M. Wissen

499 total citations
33 papers, 430 citations indexed

About

M. Wissen is a scholar working on Biomedical Engineering, Electrical and Electronic Engineering and Mechanics of Materials. According to data from OpenAlex, M. Wissen has authored 33 papers receiving a total of 430 indexed citations (citations by other indexed papers that have themselves been cited), including 33 papers in Biomedical Engineering, 25 papers in Electrical and Electronic Engineering and 10 papers in Mechanics of Materials. Recurrent topics in M. Wissen's work include Nanofabrication and Lithography Techniques (33 papers), Advancements in Photolithography Techniques (24 papers) and Microfluidic and Capillary Electrophoresis Applications (10 papers). M. Wissen is often cited by papers focused on Nanofabrication and Lithography Techniques (33 papers), Advancements in Photolithography Techniques (24 papers) and Microfluidic and Capillary Electrophoresis Applications (10 papers). M. Wissen collaborates with scholars based in Germany, Austria and Japan. M. Wissen's co-authors include Hella‐Christin Scheer, N. Bogdanski, H. Schulz, Yoshihiko Hirai, Takahiro Konishi, Joachim Zajadacz, T. Glinsner, K. Zimmer, G. Gruetzner and Andreas K. Bitz and has published in prestigious journals such as Japanese Journal of Applied Physics, Microelectronic Engineering and Journal of Photopolymer Science and Technology.

In The Last Decade

M. Wissen

33 papers receiving 423 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
M. Wissen Germany 12 412 255 175 76 29 33 430
Mario Meissl United States 7 487 1.2× 389 1.5× 165 0.9× 34 0.4× 25 0.9× 13 518
Hua Tan United States 6 301 0.7× 255 1.0× 114 0.7× 24 0.3× 18 0.6× 11 361
W. H. Juan United States 10 152 0.4× 228 0.9× 121 0.7× 41 0.5× 29 1.0× 21 318
W. Scholz Germany 9 194 0.5× 188 0.7× 189 1.1× 75 1.0× 91 3.1× 19 386
Jay Mody Belgium 13 230 0.6× 254 1.0× 189 1.1× 48 0.6× 154 5.3× 26 415
S. Greek Sweden 11 200 0.5× 302 1.2× 152 0.9× 108 1.4× 44 1.5× 18 393
Shigeki Nakao Japan 9 210 0.5× 182 0.7× 75 0.4× 67 0.9× 69 2.4× 15 321
H. A. C. Tilmans Belgium 8 143 0.3× 237 0.9× 107 0.6× 46 0.6× 47 1.6× 25 292
Y. Morand France 16 191 0.5× 690 2.7× 106 0.6× 52 0.7× 102 3.5× 72 741
N. Klymko United States 11 113 0.3× 364 1.4× 69 0.4× 46 0.6× 77 2.7× 25 422

Countries citing papers authored by M. Wissen

Since Specialization
Citations

This map shows the geographic impact of M. Wissen's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by M. Wissen with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites M. Wissen more than expected).

Fields of papers citing papers by M. Wissen

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by M. Wissen. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by M. Wissen. The network helps show where M. Wissen may publish in the future.

Co-authorship network of co-authors of M. Wissen

This figure shows the co-authorship network connecting the top 25 collaborators of M. Wissen. A scholar is included among the top collaborators of M. Wissen based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with M. Wissen. M. Wissen is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Scheer, Hella‐Christin, et al.. (2009). Potential and limitations of a T-NIL/UVL hybrid process. Microelectronic Engineering. 87(5-8). 851–853. 7 indexed citations
2.
Wissen, M., et al.. (2008). Strategies for hybrid techniques of UV lithography and thermal nanoimprint. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6792. 67920V–67920V. 7 indexed citations
3.
Wissen, M., et al.. (2008). Polymers below the critical molecular weight for thermal imprint lithography. Microelectronic Engineering. 85(5-6). 825–829. 10 indexed citations
4.
Bogdanski, N., et al.. (2007). Multiple replication of three dimensional structures with undercuts. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 25(1). 247–251. 11 indexed citations
5.
Scheer, Hella‐Christin, et al.. (2007). Impact of glass temperature for thermal nanoimprint. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 25(6). 2392–2395. 15 indexed citations
6.
Scheer, Hella‐Christin, et al.. (2007). Issues and Requirements of Polymers for Thermal NIL. Journal of Photopolymer Science and Technology. 20(4). 539–544. 6 indexed citations
7.
Wissen, M., et al.. (2007). Challenges of residual layer minimisation in thermal nanoimprint lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6533. 65330Q–65330Q. 5 indexed citations
8.
Wissen, M., et al.. (2006). Thermal imprint with negligibly low residual layer. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 24(6). 2998–3001. 34 indexed citations
9.
Wissen, M., et al.. (2006). Influence of light polarization on UV stabilization of prepatterned resists. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 24(6). 3006–3010. 1 indexed citations
10.
Schulz, H., et al.. (2005). Choice of the molecular weight of an imprint polymer for hot embossing lithography. Microelectronic Engineering. 78-79. 625–632. 29 indexed citations
11.
Schulz, H., et al.. (2005). Impact of molecular weight of polymers and shear rate effects for nanoimprint lithography. Microelectronic Engineering. 83(2). 259–280. 47 indexed citations
12.
Bogdanski, N., et al.. (2005). Temperature-reduced nanoimprint lithography for thin and uniform residual layers. Microelectronic Engineering. 78-79. 598–604. 32 indexed citations
13.
Scheer, Hella‐Christin, N. Bogdanski, M. Wissen, Takahiro Konishi, & Yoshihiko Hirai. (2005). Polymer time constants during low temperature nanoimprint lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 23(6). 2963–2966. 35 indexed citations
14.
Wissen, M.. (2004). UV curing of resists for warm embossing. Microelectronic Engineering. 73-74. 184–189. 6 indexed citations
15.
Wissen, M., H. Schulz, N. Bogdanski, et al.. (2004). Impact of residual layer uniformity on UV stabilization after embossing. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 22(6). 3224–3228. 5 indexed citations
16.
Wissen, M.. (2004). UV curing of resists for warm embossing. Microelectronic Engineering. 73-74. 184–189. 8 indexed citations
17.
Bogdanski, N., H. Schulz, M. Wissen, & Hella‐Christin Scheer. (2004). Dynamic mask defects in hot embossing lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5504. 197–197. 8 indexed citations
18.
Wissen, M., et al.. (2003). Impact of vacuum environment on the hot embossing process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5037. 211–211. 13 indexed citations
19.
Schulz, H., M. Wissen, & Hella‐Christin Scheer. (2003). Local mass transport and its effect on global pattern replication during hot embossing. Microelectronic Engineering. 67-68. 657–663. 47 indexed citations
20.
Schulz, H., et al.. (2002). Low-temperature wafer-scale warm embossing for mix and match with UV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4688. 223–223. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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