact on EUV lithography for next-generation beyond 7nm node. 2017. 19–19. 2 indexed citations
3.
Wei, Alexander, Fan Jiang, Alexander Tritchkov, et al.. (2018). Lithographic benefits and mask manufacturability study of curvilinear masks. 26–26. 13 indexed citations
4.
5.
Chunder, Anindarupa, et al.. (2017). Separating the optical contributions to line-edge roughness in EUV lithography using stochastic simulations. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10146. 101460B–101460B. 10 indexed citations
6.
Biafore, John J., et al.. (2017). Optimization of stochastic EUV resist models parameters to mitigate line edge roughness. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101432B–101432B. 2 indexed citations
7.
Xu, Yongan, Ramya Viswanathan, Sean Burns, et al.. (2016). Lithographic qualification of high-transmission mask blank for 10nm node and beyond. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9780. 978006–978006. 1 indexed citations
8.
Halle, Scott, et al.. (2016). Methodology for determining critical dimension scanning electron microscope measurement condition of sub-20 nm resist patterns for 0.33 NA extreme ultraviolet lithography. Journal of Micro/Nanolithography MEMS and MOEMS. 15(4). 44001–44001. 1 indexed citations
9.
Halle, Scott, et al.. (2015). Application of SEM-based contours for OPC model weighting and sample plan reduction. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9426. 94260Y–94260Y. 3 indexed citations
10.
Madan, Anita, et al.. (2014). Multitechnique metrology methods for evaluating pitch walking in 14 nm and beyond FinFETs. Journal of Micro/Nanolithography MEMS and MOEMS. 13(4). 41411–41411. 10 indexed citations
11.
Rana, Narender, et al.. (2014). Leveraging advanced data analytics, machine learning, and metrology models to enable critical dimension metrology solutions for advanced integrated circuit nodes. Journal of Micro/Nanolithography MEMS and MOEMS. 13(4). 41415–41415. 18 indexed citations
12.
Rana, Narender, et al.. (2014). Leveraging data analytics, patterning simulations and metrology models to enhance CD metrology accuracy for advanced IC nodes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9050. 905005–905005. 1 indexed citations
13.
Bailey, Todd, et al.. (2011). 3D lithography modeling for ground rule development. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7973. 797315–797315. 1 indexed citations
14.
Bailey, Todd, Derren Dunn, Emily Gallagher, et al.. (2010). Physical resist model calibration for implant level using laser-written photomasks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7823. 78230U–78230U. 1 indexed citations
15.
Talbi, Mohammed, et al.. (2010). Three-dimensional physical photoresist model calibration and profile-based pattern verification. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7640. 76401D–76401D. 4 indexed citations
16.
Bailey, Todd, et al.. (2009). Message to the undecided: using DUV dBARC for 32 nm node implants. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7273. 72730Y–72730Y. 3 indexed citations
17.
Colburn, Matthew, Annette Grot, Byung Jin Choi, et al.. (2001). Patterning nonflat substrates with a low pressure, room temperature, imprint lithography process. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 19(6). 2162–2172. 47 indexed citations
18.
Colburn, Matthew, Byung Jin Choi, Mario Meissl, et al.. (2001). Characterization and modeling of volumetric and mechanical properties for step and flash imprint lithography photopolymers. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 19(6). 2685–2689. 55 indexed citations
19.
Choi, Byung Jin, Mario Meissl, Matthew Colburn, et al.. (2001). <title>Layer-to-layer alignment for step and flash imprint lithography</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4343. 436–442. 11 indexed citations
20.
Colburn, Matthew, Stephen C. Johnson, M. D. Stewart, et al.. (1999). Step and flash imprint lithography: a new approach to high-resolution patterning. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3676. 379–379. 428 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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