J. C. Rostaing

562 total citations
19 papers, 469 citations indexed

About

J. C. Rostaing is a scholar working on Electrical and Electronic Engineering, Radiology, Nuclear Medicine and Imaging and Materials Chemistry. According to data from OpenAlex, J. C. Rostaing has authored 19 papers receiving a total of 469 indexed citations (citations by other indexed papers that have themselves been cited), including 16 papers in Electrical and Electronic Engineering, 7 papers in Radiology, Nuclear Medicine and Imaging and 7 papers in Materials Chemistry. Recurrent topics in J. C. Rostaing's work include Plasma Applications and Diagnostics (7 papers), Semiconductor materials and devices (6 papers) and Plasma Diagnostics and Applications (6 papers). J. C. Rostaing is often cited by papers focused on Plasma Applications and Diagnostics (7 papers), Semiconductor materials and devices (6 papers) and Plasma Diagnostics and Applications (6 papers). J. C. Rostaing collaborates with scholars based in France, Canada and Belarus. J. C. Rostaing's co-authors include Michel Moisan, Z. Zakrzewski, R. Etemadi, Y. Kabouzi, C. Trassy, Jean‐Luc Autran, R. A. B. Devine, B. Drévillon, W. L. Warren and J. Perrin and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Thin Solid Films.

In The Last Decade

J. C. Rostaing

19 papers receiving 446 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
J. C. Rostaing France 12 360 205 173 65 59 19 469
Jacimar Nahorny Brazil 6 540 1.5× 461 2.2× 196 1.1× 76 1.2× 105 1.8× 8 670
J. Laimer Austria 16 337 0.9× 218 1.1× 270 1.6× 70 1.1× 282 4.8× 48 604
R. Boswell Australia 10 520 1.4× 265 1.3× 68 0.4× 86 1.3× 93 1.6× 18 561
André Ricard France 10 353 1.0× 189 0.9× 67 0.4× 135 2.1× 81 1.4× 12 432
A. Lunk Germany 16 320 0.9× 156 0.8× 247 1.4× 65 1.0× 232 3.9× 44 530
O. Leroy France 13 533 1.5× 168 0.8× 283 1.6× 177 2.7× 170 2.9× 24 701
D. Magni Switzerland 5 292 0.8× 88 0.4× 183 1.1× 135 2.1× 81 1.4× 9 448
Shaista Zeb Pakistan 8 206 0.6× 131 0.6× 146 0.8× 29 0.4× 142 2.4× 13 366
W. Schwarzenbach France 13 426 1.2× 81 0.4× 166 1.0× 159 2.4× 93 1.6× 55 564
R. Seeböck Germany 11 256 0.7× 114 0.6× 88 0.5× 131 2.0× 43 0.7× 22 394

Countries citing papers authored by J. C. Rostaing

Since Specialization
Citations

This map shows the geographic impact of J. C. Rostaing's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. C. Rostaing with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. C. Rostaing more than expected).

Fields of papers citing papers by J. C. Rostaing

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J. C. Rostaing. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. C. Rostaing. The network helps show where J. C. Rostaing may publish in the future.

Co-authorship network of co-authors of J. C. Rostaing

This figure shows the co-authorship network connecting the top 25 collaborators of J. C. Rostaing. A scholar is included among the top collaborators of J. C. Rostaing based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with J. C. Rostaing. J. C. Rostaing is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

19 of 19 papers shown
1.
Shabunya, S. I., et al.. (2014). Simulation of the Combustion of Thin Iron Rods in Oxygen in the Adiabatic Approximation. Journal of Engineering Physics and Thermophysics. 87(6). 1279–1290. 3 indexed citations
2.
Penyazkov, O. G., et al.. (2012). Conditions and delay time of ignition of iron microparticles in oxygen. Journal of Engineering Physics and Thermophysics. 85(1). 148–154. 3 indexed citations
3.
Shabunya, S. I., et al.. (2007). Self-consistent modelling of a microwave discharge in neon and argon at atmospheric pressure. Plasma Sources Science and Technology. 16(3). 480–491. 25 indexed citations
4.
Kabouzi, Y., et al.. (2006). Reduction of perfluorinated compound emissions using atmospheric pressure microwave plasmas: Mechanisms and energy efficiency. Pure and Applied Chemistry. 78(6). 1173–1185. 16 indexed citations
5.
Chernukho, Andrey, et al.. (2005). Simulation of Perfluoromethane Decomposition in an Atmospheric-Pressure Microwave Discharge. Journal of Engineering Physics and Thermophysics. 78(2). 394–404. 5 indexed citations
6.
Kabouzi, Y., et al.. (2003). Abatement of perfluorinated compounds using microwave plasmas at atmospheric pressure. Journal of Applied Physics. 93(12). 9483–9496. 92 indexed citations
7.
Moisan, Michel, Z. Zakrzewski, & J. C. Rostaing. (2001). Waveguide-based single and multiple nozzle plasma torches: the TIAGO concept. Plasma Sources Science and Technology. 10(3). 387–394. 80 indexed citations
8.
Rostaing, J. C., et al.. (2000). Méthode d’épuration des gaz rares au moyen de décharges électriques de haute fréquence. 1(1). 99–105. 3 indexed citations
9.
Moisan, Michel, Z. Zakrzewski, R. Etemadi, & J. C. Rostaing. (1998). Multitube surface-wave discharges for increased gas throughput at atmospheric pressure. Journal of Applied Physics. 83(11). 5691–5701. 38 indexed citations
10.
Devine, R. A. B., et al.. (1997). Interfacial hardness enhancement in deuterium annealed 0.25 μm channel metal oxide semiconductor transistors. Applied Physics Letters. 70(22). 2999–3001. 59 indexed citations
11.
Etemadi, R., C. Godet, J. Perrin, et al.. (1997). Dual-plasma reactor for low temperature deposition of wide band-gap silicon alloys. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 15(2). 320–331. 30 indexed citations
12.
13.
Vallon, S., B. Drévillon, Fabienne Poncin‐Epaillard, & J. C. Rostaing. (1995). In Situ Study of The Exposure of Polycarbonate to an Argon Plasma. MRS Proceedings. 385. 3 indexed citations
14.
Rostaing, J. C., F. Cœuret, B. Drévillon, et al.. (1993). Silicon-based, protective transparent multilayer coatings deposited at high rate on optical polymers by dual-mode MW/r.f. PECVD. Thin Solid Films. 236(1-2). 58–63. 29 indexed citations
15.
Vallon, S., B. Drévillon, & J. C. Rostaing. (1993). Ellipsometry study of the adhesion of dielectric thin films on polymer substrates. Thin Solid Films. 233(1-2). 256–259. 4 indexed citations
16.
Drévillon, B., J. C. Rostaing, & S. Vallon. (1993). Investigation of the adhesion mechanisms of silicon alloy thin films on polymer substrates by IR ellipsometry. Thin Solid Films. 236(1-2). 204–208. 8 indexed citations
17.
Rostaing, J. C., et al.. (1987). Quantitative infrared characterization of plasma enhanced CVD silicon oxynitride films. Journal of Non-Crystalline Solids. 97-98. 1051–1054. 28 indexed citations
18.
Rostaing, J. C., et al.. (1987). Optical properties of plasma-enhanced chemical vapor deposited silicon-oxynitride films. Journal of Applied Physics. 62(11). 4538–4544. 20 indexed citations
19.
Jousse, D., et al.. (1987). IR, ESR and resistivity measurements on amorphous silicon oxi-nitride films prepared by PECVD at low temperature. Journal of Non-Crystalline Solids. 90(1-3). 287–290. 11 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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