Shoko Manako

458 total citations
27 papers, 350 citations indexed

About

Shoko Manako is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Shoko Manako has authored 27 papers receiving a total of 350 indexed citations (citations by other indexed papers that have themselves been cited), including 26 papers in Electrical and Electronic Engineering, 12 papers in Biomedical Engineering and 9 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Shoko Manako's work include Advancements in Photolithography Techniques (18 papers), Integrated Circuits and Semiconductor Failure Analysis (11 papers) and Photonic and Optical Devices (7 papers). Shoko Manako is often cited by papers focused on Advancements in Photolithography Techniques (18 papers), Integrated Circuits and Semiconductor Failure Analysis (11 papers) and Photonic and Optical Devices (7 papers). Shoko Manako collaborates with scholars based in Japan, United States and Taiwan. Shoko Manako's co-authors include Yukinori Ochiai, Jun‐ichi Fujita, Eiichi Nomura, M. Mori, Ryohei Takei, Youichi Sakakibara, Emiko Omoda, Toshihiro Kamei, Masao Suzuki and Y. Ohnishi and has published in prestigious journals such as Applied Physics Letters, Optics Express and Nanotechnology.

In The Last Decade

Shoko Manako

25 papers receiving 339 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Shoko Manako Japan 11 303 131 93 63 60 27 350
R. Moosburger Germany 12 450 1.5× 65 0.5× 200 2.2× 40 0.6× 69 1.1× 19 498
W.H. Bruenger Germany 9 191 0.6× 101 0.8× 85 0.9× 110 1.7× 81 1.4× 29 321
Ruilong Xie Singapore 9 404 1.3× 96 0.7× 124 1.3× 208 3.3× 26 0.4× 20 512
Ming-Chang M. Lee Taiwan 13 488 1.6× 121 0.9× 304 3.3× 76 1.2× 31 0.5× 49 550
Zhengqing John Qi United States 10 224 0.7× 73 0.6× 84 0.9× 302 4.8× 113 1.9× 30 467
Kimiyoshi Deguchi Japan 10 285 0.9× 170 1.3× 38 0.4× 25 0.4× 95 1.6× 37 356
Marc Fouchier France 10 298 1.0× 134 1.0× 143 1.5× 77 1.2× 38 0.6× 36 372
M. Koike Japan 13 369 1.2× 71 0.5× 90 1.0× 140 2.2× 11 0.2× 34 429
R. Yoshimura Japan 11 395 1.3× 106 0.8× 84 0.9× 39 0.6× 10 0.2× 36 471
F. Hanawa Japan 14 535 1.8× 42 0.3× 142 1.5× 52 0.8× 27 0.5× 37 605

Countries citing papers authored by Shoko Manako

Since Specialization
Citations

This map shows the geographic impact of Shoko Manako's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Shoko Manako with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Shoko Manako more than expected).

Fields of papers citing papers by Shoko Manako

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Shoko Manako. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Shoko Manako. The network helps show where Shoko Manako may publish in the future.

