Todd Bailey

1.1k citations
39 papers · 806 · h-index 11

Impact in

Papers in

Journals
Journal of Micro/Nanolithography MEMS and MOEMS (5 papers)Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena (2 papers)PubMed (1 paper)Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (27 papers)

In The Last Decade

Todd Bailey

36 papers receiving 746 citations

Peers

Todd Bailey
Comparison fields: 5 of 42
  • Biomedical Engineering 666
  • Surfaces, Coatings and Films 91
  • Electrical and Electronic Engineering 596
  • Atomic and Molecular Physics, and Optics 214
  • Structural Biology 4
Replace Kevin J. Nordquist with:
Kevin J. Nordquist United States
G. M. Cohen United States
Arne Schleunitz Switzerland
J. Foucher France
K. Pfeiffer Germany
Harold Dekkers Belgium
Leonardus H. A. Leunissen Belgium
T. C. Bailey United States
W. H. Teh United States
Hans Loeschner Austria
Todd Bailey relative to Kevin J. Nordquist United States Kevin J. Nordquist's profile →
Citations per field
00.5×
Kevin J. Nordquist · 1×
Citations per year

Countries citing papers authored by Todd Bailey

Since Specialization
Citations

This map shows the geographic impact of Todd Bailey's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Todd Bailey with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Todd Bailey more than expected).

Fields of papers citing papers by Todd Bailey

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Todd Bailey. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Todd Bailey. The network helps show where Todd Bailey may publish in the future.

Co-authors

The 25 scholars most cited alongside Todd Bailey, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Todd Bailey Line = papers co-authored together Todd Bailey links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown

Showing the 20 most-cited of 39 papers — load more, or switch the sort, to bring in the rest.

#Work
1 1999428
2 200062
3 200155
4 200147
5 200239
6 200321
7 201418
8 200316
9 201814
10 200111
11 201410
12 201710
13 201710
14 20087
15 20146
16 20156
17 20185
18 20104
19 20104
20 20103

About Todd Bailey

Todd Bailey is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering, Surfaces, Coatings and Films, Industrial and Manufacturing Engineering and Atomic and Molecular Physics, and Optics, having authored 39 papers that have together received 806 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (31 papers), Integrated Circuits and Semiconductor Failure Analysis (15 papers), Nanofabrication and Lithography Techniques (11 papers), Electron and X-Ray Spectroscopy Techniques (10 papers), Advanced Surface Polishing Techniques (9 papers), Industrial Vision Systems and Defect Detection (5 papers), Force Microscopy Techniques and Applications (4 papers) and Optical Coatings and Gratings (4 papers). The work is most often cited by research in Biomedical Engineering (666 citations), Surfaces, Coatings and Films (91 citations), Electrical and Electronic Engineering (596 citations), Atomic and Molecular Physics, and Optics (214 citations) and Structural Biology (4 citations). Todd Bailey has collaborated with scholars based in United States, Japan and South Korea. Frequent co-authors include John G. Ekerdt, C. Grant Willson, S. V. Sreenivasan, Matthew Colburn, Stephen C. Johnson, Michael D. Wedlake, Timothy B. Michaelson, M. D. Stewart, Bernard Choi and Shilpa Damle. Their work appears in journals such as Journal of Micro/Nanolithography MEMS and MOEMS, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena, PubMed and Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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