R. Etemadi

542 citations

19 papers · 456 indexed · h-index 12

Ceramics and Composites
- Advanced ceramic materials synthesis 4
Materials Chemistry
- Diamond and Carbon-based Materials Research 3
Electrical and Electronic Engineering
- Semiconductor materials and devices 7
- Thin-Film Transistor Technologies 6
- Plasma Diagnostics and Applications 3
Surfaces, Coatings and Films
Atomic and Molecular Physics, and Optics
Electronic, Optical and Magnetic Materials
- Copper Interconnects and Reliability 5
Mechanics of Materials
- Metal and Thin Film Mechanics 5
Mechanical Engineering
- Aluminum Alloys Composites Properties 4

Co-authors: J. Perrin C. Godet C. Bohm Ana Lloret J. C. Rostaing B. Drévillon Krishna M. Pillai Pradeep K. Rohatgi
Cited by: Ceramics and Composites Materials Chemistry Electrical and Electronic Engineering
Journals: Applied Physics Letters (1 paper)Journal of Applied Physics (3 papers)Thin Solid Films (2 papers)
Partner nations: France United States China

In The Last Decade

R. Etemadi

19 papers receiving 443 citations

Peers

Countries citing papers authored by R. Etemadi

Since Specialization

Citations

This map shows the geographic impact of R. Etemadi's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by R. Etemadi with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites R. Etemadi more than expected).

Fields of papers citing papers by R. Etemadi

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by R. Etemadi. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by R. Etemadi. The network helps show where R. Etemadi may publish in the future.

Co-authorship network

The 25 scholars most cited alongside R. Etemadi, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with R. Etemadi Line = papers co-authored together R. Etemadi links everyone, so they are left out of the graph.

