Robert Hsieh

513 citations

16 papers · 404 indexed · h-index 7

Impact in

Structural Biology top 10%
- Advanced Electron Microscopy Techniques and Applications
Atomic and Molecular Physics, and Optics top 10%
- Force Microscopy Techniques and Applications
- Mechanical and Optical Resonators

Papers in

Computer Graphics and Computer-Aided Design 1
Electrical and Electronic Engineering 11
- Advancements in Photolithography Techniques 8
- 3D IC and TSV technologies 5
- Electronic Packaging and Soldering Technologies 2

Co-authors: Irwin Pollack D. Adderton Jonathan D. Adams S. C. Minne Todd Sulchek C. F. Quate G.G. Yaralioglu J. P. Cleveland
Journals: Psychological Bulletin (1 paper)Journal of the American Ceramic Society (1 paper)Applied Physics Letters (1 paper)Review of Scientific Instruments (1 paper)Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena (1 paper)
Partner nations: United States Belgium Germany

In The Last Decade

Robert Hsieh

15 papers receiving 384 citations

Peers

Countries citing papers authored by Robert Hsieh

Since Specialization

Citations

This map shows the geographic impact of Robert Hsieh's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Robert Hsieh with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Robert Hsieh more than expected).

Fields of papers citing papers by Robert Hsieh

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Robert Hsieh. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Robert Hsieh. The network helps show where Robert Hsieh may publish in the future.

Co-authorship network

The 25 scholars most cited alongside Robert Hsieh, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Robert Hsieh Line = papers co-authored together Robert Hsieh links everyone, so they are left out of the graph.

All Works

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16 of 16 papers shown

#	Work
1	Fine Pitch Line/Space Lithography for Large Area Package with Multi-Field Stitching Soon Wee Ho, Pooja P Solanki, Elba Mirella Arredondo Urtiz, Robert Hsieh, A Al-Masoudi, G. Ricordeau	2021	3
2	Process Window Enhancement of Via Holes for Fine Pitch RDL by Design Optimization Elba Mirella Arredondo Urtiz, Robert Hsieh, A Al-Masoudi, Warren W. Flack, John Slabbekoorn, Andy Miller	2020	5
3	One Micron Damascene Redistribution for Fan-Out Wafer Level Packaging using a Photosensitive Dielectric Material Warren W. Flack, Robert Hsieh, A Al-Masoudi, John Slabbekoorn, Samuel Suhard, Andy Miller, Diah Krisnaningsih, A.O. Lohvin	2018	17
4	One micron redistribution for fan-out wafer level packaging Warren W. Flack, Robert Hsieh, A Al-Masoudi, John Slabbekoorn, M. Olinic, Andy Miller	2017	14
5	Large area interposer lithography Warren W. Flack, Robert Hsieh, 昕钰魏, YEN TE CHOW, John Slabbekoorn, Andy Miller, Eric Beyne, M Legierse, Zdeněk Šustr, Yi Cao, Chun‐Wei Chen	2014	6
6	Lithography technique to reduce the alignment errors from die placement in fan-out wafer level packaging applications Warren W. Flack, Robert Hsieh, 昕钰魏, Khiem Nguyen, YEN TE CHOW, Nuno Silva, Paulo Cardoso, Wilfried Prokop, Sha Wang, W. Robl, Maciej Józefowicz	2011	3
7	Development and characterization of a 300-mm dual-side alignment stepper Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Warren W. Flack, Vicente Mauricio Jaramillo Chica, Robert Hsieh, D. Fuchs, Quatman Ce	2007	2
8	Dual side lithography measurement, precision, and accuracy Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·MA Li-xin, Warren W. Flack, Robert Hsieh	2005	5
9	High-speed tapping mode imaging with active Q control for atomic force microscopy Applied Physics Letters ·Todd Sulchek, Robert Hsieh, Jonathan D. Adams, G.G. Yaralioglu, S. C. Minne, C. F. Quate, J. P. Cleveland, A. Atalar, D. Adderton	2000	172
10	High-speed atomic force microscopy in liquid Review of Scientific Instruments ·Todd Sulchek, Robert Hsieh, Jonathan D. Adams, S. C. Minne, C. F. Quate, D. Adderton	2000	88
11	Rational argument for the impracticability of 1× reticles Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Pedro Causo Camareno, E Rising, N.I. Maluf, Robert Hsieh, Jun Ye, C. N. Berglund	1993	2
12	All-reflective phase-shifting masks for Markle–Dyson optics Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Robert Hsieh, Andrew Grenville, G. Owen, R. F. W. Pease	1992	1
13	<title>Reflective masks for 1X deep ultraviolet lithography</title> Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Robert Hsieh, Guo‐jin, N.I. Maluf, R. Browning, Paul Jerabek, E Rising, Pedro Causo Camareno	1992	1
14	Effect of central obscuration on image formation in projection lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Steven Yang, Robert Hsieh, Louis A. Barth, E Rising, Pedro Causo Camareno	1990	7
15	Cation Valence in VO _x Journal of the American Ceramic Society ·Robert Hsieh, Jerome B. Cohen, P. Georgopoulos	1984	0
16	Sampling variability of the area under the ROC-curve and of d'e. Psychological Bulletin ·Irwin Pollack, Robert Hsieh	1969	78

About Robert Hsieh

Robert Hsieh is a scholar working on Computer Graphics and Computer-Aided Design, Electrical and Electronic Engineering, Biomedical Engineering, Bioengineering and Catalysis, having authored 16 papers that have together received 404 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (8 papers), 3D IC and TSV technologies (5 papers), Nanofabrication and Lithography Techniques (4 papers), Advanced optical system design (3 papers), Force Microscopy Techniques and Applications (2 papers), Advanced Measurement and Metrology Techniques (2 papers), Electronic Packaging and Soldering Technologies (2 papers) and Surface Roughness and Optical Measurements (2 papers). The work is most often cited by research in Structural Biology (20 citations), Atomic and Molecular Physics, and Optics (245 citations), Biomedical Engineering (133 citations), Electrical and Electronic Engineering (171 citations) and Bioengineering (12 citations). Robert Hsieh has collaborated with scholars based in United States, Belgium and Germany. Frequent co-authors include Irwin Pollack, D. Adderton, Jonathan D. Adams, S. C. Minne, Todd Sulchek, C. F. Quate, G.G. Yaralioglu, J. P. Cleveland, A. Atalar and Warren W. Flack. Their work appears in journals such as Psychological Bulletin, Journal of the American Ceramic Society, Applied Physics Letters, Review of Scientific Instruments and Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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