D. Barr

537 total citations
33 papers, 268 citations indexed

About

D. Barr is a scholar working on Electrical and Electronic Engineering, Computational Mechanics and Surfaces, Coatings and Films. According to data from OpenAlex, D. Barr has authored 33 papers receiving a total of 268 indexed citations (citations by other indexed papers that have themselves been cited), including 26 papers in Electrical and Electronic Engineering, 9 papers in Computational Mechanics and 9 papers in Surfaces, Coatings and Films. Recurrent topics in D. Barr's work include Integrated Circuits and Semiconductor Failure Analysis (12 papers), Ion-surface interactions and analysis (9 papers) and Electron and X-Ray Spectroscopy Techniques (9 papers). D. Barr is often cited by papers focused on Integrated Circuits and Semiconductor Failure Analysis (12 papers), Ion-surface interactions and analysis (9 papers) and Electron and X-Ray Spectroscopy Techniques (9 papers). D. Barr collaborates with scholars based in United States, United Kingdom and Netherlands. D. Barr's co-authors include T. Venkatesan, W. L. Brown, A. S. Oates, P. M. Petroff, Alfred Wagner, W. L. Brown, L. R. Harriott, W. S. Crane, K. Tai and Vincent Lamberti and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Review of Scientific Instruments.

In The Last Decade

D. Barr

32 papers receiving 235 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
D. Barr United States 10 202 96 80 55 50 33 268
R. E. Klinger United States 9 179 0.9× 104 1.1× 147 1.8× 22 0.4× 36 0.7× 20 300
M. S. Ameen United States 10 199 1.0× 61 0.6× 181 2.3× 61 1.1× 69 1.4× 31 331
Yukinori Kurogi Japan 12 326 1.6× 93 1.0× 125 1.6× 22 0.4× 72 1.4× 25 408
T. W. Hamilton United States 11 379 1.9× 46 0.5× 72 0.9× 77 1.4× 26 0.5× 16 407
S. C. McNevin United States 9 298 1.5× 106 1.1× 69 0.9× 23 0.4× 32 0.6× 18 346
Sergi Gomez United States 9 341 1.7× 24 0.3× 96 1.2× 31 0.6× 61 1.2× 9 387
M. Braunstein United States 9 179 0.9× 38 0.4× 122 1.5× 23 0.4× 37 0.7× 27 306
L. M. Ephrath United States 11 356 1.8× 74 0.8× 111 1.4× 37 0.7× 54 1.1× 16 400
M. Koike Japan 9 293 1.5× 53 0.6× 145 1.8× 63 1.1× 45 0.9× 34 423
T. Kinno Japan 11 116 0.6× 64 0.7× 163 2.0× 27 0.5× 158 3.2× 19 348

Countries citing papers authored by D. Barr

Since Specialization
Citations

This map shows the geographic impact of D. Barr's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D. Barr with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D. Barr more than expected).

Fields of papers citing papers by D. Barr

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by D. Barr. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D. Barr. The network helps show where D. Barr may publish in the future.

Co-authorship network of co-authors of D. Barr

This figure shows the co-authorship network connecting the top 25 collaborators of D. Barr. A scholar is included among the top collaborators of D. Barr based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with D. Barr. D. Barr is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Walraven, Jeremy A., Edward I. Cole, D. Barr, et al.. (2005). Backside preparation and failure analysis for packaged microelectromechanical systems (MEMS). Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5716. 165–165. 2 indexed citations
2.
Celler, G. K., D. Barr, & J. M. Rosamilia. (2003). Thinning of Si in SOI wafers by the SC1 standard clean. 114–115. 5 indexed citations
3.
Spolenak, Ralph, D. Barr, M. E. Gross, et al.. (2001). Microtexture and strain in electroplated copper interconnects. eScholarship (California Digital Library). 1 indexed citations
4.
Spolenak, Ralph, D. Barr, M. E. Gross, et al.. (2000). Microtexture and Strain in Electroplated Copper Interconnects. MRS Proceedings. 612. 11 indexed citations
5.
Vuong, H.-H., H.-J. Gossmann, Lourdes Pelaz, et al.. (1999). Boron pileup and clustering in silicon-on-insulator films. Applied Physics Letters. 75(8). 1083–1085. 17 indexed citations
6.
Gross, M. E., R. Drese, C. Lingk, et al.. (1999). Electroplated Damascene Copper: Process Influences on Recrystallization and Texture. MRS Proceedings. 562. 7 indexed citations
7.
Barr, D. & W. L. Brown. (1995). Contrast formation in focused ion beam images of polycrystalline aluminum. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 13(6). 2580–2583. 14 indexed citations
8.
Barr, D., W. L. Brown, Matthew A. Marcus, & Milton Ohring. (1995). Microtexture Measurements of Aluminum VLSI Metallization. MRS Proceedings. 391. 1 indexed citations
9.
Marcus, Matthew A., Raymond A. Cirelli, R. C. Kistler, et al.. (1994). X-Ray Strain Measurements in Fine-Line Patterned AL-CU Films. MRS Proceedings. 338. 8 indexed citations
10.
Barr, D., L. R. Harriott, & W. L. Brown. (1992). Focused ion beam observation of grain structure and precipitates in aluminum thin films. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(6). 3120–3125. 8 indexed citations
11.
Chu, C. H., et al.. (1992). FeGe liquid metal ion source for maskless isolation implants in InP. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(4). 1273–1276. 9 indexed citations
12.
Harriott, L. R., W. L. Brown, & D. Barr. (1990). Anticipated performance of achromatic quadrupole focusing systems when used with liquid metal ion sources. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 8(4). 3279–3283. 5 indexed citations
13.
Barr, D., D. J. Thomson, & W. L. Brown. (1988). A study of time and angle correlations in the ion emission from gallium liquid metal ion sources. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 6(1). 482–484. 1 indexed citations
14.
Barr, D., W. L. Brown, & David J. Thomson. (1988). EMISSION CURRENT DEPENDENCE IN THE TIME AND ANGLE NOISE SPECTRA OF GALLIUM LIQUID METAL ION SOURCES. Le Journal de Physique Colloques. 49(C6). C6–177. 3 indexed citations
15.
Macrander, Albert T., D. Barr, & Alfred Wagner. (1983). Resist Possibilities In Ion Beam Lithography. Optical Engineering. 22(2). 2 indexed citations
16.
Macrander, Albert T., D. Barr, & Alfred Wagner. (1982). <title>Resist Possibilities And Limitations In Ion Beam Lithography</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 333. 142–151. 4 indexed citations
17.
Venkatesan, T., et al.. (1982). Optical emission: A probe of neutral atoms in liquid-metal ion sources. Journal of Applied Physics. 53(1). 787–790. 2 indexed citations
18.
Venkatesan, T., et al.. (1981). Droplet emission in liquid metal ion sources. Journal of Vacuum Science and Technology. 19(4). 1186–1189. 34 indexed citations
19.
Venkatesan, T., Gary N. Taylor, Alfred Wagner, B. J. Wilkens, & D. Barr. (1981). Plasma-developed ion-implanted resists with submicron resolution. Journal of Vacuum Science and Technology. 19(4). 1379–1384. 9 indexed citations
20.
Venkatesan, T., et al.. (1981). Optical emission: A probe of neutral atoms in liquid-metal ion sources. Applied Physics Letters. 38(11). 943–945. 14 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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