Vadim Sidorkin

604 total citations
22 papers, 314 citations indexed

About

Vadim Sidorkin is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Materials Chemistry. According to data from OpenAlex, Vadim Sidorkin has authored 22 papers receiving a total of 314 indexed citations (citations by other indexed papers that have themselves been cited), including 13 papers in Electrical and Electronic Engineering, 11 papers in Surfaces, Coatings and Films and 7 papers in Materials Chemistry. Recurrent topics in Vadim Sidorkin's work include Electron and X-Ray Spectroscopy Techniques (11 papers), Advancements in Photolithography Techniques (9 papers) and Semiconductor materials and devices (5 papers). Vadim Sidorkin is often cited by papers focused on Electron and X-Ray Spectroscopy Techniques (11 papers), Advancements in Photolithography Techniques (9 papers) and Semiconductor materials and devices (5 papers). Vadim Sidorkin collaborates with scholars based in Netherlands, Russia and South Korea. Vadim Sidorkin's co-authors include E. van der Drift, H. W. M. Salemink, Paul F. A. Alkemade, Diederik Maas, Emile van Veldhoven, N. S. Faradzhev, Ranju Jung, Choong-Rae Cho, In-Kyeong Yoo and A.E. Grigorescu and has published in prestigious journals such as Thin Solid Films, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films and Microelectronic Engineering.

In The Last Decade

Vadim Sidorkin

20 papers receiving 298 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Vadim Sidorkin Netherlands 9 225 99 78 73 66 22 314
W.H. Bruenger Germany 9 191 0.8× 101 1.0× 110 1.4× 81 1.1× 65 1.0× 29 321
Shoko Manako Japan 11 303 1.3× 131 1.3× 63 0.8× 60 0.8× 16 0.2× 27 350
Zhengqing John Qi United States 10 224 1.0× 73 0.7× 302 3.9× 113 1.5× 11 0.2× 30 467
Vinzenz Friedli Switzerland 11 210 0.9× 90 0.9× 106 1.4× 196 2.7× 205 3.1× 13 441
L. P. Muray United States 12 316 1.4× 175 1.8× 81 1.0× 145 2.0× 15 0.2× 21 434
Anatoly G. Kolosko Russia 11 139 0.6× 105 1.1× 247 3.2× 14 0.2× 19 0.3× 71 317
Sarah R. McKibbin Sweden 13 415 1.8× 63 0.6× 268 3.4× 26 0.4× 7 0.1× 17 487
Marc Fouchier France 10 298 1.3× 134 1.4× 77 1.0× 38 0.5× 34 0.5× 36 372
S. Barnola France 15 467 2.1× 149 1.5× 238 3.1× 38 0.5× 25 0.4× 49 530
Kathleen Nafus Belgium 12 309 1.4× 155 1.6× 176 2.3× 107 1.5× 16 0.2× 69 409

Countries citing papers authored by Vadim Sidorkin

Since Specialization
Citations

This map shows the geographic impact of Vadim Sidorkin's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Vadim Sidorkin with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Vadim Sidorkin more than expected).

Fields of papers citing papers by Vadim Sidorkin

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Vadim Sidorkin. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Vadim Sidorkin. The network helps show where Vadim Sidorkin may publish in the future.

Co-authorship network of co-authors of Vadim Sidorkin

This figure shows the co-authorship network connecting the top 25 collaborators of Vadim Sidorkin. A scholar is included among the top collaborators of Vadim Sidorkin based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Vadim Sidorkin. Vadim Sidorkin is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Sidorkin, Vadim, et al.. (2014). Resist charging effect correction function qualification for photomasks production. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9235. 92350Z–92350Z. 2 indexed citations
2.
Veldhoven, Emile van, Vadim Sidorkin, P.F.A. Alkemade, et al.. (2010). Nanofabrication with a High Resolution Helium Ion Beam. Microscopy and Microanalysis. 16(S2). 202–203. 3 indexed citations
3.
Maas, Diederik, Emile van Veldhoven, Ping Chen, et al.. (2010). Nanofabrication with a helium ion microscope. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7638. 763814–763814. 38 indexed citations
4.
Alkemade, Paul F. A., Vadim Sidorkin, Ping Chen, et al.. (2010). Helium Ion Beam Processing for Nano- fabrication and Beam-Induced Chemistry. 2 indexed citations
5.
Sidorkin, Vadim. (2010). Resist and Exposure Processes for Sub-10-nm Electron and Ion Beam Lithography. Research Repository (Delft University of Technology). 3 indexed citations
6.
Scipioni, Larry, et al.. (2009). The helium ion microscope: Advances in technology and applications. TNO Repository. 41(12). 26–28. 13 indexed citations
7.
Sidorkin, Vadim, Emile van Veldhoven, E. van der Drift, et al.. (2009). Sub-10-nm nanolithography with a scanning helium beam. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 27(4). L18–L20. 105 indexed citations
8.
Sidorkin, Vadim, et al.. (2009). Method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 27(6). 2503–2507. 3 indexed citations
9.
Faradzhev, N. S. & Vadim Sidorkin. (2009). Hydrogen mediated transport of Sn to Ru film surface. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 27(2). 306–314. 23 indexed citations
10.
Sidorkin, Vadim, et al.. (2009). Resist thickness effects on ultra thin HSQ patterning capabilities. Microelectronic Engineering. 86(4-6). 749–751. 26 indexed citations
11.
Sidorkin, Vadim, E. van der Drift, & H. W. M. Salemink. (2008). Influence of hydrogen silsesquioxane resist exposure temperature on ultrahigh resolution electron beam lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 26(6). 2049–2053. 9 indexed citations
12.
Sidorkin, Vadim, et al.. (2008). Towards 2–10nm electron-beam lithography: A quantitative approach. Microelectronic Engineering. 85(5-6). 805–809. 10 indexed citations
13.
Bourim, El Mostafa, et al.. (2006). Pyroelectric electron emission from −Z face polar surface of lithium niobate monodomain single crystal. Journal of Electroceramics. 17(2-4). 479–485. 7 indexed citations
14.
Sidorkin, Vadim, et al.. (2006). Electron-beam focusing in 1:1 electron projection lithography system. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 24(1). 224–230. 1 indexed citations
15.
Бочарова, И. А., et al.. (2006). Dispersion of Dielectric Permittivity in Thin Ferroelectric Lead Titanate Films. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 115. 233–238. 3 indexed citations
16.
Sidorkin, A. S., et al.. (2005). Switching current in thin ferroelectric lead titanate films. Journal de Physique IV (Proceedings). 126. 81–84. 3 indexed citations
17.
Cho, Choong-Rae, et al.. (2005). Current-induced metal–insulator transition in VOx thin film prepared by rapid-thermal-annealing. Thin Solid Films. 495(1-2). 375–379. 52 indexed citations
18.
Sidorkin, A. S., et al.. (2003). Electron Emission of Ferroelectrics. Ferroelectrics. 295(1). 55–66. 1 indexed citations
19.
Sidorkin, A. S., et al.. (2003). Synthesis and Study of Dielectric Properties of PbTiO 3 Thin Films. Ferroelectrics. 286(1). 335–342. 8 indexed citations
20.
Sidorkin, A. S., et al.. (2003). Frequency Dependence of Coercive Field for Lateral Movement of Domain Wall in 180-Degree Ferroelectrics. Ferroelectrics. 290(1). 193–198. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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