T. Ichikawa

402 total citations
9 papers, 230 citations indexed

About

T. Ichikawa is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Media Technology. According to data from OpenAlex, T. Ichikawa has authored 9 papers receiving a total of 230 indexed citations (citations by other indexed papers that have themselves been cited), including 8 papers in Electrical and Electronic Engineering, 5 papers in Materials Chemistry and 2 papers in Media Technology. Recurrent topics in T. Ichikawa's work include Silicon and Solar Cell Technologies (5 papers), Silicon Nanostructures and Photoluminescence (4 papers) and Thin-Film Transistor Technologies (4 papers). T. Ichikawa is often cited by papers focused on Silicon and Solar Cell Technologies (5 papers), Silicon Nanostructures and Photoluminescence (4 papers) and Thin-Film Transistor Technologies (4 papers). T. Ichikawa collaborates with scholars based in Japan. T. Ichikawa's co-authors include T. Ohmi, Hiroshi Iwabuchi, T. Shibata, T. Yonehara, Takashi Noma, Katsumi Inoue, Kazuhiro Morimoto, Shinya Hayashi, Hiroyuki Tsuchiya and Y. Onuki and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Science Reports of the Research Institutes, Tohoku University, Series A: Physics, Chemistry, and Metallurgy.

In The Last Decade

T. Ichikawa

9 papers receiving 223 citations

Peers

T. Ichikawa
B. Anthony United States
Tianbao Xie United States
S.J. Fonash United States
B. Mizuno Japan
D. Wristers United States
J.R. Liefting Netherlands
T. Ichikawa
Citations per year, relative to T. Ichikawa T. Ichikawa (= 1×) peers Takashi Yunogami

Countries citing papers authored by T. Ichikawa

Since Specialization
Citations

This map shows the geographic impact of T. Ichikawa's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by T. Ichikawa with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites T. Ichikawa more than expected).

Fields of papers citing papers by T. Ichikawa

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by T. Ichikawa. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by T. Ichikawa. The network helps show where T. Ichikawa may publish in the future.

Co-authorship network of co-authors of T. Ichikawa

This figure shows the co-authorship network connecting the top 25 collaborators of T. Ichikawa. A scholar is included among the top collaborators of T. Ichikawa based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with T. Ichikawa. T. Ichikawa is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

9 of 9 papers shown
2.
Fukuda, Kohei, Hirokazu Ikeda, Y. Onuki, et al.. (2023). Cross Dual-Pixel Twisted-Photodiode Image Sensor for All-Directional Auto Focus. 1–4. 1 indexed citations
3.
Ohmi, T., T. Ichikawa, T. Shibata, & Hiroshi Iwabuchi. (1989). Crystal structure analysis of epitaxial silicon films formed by a low kinetic energy particle process. Applied Physics Letters. 54(6). 523–525. 15 indexed citations
4.
Ohmi, T., T. Ichikawa, Hiroshi Iwabuchi, & T. Shibata. (1989). Formation of device-grade epitaxial silicon films at extremely low temperatures by low-energy bias sputtering. Journal of Applied Physics. 66(10). 4756–4766. 83 indexed citations
5.
Yonehara, T., et al.. (1988). Manipulation of nucleation sites and periods over amorphous substrates. Applied Physics Letters. 52(15). 1231–1233. 25 indexed citations
6.
Ohmi, T., et al.. (1988). I ns i t u substrate-surface cleaning for very low temperature silicon epitaxy by low-kinetic-energy particle bombardment. Applied Physics Letters. 53(1). 45–47. 59 indexed citations
7.
Ohmi, T., et al.. (1988). Low-temperature silicon epitaxy by low-energy bias sputtering. Applied Physics Letters. 53(5). 364–366. 40 indexed citations
8.
Yonehara, T., et al.. (1987). Control of Grain Boundary Location By Selective Nucleation Over Amorphous Substrates. MRS Proceedings. 106. 4 indexed citations
9.
Ichikawa, T.. (1975). The assembly of hard spheres as a structure model of amorphous iron. Science Reports of the Research Institutes, Tohoku University, Series A: Physics, Chemistry, and Metallurgy. 29(1). 293–302. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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