D. V. Tsu

2.7k citations

63 papers · 2.2k indexed · h-index 22

Impact in

Electrical and Electronic Engineering top 2%
- Thin-Film Transistor Technologies
- Semiconductor materials and devices
- Silicon and Solar Cell Technologies
Materials Chemistry top 5%
- Silicon Nanostructures and Photoluminescence
- ZnO doping and properties
- Diamond and Carbon-based Materials Research

Papers in

Electrical and Electronic Engineering 59
- Thin-Film Transistor Technologies 42
- Semiconductor materials and devices 30
- Silicon and Solar Cell Technologies 17
- Chalcogenide Semiconductor Thin Films 4
Materials Chemistry 40
- Silicon Nanostructures and Photoluminescence 27
- Diamond and Carbon-based Materials Research 6
- Phase-change materials and chalcogenides 5
- ZnO doping and properties 5

Co-authors: G. Lucovsky B. N. Davidson M. J. Mantini R. J. Markunas P. D. Richard Stanford R. Ovshinsky Jeffrey Yang Jeremy Theil
Journals: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (19 papers)Journal of Non-Crystalline Solids (9 papers)Physical review. B, Condensed matter (3 papers)Applied Physics Letters (2 papers)Diamond and Related Materials (2 papers)
Partner nations: United States Austria Mexico

In The Last Decade

D. V. Tsu

62 papers receiving 2.1k citations

Peers

Countries citing papers authored by D. V. Tsu

Since Specialization

Citations

This map shows the geographic impact of D. V. Tsu's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by D. V. Tsu with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites D. V. Tsu more than expected).

Fields of papers citing papers by D. V. Tsu

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by D. V. Tsu. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by D. V. Tsu. The network helps show where D. V. Tsu may publish in the future.

