Alfred Kersch

5.6k total citations · 2 hit papers
90 papers, 3.9k citations indexed

About

Alfred Kersch is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Alfred Kersch has authored 90 papers receiving a total of 3.9k indexed citations (citations by other indexed papers that have themselves been cited), including 69 papers in Electrical and Electronic Engineering, 46 papers in Materials Chemistry and 16 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Alfred Kersch's work include Ferroelectric and Negative Capacitance Devices (45 papers), Semiconductor materials and devices (42 papers) and MXene and MAX Phase Materials (27 papers). Alfred Kersch is often cited by papers focused on Ferroelectric and Negative Capacitance Devices (45 papers), Semiconductor materials and devices (42 papers) and MXene and MAX Phase Materials (27 papers). Alfred Kersch collaborates with scholars based in Germany, United States and South Korea. Alfred Kersch's co-authors include Thomas Mikolajick, Uwe Schroeder, Min Hyuk Park, Dominik Fischer, Christopher Künneth, Max Falkowski, Johannes Müller, Keum Do Kim, Young Hwan Lee and Han‐Joon Kim and has published in prestigious journals such as Advanced Materials, The Journal of Chemical Physics and Physical review. B, Condensed matter.

In The Last Decade

Alfred Kersch

87 papers receiving 3.8k citations

Hit Papers

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What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

Ferroelectricity and Antiferroelectricity of Doped Thin HfO₂‐Based Films

2015 904 citations Min Hyuk Park, Alfred Kersch et al. profile →
Stabilizing the ferroelectric phase in doped hafnium oxide

2015 481 citations Uwe Schroeder, Alfred Kersch et al. Journal of Applied Physics profile →

Peers

Countries citing papers authored by Alfred Kersch

Since Specialization

Citations

This map shows the geographic impact of Alfred Kersch's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Alfred Kersch with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Alfred Kersch more than expected).

Fields of papers citing papers by Alfred Kersch

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Alfred Kersch. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Alfred Kersch. The network helps show where Alfred Kersch may publish in the future.

