T. C. Bailey

1.2k total citations
15 papers, 901 citations indexed

About

T. C. Bailey is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, T. C. Bailey has authored 15 papers receiving a total of 901 indexed citations (citations by other indexed papers that have themselves been cited), including 13 papers in Electrical and Electronic Engineering, 13 papers in Biomedical Engineering and 5 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in T. C. Bailey's work include Nanofabrication and Lithography Techniques (13 papers), Advancements in Photolithography Techniques (12 papers) and Force Microscopy Techniques and Applications (5 papers). T. C. Bailey is often cited by papers focused on Nanofabrication and Lithography Techniques (13 papers), Advancements in Photolithography Techniques (12 papers) and Force Microscopy Techniques and Applications (5 papers). T. C. Bailey collaborates with scholars based in United States. T. C. Bailey's co-authors include C. Grant Willson, John G. Ekerdt, S. V. Sreenivasan, Matthew Colburn, Byung Jin Choi, Mario Meissl, S. V. Sreenivasan, Kevin J. Nordquist, David P. Mancini and Stephen Johnson and has published in prestigious journals such as Langmuir, Microelectronic Engineering and Journal of Photopolymer Science and Technology.

In The Last Decade

T. C. Bailey

15 papers receiving 839 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
T. C. Bailey United States 12 791 630 267 104 68 15 901
Kevin J. Nordquist United States 17 541 0.7× 679 1.1× 243 0.9× 76 0.7× 74 1.1× 58 830
William J. Dauksher United States 20 632 0.8× 964 1.5× 269 1.0× 115 1.1× 157 2.3× 86 1.1k
Yoshikazu Matsui Japan 19 1.1k 1.3× 541 0.9× 145 0.5× 52 0.5× 52 0.8× 46 1.2k
B. Vratzov Germany 12 401 0.5× 296 0.5× 160 0.6× 76 0.7× 49 0.7× 19 544
Xiaoyun Sun China 11 341 0.4× 271 0.4× 178 0.7× 60 0.6× 93 1.4× 21 531
G J Ensell United Kingdom 13 316 0.4× 376 0.6× 139 0.5× 21 0.2× 63 0.9× 33 588
A. Kaminski France 16 234 0.3× 825 1.3× 250 0.9× 66 0.6× 335 4.9× 44 963
M. Tortonese United States 12 311 0.4× 485 0.8× 831 3.1× 50 0.5× 72 1.1× 14 967
H. H. Harary United States 8 393 0.5× 415 0.7× 626 2.3× 40 0.4× 145 2.1× 10 793
C. Bainier France 13 453 0.6× 359 0.6× 360 1.3× 159 1.5× 100 1.5× 26 721

Countries citing papers authored by T. C. Bailey

Since Specialization
Citations

This map shows the geographic impact of T. C. Bailey's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by T. C. Bailey with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites T. C. Bailey more than expected).

Fields of papers citing papers by T. C. Bailey

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by T. C. Bailey. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by T. C. Bailey. The network helps show where T. C. Bailey may publish in the future.

Co-authorship network of co-authors of T. C. Bailey

This figure shows the co-authorship network connecting the top 25 collaborators of T. C. Bailey. A scholar is included among the top collaborators of T. C. Bailey based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with T. C. Bailey. T. C. Bailey is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

15 of 15 papers shown
1.
Bailey, T. C., et al.. (2007). Evaluation of ArF lithography for 45-nm node implant layers. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6519. 65190S–65190S. 3 indexed citations
2.
Wu, Kangbing, T. C. Bailey, C. Grant Willson, & John G. Ekerdt. (2005). Surface Hydration and Its Effect on Fluorinated SAM Formation on SiO2 Surfaces. Langmuir. 21(25). 11795–11801. 43 indexed citations
3.
Gil, Darı́o, T. C. Bailey, Dan Corliss, et al.. (2005). First microprocessors with immersion lithography. 10–10. 10 indexed citations
4.
Chang, Chih‐Hao, Ralf K. Heilmann, E. Murphy, et al.. (2003). Fabrication of sawtooth diffraction gratings using nanoimprint lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 21(6). 2755–2759. 35 indexed citations
5.
Resnick, Douglas J., William J. Dauksher, David P. Mancini, et al.. (2003). Imprint lithography for integrated circuit fabrication. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 21(6). 2624–2631. 92 indexed citations
6.
Resnick, Douglas J., David P. Mancini, William J. Dauksher, et al.. (2003). Improved step and flash imprint lithography templates for nanofabrication. Microelectronic Engineering. 69(2-4). 412–419. 23 indexed citations
7.
Johnson, Stephen, Douglas J. Resnick, David P. Mancini, et al.. (2003). Fabrication of multi-tiered structures on step and flash imprint lithography templates. Microelectronic Engineering. 67-68. 221–228. 16 indexed citations
8.
Mancini, David P., Kevin J. Nordquist, Douglas J. Resnick, et al.. (2002). Hydrogen silsesquioxane for direct electron-beam patterning of step and flash imprint lithography templates. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 20(6). 2896–2901. 37 indexed citations
9.
Bailey, T. C., et al.. (2002). Step and Flash Imprint Lithography: An Efficient Nanoscale Printing Technology.. Journal of Photopolymer Science and Technology. 15(3). 481–486. 63 indexed citations
10.
Bailey, T. C., Douglas J. Resnick, David P. Mancini, et al.. (2002). Template fabrication schemes for step and flash imprint lithography. Microelectronic Engineering. 61-62. 461–467. 88 indexed citations
11.
Dauksher, William J., Kevin J. Nordquist, David P. Mancini, et al.. (2002). Characterization of and imprint results using indium tin oxide-based step and flash imprint lithography templates. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 20(6). 2857–2861. 29 indexed citations
12.
Bailey, T. C., Byung Jin Choi, Matthew Colburn, et al.. (2001). Step and flash imprint lithography: Defect analysis. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 19(6). 2806–2810. 46 indexed citations
13.
Choi, Byung Jin, Stephen Johnson, S. V. Sreenivasan, et al.. (2000). Partially Constrained Compliant Stages for High Resolution Imprint Lithography. 861–870. 3 indexed citations
14.
Bailey, T. C., Byung Jin Choi, Matthew Colburn, et al.. (2000). Step and flash imprint lithography: Template surface treatment and defect analysis. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(6). 3572–3577. 295 indexed citations
15.
Ruchhoeft, Paul, Matthew Colburn, Byung Jin Choi, et al.. (1999). Patterning curved surfaces: Template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 17(6). 2965–2969. 118 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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