Co-authorship network

The 25 scholars most cited alongside D. V. Tsu, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with D. V. Tsu Line = papers co-authored together D. V. Tsu links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Germanium: the good, the bad, and the ugly, howd-orbitalscan ruin materials or create new opportunities Waves in Random and Complex Media ·D. V. Tsu, Robert O. Miller	2014	1
2	All optical broadband steering by phase angle controlled stationary element (PACSE) mirrors Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·D. V. Tsu, Robert O. Miller, Abdullah demirci	2006	1
3	Intermediate order in tetrahedrally coordinated silicon: evidence for chainlike objects Solar Energy Materials and Solar Cells ·D. V. Tsu, Maya El-Auwad, S.J. Jones	2003	17
4	Heterogeneity in hydrogenated silicon: Evidence for intermediately ordered chainlike objects Physical review. B, Condensed matter ·D. V. Tsu, Maya El-Auwad, Stanford R. Ovshinsky, S.J. Jones, Jeffrey Yang, Subhendu Guha, Raphael Tsu	2001	32
5	Use of A GAS Jet Technique to Prepare Microcrystalline Silicon Based Solar Cells at High I-Layer Deposition Rates MRS Proceedings ·S.J. Jones, Warakij LIKITYINGWARA, Xingqiao Deng, Susan Valarie Jhonny, R. F. Kopf, Mark A.J. Crane, D. V. Tsu, David B. Yoffie	1999	4
6	Obtaining optical constants of thin GexSbyTez films from measurements of reflection and transmission Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·D. V. Tsu	1999	29
7	Preparation and properties of SiO2–SiOx heterostructures formed by uninterrupted processing by remote plasma enhanced chemical vapor deposition Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·D. V. Tsu, Xuan Ren, Jeremy Theil, Elizabeth Hartnick, G. Lucovsky	1990	10
8	Formation Of Silicon-Based Heterostructures In Multichamber Integrated-Processing Thin-Film Deposition Systems Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·G. Lucovsky, Азау Шакроевна Келехсаева, D. V. Tsu, Gregory N. Parsons, J. T. Fitch	1990	1
9	Formation of silicon-based heterostructures in multichamber integrated-processing thin-film deposition systems Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·G. Lucovsky, Азау Шакроевна Келехсаева, D. V. Tsu, Gregory N. Parsons, J. T. Fitch	1990	2
10	Defects in a-Si:H films produced by remote plasma enhanced chemical vapor deposition Journal of Non-Crystalline Solids ·Gregory N. Parsons, D. V. Tsu, G. Lucovsky	1989	3
11	The effects of subcutaneous oxidation at the interfaces between elemental and compound semiconductors and SiO2 thin films deposited by remote plasma enhanced chemical vapor deposition Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ·G. Lucovsky, Andrew R. Winters, D. V. Tsu, G. G. Fountain, R. J. Markunas	1989	32
12	Annealing study of the infrared absorption in an amorphous silicon dioxide film Journal of Non-Crystalline Solids ·Zhipeng Yin, D. V. Tsu, G. Lucovsky, F. W. Smith	1989	13
13	Formation of thin film dielectrics by remote plasma-enhanced chemical-vapor deposition (remote PECVD) Applied Surface Science ·G. Lucovsky, D. V. Tsu, Sandra Juriševič, R. J. Markunas, G. G. Fountain	1989	16
14	Effects of the nearest neighbors and the alloy matrix on SiH stretching vibrations in the amorphousSiOr:H (0<r<2) alloy system Physical review. B, Condensed matter ·D. V. Tsu, G. Lucovsky, B. N. Davidson	1989	366
15	Atomic structure in SiO2 thin films deposited by remote plasma-enhanced chemical vapor deposition Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·G. Lucovsky, J. T. Fitch, D. V. Tsu, P.Th. van der Zeijden	1989	50
16	Multichamber Integrated Deposition System For Silicon Based Dielectric Films Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·G. Lucovsky, D. V. Tsu, Gregory N. Parsons, Savrieva Dilafruz Doutovna	1989	2
17	Deposition of device quality silicon dioxide thin films by remote plasma enhanced chemical vapor deposition Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Savrieva Dilafruz Doutovna, D. V. Tsu, G. Lucovsky	1988	30
18	Differences between direct and remote plasma enhanced CVD Journal of Non-Crystalline Solids ·G. Lucovsky, D. V. Tsu	1987	11
19	The Growth of Silicon Oxide Films by Remote Plasma Enhanced CVD MRS Proceedings ·D. V. Tsu, G. Lucovsky	1986	4
20	A study of electronic states in a-SiOx and a-SiNx thin films by infrared, auger electron and X-ray photoelectron spectroscopies Journal of Non-Crystalline Solids ·S. S. Chao, G. Lucovsky, 庄秋栄, Félix Barthe, P. D. Richard, D. V. Tsu, Yasuo Takagi, J. E. Keem, John E. Tyler, Miriam Hirsch	1985	13

About D. V. Tsu

D. V. Tsu is a scholar working on Electrical and Electronic Engineering, Materials Chemistry, Structural Biology, Surfaces, Coatings and Films and Condensed Matter Physics, having authored 63 papers that have together received 2.2k indexed citations. Recurring topics across this work include Thin-Film Transistor Technologies (42 papers), Semiconductor materials and devices (30 papers), Silicon Nanostructures and Photoluminescence (27 papers), Silicon and Solar Cell Technologies (17 papers), Diamond and Carbon-based Materials Research (6 papers), Phase-change materials and chalcogenides (5 papers), ZnO doping and properties (5 papers) and Chalcogenide Semiconductor Thin Films (4 papers). The work is most often cited by research in Electrical and Electronic Engineering (2.0k citations), Materials Chemistry (1.5k citations), Ceramics and Composites (131 citations), Surfaces, Coatings and Films (110 citations) and Electronic, Optical and Magnetic Materials (261 citations). D. V. Tsu has collaborated with scholars based in United States, Austria and Mexico. Frequent co-authors include G. Lucovsky, G. Lucovsky, B. N. Davidson, M. J. Mantini, R. J. Markunas, P. D. Richard, Stanford R. Ovshinsky, Jeffrey Yang, Jeremy Theil and B. S. Chao. Their work appears in journals such as Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Journal of Non-Crystalline Solids, Physical review. B, Condensed matter, Applied Physics Letters and Diamond and Related Materials.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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