Co-authorship network of co-authors of Alfred Kersch

This figure shows the co-authorship network connecting the top 25 collaborators of Alfred Kersch. A scholar is included among the top collaborators of Alfred Kersch based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Alfred Kersch. Alfred Kersch is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Interaction Between Strain and Phase Formation in Hf _x Zr _1‐x O ₂ Thin Films 2025 ·Small ·(unknown), (unknown), Alfred Kersch, (unknown), Yu‐Cheng Kao, Claudia Richter, (unknown), Thomas Mikolajick, Uwe Schroeder	2
2	Kinetic Monte Carlo simulation reveals defect charge accumulation favoring ferroelectric phase formation in Hf1−xZrxO2 thin films 2025 ·Journal of Applied Physics ·(unknown), (unknown), (unknown), (unknown), (unknown), Uwe Schroeder, Thomas Mikolajick, Alfred Kersch	0
3	Influence of Biaxial Strain and Interfacial Layer Growth on Ferroelectric Wake-Up and Phase Transition Fields in ZrO₂ 2024 ·ACS Applied Materials & Interfaces ·(unknown), (unknown), (unknown), Xuetao Wang, (unknown), Thomas Mikolajick, Uwe Schroeder, Alfred Kersch, Patrick D. Lomenzo	7
4	Impact of Hafnium Doping on Phase Transition, Interface, and Reliability Properties of Zr_xHf_1–xO₂-Based Capacitors 2024 ·ACS Applied Electronic Materials ·(unknown), (unknown), (unknown), Claudia Richter, Oliver Rehm, Lutz Baumgarten, Martina Müller, Thomas Mikolajick, Alfred Kersch, Uwe Schroeder	1
5	Strain-induced enhancement of surface self-diffusion on strontium titanate (001) surfaces 2024 ·Journal of Physics Condensed Matter ·(unknown), Alfred Kersch, (unknown)	1
6	Mechanism of Antiferroelectricity in Polycrystalline ZrO₂ 2024 ·Advanced Functional Materials ·(unknown), Patrick D. Lomenzo, Liam Collins, (unknown), (unknown), Thomas Mikolajick, Uwe Schroeder, Alfred Kersch	4
7	Discovery of Nanoscale Electric Field‐Induced Phase Transitions in ZrO₂ 2023 ·Advanced Functional Materials ·Patrick D. Lomenzo, Liam Collins, (unknown), (unknown), (unknown), Alexei Gruverman, Alfred Kersch, Thomas Mikolajick, Uwe Schroeder	27
8	The Electrode‐Ferroelectric Interface as the Primary Constraint on Endurance and Retention in HZO‐Based Ferroelectric Capacitors 2023 ·Advanced Functional Materials ·Ruben Alcala, Monica Materano, Patrick D. Lomenzo, (unknown), (unknown), Catherine Dubourdieu, Alfred Kersch, (unknown), Thomas Mikolajick, Uwe Schroeder	51
9	Influence of Si-Doping on 45 nm Thick Ferroelectric ZrO₂ Films 2022 ·ACS Applied Electronic Materials ·(unknown), Patrick D. Lomenzo, Alfred Kersch, Thomas Mikolajick, Uwe Schroeder	22
10	Piezo- and Pyroelectricity in Zirconia: A Study with Machine-Learned Force Fields 2022 ·Physical Review Applied ·(unknown), (unknown), (unknown), (unknown), Alfred Kersch	25
11	Temperature‐Dependent Phase Transitions in Hf_xZr_1‐xO₂ Mixed Oxides: Indications of a Proper Ferroelectric Material 2022 ·Advanced Electronic Materials ·Uwe Schroeder, Terence Mittmann, Monica Materano, Patrick D. Lomenzo, (unknown), Young H. Lee, (unknown), Anthony R. West, Thomas Mikolajick, Alfred Kersch, Jacob L. Jones	35
12	Using Raman spectroscopy and x-ray diffraction for phase determination in ferroelectric mixed Hf1−xZrxO2-based layers 2022 ·Journal of Applied Physics ·Uwe Schroeder, (unknown), Patrick D. Lomenzo, (unknown), Monica Materano, Thomas Mikolajick, Alfred Kersch	18
13	An unexplored antipolar phase in HfO2 from first principles and implication for wake-up mechanism 2021 ·Applied Physics Letters ·(unknown), (unknown), Ruben Alcala, Thomas Mikolajick, Uwe Schroeder, Alfred Kersch	19
14	Ab initio interphase characteristics in HfO2 and ZrO2 and nucleation of the polar phase 2021 ·Applied Physics Letters ·Max Falkowski, Alfred Kersch	21
15	Interplay between oxygen defects and dopants: effect on structure and performance of HfO₂-based ferroelectrics 2021 ·Inorganic Chemistry Frontiers ·Monica Materano, Patrick D. Lomenzo, Alfred Kersch, Min Hyuk Park, Thomas Mikolajick, Uwe Schroeder	87
16	New Low‐Energy Crystal Structures in ZrO₂ and HfO₂ 2021 ·physica status solidi (RRL) - Rapid Research Letters ·Alfred Kersch, Max Falkowski	26
17	Influence of Oxygen Content on the Structure and Reliability of Ferroelectric Hf_xZr_1–xO₂ Layers 2020 ·ACS Applied Electronic Materials ·Monica Materano, Terence Mittmann, Patrick D. Lomenzo, Chuanzhen Zhou, Jacob L. Jones, Max Falkowski, Alfred Kersch, Thomas Mikolajick, Uwe Schroeder	99
18	Optimizing the Piezoelectric Strain in ZrO₂- and HfO₂-Based Incipient Ferroelectrics for Thin-Film Applications: An Ab Initio Dopant Screening Study 2020 ·ACS Applied Materials & Interfaces ·Max Falkowski, Alfred Kersch	31
19	Origin of Ferroelectric Phase in Undoped HfO₂ Films Deposited by Sputtering 2019 ·Advanced Materials Interfaces ·Terence Mittmann, Monica Materano, Patrick D. Lomenzo, Min Hyuk Park, Igor Stolichnov, Matteo Cavalieri, Chuanzhen Zhou, Ching‐Chang Chung, Jacob L. Jones, Thomas Szyjka, Martina Müller, Alfred Kersch, Thomas Mikolajick, Uwe Schroeder	151
20	Unexpectedly large energy variations from dopant interactions in ferroelectric HfO2 from high-throughput ab initio calculations 2018 ·npj Computational Materials ·Max Falkowski, Christopher Künneth, (unknown), Alfred Kersch	21

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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