Nora V. Edwards
Impact in
- Condensed Matter Physics top 5%
- GaN-based semiconductor devices and materials
- Surfaces, Coatings and Films top 10%
- Electron and X-Ray Spectroscopy Techniques
Papers in
-
- GaN-based semiconductor devices and materials 18
-
- Advancements in Photolithography Techniques 6
- Silicon Carbide Semiconductor Technologies 6
- Semiconductor materials and devices 3
- Co-authors
- Theodore E. Madey (3 shared papers)D. E. Aspnes (17 shared papers)Michael D. Bremser (16 shared papers)Robert F. Davis (16 shared papers)Nadir S. Faradzhev (1 shared paper)Boris V. Yakshinskiy (1 shared paper)S. Bajt (4 shared papers)Okhyun Nam (3 shared papers)
- Journals
- Applied Physics Letters (6 papers)Thin Solid Films (4 papers)Journal of Applied Physics (2 papers)Journal of The Electrochemical Society (2 papers)Journal of Electronic Materials (2 papers)
- Partner nations
- United StatesSwedenGermany
In The Last Decade
Nora V. Edwards
49 papers receiving 927 citations
Peers
Comparison fields: 5 of 22
- Condensed Matter Physics 289
- Surfaces, Coatings and Films 39
- Electrical and Electronic Engineering 343
- Radiation 9
- Bioengineering 2
Countries citing papers authored by Nora V. Edwards
This map shows the geographic impact of Nora V. Edwards's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Nora V. Edwards with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Nora V. Edwards more than expected).
Fields of papers citing papers by Nora V. Edwards
This network shows the impact of papers produced by Nora V. Edwards. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Nora V. Edwards. The network helps show where Nora V. Edwards may publish in the future.
Co-authors
The 25 scholars most cited alongside Nora V. Edwards, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 50 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2004 | 158 | |
| 2 | 2006 | 102 | |
| 3 | 1996 | 90 | |
| 4 | 2007 | 63 | |
| 5 | 1996 | 55 | |
| 6 | 2003 | 55 | |
| 7 | 1997 | 45 | |
| 8 | 1998 | 39 | |
| 9 | 2003 | 33 | |
| 10 | 2000 | 27 | |
| 11 | 2002 | 26 | |
| 12 | 2001 | 25 | |
| 13 | 2001 | 23 | |
| 14 | 2006 | 22 | |
| 15 | 2005 | 20 | |
| 16 | 2001 | 13 | |
| 17 | 2001 | 13 | |
| 18 | 2003 | 13 | |
| 19 | 2004 | 13 | |
| 20 | 1995 | 11 |
About Nora V. Edwards
Nora V. Edwards is a scholar working on Condensed Matter Physics, Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Surfaces, Coatings and Films and Mechanics of Materials, having authored 50 papers that have together received 992 indexed citations. Recurring topics across this work include GaN-based semiconductor devices and materials (18 papers), Advancements in Photolithography Techniques (6 papers), Silicon Carbide Semiconductor Technologies (6 papers), Semiconductor materials and devices (3 papers), Copper Interconnects and Reliability (2 papers), Optical Coatings and Gratings (1 paper), Metal and Thin Film Mechanics (1 paper) and Optical Polarization and Ellipsometry (1 paper). The work is most often cited by research in Condensed Matter Physics (289 citations), Surfaces, Coatings and Films (39 citations), Electrical and Electronic Engineering (343 citations), Radiation (9 citations) and Bioengineering (2 citations). Nora V. Edwards has collaborated with scholars based in United States, Sweden and Germany. Frequent co-authors include Theodore E. Madey, D. E. Aspnes, Michael D. Bremser, Robert F. Davis, Nadir S. Faradzhev, Boris V. Yakshinskiy, S. Bajt, Okhyun Nam, T. Warren Weeks and William G. Perry. Their work appears in journals such as Applied Physics Letters, Thin Solid Films, Journal of Applied Physics, Journal of The Electrochemical Society and Journal of Electronic Materials.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.