Co-authorship network of co-authors of Shoko Manako

This figure shows the co-authorship network connecting the top 25 collaborators of Shoko Manako. A scholar is included among the top collaborators of Shoko Manako based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Shoko Manako. Shoko Manako is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Takei, Ryohei, Shoko Manako, Emiko Omoda, et al.. (2014). Sub-1 dB/cm submicrometer-scale amorphous silicon waveguide for backend on-chip optical interconnect. Optics Express. 22(4). 4779–4779. 38 indexed citations
2.
Takei, Ryohei, Shoko Manako, Emiko Omoda, et al.. (2014). Carrier injection refractive index changes in low-temperature grown silicon waveguide. 239–240. 2 indexed citations
3.
Takei, Ryohei, Shoko Manako, Emiko Omoda, et al.. (2014). Highly transpearent submicrometer-sclae amorphous silicon waveguide for backend optical interconnect. 135–136. 1 indexed citations
4.
Takei, Ryohei, Masao Suzuki, Emiko Omoda, et al.. (2013). Silicon knife-edge taper waveguide for ultralow-loss spot-size converter fabricated by photolithography. Applied Physics Letters. 102(10). 41 indexed citations
5.
Takei, Ryohei, Emiko Omoda, Masao Suzuki, et al.. (2012). Ultranarrow Silicon Inverse Taper Waveguide Fabricated with Double-Patterning Photolithography for Low-Loss Spot-Size Converter. Applied Physics Express. 5(5). 52202–52202. 20 indexed citations
6.
Manako, Shoko, et al.. (2000). High-purity, ultrahigh-resolution calixarene electron-beam negative resist. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(6). 3424–3427. 10 indexed citations
7.
Ochiai, Yukinori, et al.. (2000). High-resolution, High-purity Calix[n]arene Electron Beam Resist.. Journal of Photopolymer Science and Technology. 13(3). 413–417. 22 indexed citations
8.
Yamashita, Hiroshi, et al.. (1999). Proximity effect correction by the GHOST method using a scattering stencil mask. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 17(6). 2860–2863. 2 indexed citations
9.
Ochiai, Yukinori, Shoko Manako, Jun‐ichi Fujita, & Eiichi Nomura. (1999). High resolution organic resists for charged particle lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 17(3). 933–938. 19 indexed citations
10.
Sone, J., Jun‐ichi Fujita, Yukinori Ochiai, et al.. (1999). Nanofabrication toward sub-10 nm and its application to novel nanodevices. Nanotechnology. 10(2). 135–141. 35 indexed citations
11.
Fujita, Jun‐ichi, Y. Ohnishi, Shoko Manako, et al.. (1998). Resolution of calixarene resist under low energy electron irradiation. Microelectronic Engineering. 41-42. 323–326. 9 indexed citations
12.
Manako, Shoko, Jun-ichi Fujita, Katsumi Tanigaki, Yukinori Ochiai, & Eiichi Nomura. (1998). Sub-10-nm Electron Beam Lithography Using a Poly(α-methylstyrene) Resist with a Molecular Weight of 650. Japanese Journal of Applied Physics. 37(12S). 6785–6785. 3 indexed citations
13.
Manako, Shoko, et al.. (1997). Nanometer-Scale Patterning of Polystyrene Resists in Low-Voltage Electron Beam Lithography. Japanese Journal of Applied Physics. 36(12S). 7773–7773. 19 indexed citations
14.
Fujita, Jun‐ichi, et al.. (1997). Calixarene Electron Beam Resist for Nano-Lithography. Japanese Journal of Applied Physics. 36(12S). 7769–7769. 34 indexed citations
15.
Ochiai, Yukinori, Shoko Manako, Seiji Samukawa, Kiyoshi Takeuchi, & T. Yamamoto. (1996). Accurate nano-EB lithography for 40-nm gate MOSFETs. Microelectronic Engineering. 30(1-4). 415–418. 15 indexed citations
16.
Ochiai, Yukinori, et al.. (1996). Fabrication of 40nm-gate MOSFETs by Nano-electron Beam Direct Writing.. Journal of Photopolymer Science and Technology. 9(4). 715–722.
17.
Matsui, S., Yukinori Ochiai, Masako Baba, et al.. (1995). Nanolithography Developed Through Electron Beam Induced Surface Reaction. MRS Proceedings. 380. 2 indexed citations
18.
Fujita, Jun, et al.. (1995). Sub-10 nm lithography and development properties of inorganic resist by scanning electron beam. Applied Physics Letters. 66(22). 3064–3066. 19 indexed citations
19.
Manako, Shoko, et al.. (1994). Nanolithography Using a Chemically Amplified Negative Resist by Electron Beam Exposure. Japanese Journal of Applied Physics. 33(12S). 6993–6993. 9 indexed citations
20.
Ochiai, Yukinori, et al.. (1993). Nanometer-Scale Direct Carbon Mask Fabrication Using Electron-Beam-Assisted Deposition. Japanese Journal of Applied Physics. 32(12S). 6147–6147. 9 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Rankless by CCL
2026