All Works

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19 of 19 papers shown

#	Work
1	Numerical Simulation on Thermal Stresses and Solidification Microstructure for Making Fiber-Reinforced Aluminum Matrix Composites Materials ·Chenyang Xing,R. Etemadi,Krishna M. Pillai,Qian Wang,Bo Wang	2022	3
2	Pressure infiltration processes to synthesize metal matrix composites – A review of metal matrix composites, the technology and process simulation Materials and Manufacturing Processes ·R. Etemadi,Bingpeng Wang,Krishna M. Pillai,Behzad Niroumand,Emad Omrani,Pradeep K. Rohatgi	2017	68
3	Sensitivity analysis of numerical wave predictions models, considering wind and geometry effects in rectangular lakes Ocean Engineering ·Navid Nekouee,Sajad Ahmad Hamidi,R. Etemadi	2015	4
4	On Porosity Formation in Metal Matrix Composites Made with Dual-Scale Fiber Reinforcements Using Pressure Infiltration Process Metallurgical and Materials Transactions A ·R. Etemadi,Krishna M. Pillai,Pradeep K. Rohatgi,Sajad Ahmad Hamidi	2015	16
5	Effect of Processing Parameters and Matrix Shrinkage on Porosity Formation During Synthesis of Metal Matrix Composites with Dual-scale Fiber Reinforcements Using Pressure Infiltration Process UWM Digital Commons (University of Wisconsin–Milwaukee) ·R. Etemadi	2014	2
6	The origin of visible photoluminescence from silicon oxide thin films prepared by dual-plasma chemical vapor deposition Journal of Applied Physics ·Minmin Zhu,Yulei Han,Ralf B. Wehrspohn,C. Godet,R. Etemadi,D. Ballutaud	1998	60
7	Optical and compositional study of silicon oxide thin films deposited in a dual-mode (microwave/radiofrequency) plasma-enhanced chemical vapor deposition reactor Journal of Applied Physics ·R. Etemadi,C. Godet,J. Perrin,A. Seignac,D. Ballutaud	1998	5
8	Multitube surface-wave discharges for increased gas throughput at atmospheric pressure Journal of Applied Physics ·Michel Moisan,Z. Zakrzewski,R. Etemadi,J. C. Rostaing	1998	38
9	Phenomenology of a dual-mode microwave/RF discharge used for the deposition of silicon oxide thin layers Plasma Sources Science and Technology ·R. Etemadi,C. Godet,J. Perrin	1997	10
10	Dual-plasma reactor for low temperature deposition of wide band-gap silicon alloys Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·R. Etemadi,C. Godet,J. Perrin,B. Drévillon,J. Huc,J. Y. Parey,J. C. Rostaing,F. Cœuret	1997	30
11	Hydrogen incorporation in dual-mode PECVD amorphous silicon oxide thin films Surface and Coatings Technology ·R. Etemadi,C. Godet,J. Perrin,J.E. Bourée,B. Drévillon,C. Clerc	1996	12
12	Optical and luminescence properties of polymer-like a-C:H films deposited in a dual-mode PECVD reactor Journal of Non-Crystalline Solids ·J.E. Bourée,C. Godet,B. Drévillon,R. Etemadi,T. Heitz,J. Cernogora,J.L. Fave	1996	11
13	Helium ion-induced stoichiometry modification in hydrogenated silicon oxide films Applied Physics Letters ·C. Godet,R. Etemadi,C. Clerc	1996	7
14	Dual-mode plasma-enhanced chemical vapor deposition (PECVD) of polymer-like a-C:H films: vibrational and optical properties Synthetic Metals ·J.E. Bourée,C. Godet,R. Etemadi,B. Drévillon	1996	12
15	Dual-mode radio frequency/microwave plasma deposition of amorphous silicon oxide thin films Journal of Non-Crystalline Solids ·R. Etemadi,C. Godet,Morten Kildemo,J.E. Bourée,R. Brenot,B. Drévillon	1995	15
16	Highly homogeneous silica coatings for optical and protective applications deposited by PECVD at room temperature in a planar uniform distributed electron cyclotron resonance plasma reactor. Thin Solid Films ·J. C. Rostaing,F. Cœuret,Jacques Pelletier,T. Lagarde,R. Etemadi	1995	12
17	Possible routes for cluster growth and particle formation in RF silane discharges Plasma Sources Science and Technology ·J. Perrin,C. Bohm,R. Etemadi,Ana Lloret	1994	107
18	Silicon-based, protective transparent multilayer coatings deposited at high rate on optical polymers by dual-mode MW/r.f. PECVD Thin Solid Films ·J. C. Rostaing,F. Cœuret,B. Drévillon,R. Etemadi,C. Godet,J. Huc,J. Y. Parey,V. A. Yakovlev	1993	29
19	Local order and H-bonding in N-rich amorphous silicon nitride Journal of Non-Crystalline Solids ·C. Sénémaud,A. Gheorghiu,L. Amoura,R. Etemadi,Hajime Shirai,C. Godet,Mei Fang,S. C. Gujrathi	1993	15

About R. Etemadi

R. Etemadi is a scholar working on Ceramics and Composites, Electronic, Optical and Magnetic Materials and Mechanics of Materials, having authored 19 papers that have together received 456 indexed citations. Recurring topics across this work include Semiconductor materials and devices (7 papers), Thin-Film Transistor Technologies (6 papers), Copper Interconnects and Reliability (5 papers), Metal and Thin Film Mechanics (5 papers), Aluminum Alloys Composites Properties (4 papers), Advanced ceramic materials synthesis (4 papers), Plasma Diagnostics and Applications (3 papers) and Diamond and Carbon-based Materials Research (3 papers). The work is most often cited by research in Ceramics and Composites (41 citations), Materials Chemistry (244 citations) and Electrical and Electronic Engineering (265 citations). R. Etemadi has collaborated with scholars based in France, United States and China. Frequent co-authors include J. Perrin, C. Godet, C. Bohm, Ana Lloret, J. C. Rostaing, B. Drévillon, Krishna M. Pillai, Pradeep K. Rohatgi, Behzad Niroumand and D. Ballutaud. Their work appears in journals such as Applied Physics Letters, Journal of Applied Physics and Thin Solid Films.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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