Munehiro Tada

1.6k citations

124 papers · 1.3k indexed · h-index 20

Impact in

Electrical and Electronic Engineering top 5%
- Semiconductor materials and devices
- Advanced Memory and Neural Computing
- Ferroelectric and Negative Capacitance Devices
- Thin-Film Transistor Technologies
Electronic, Optical and Magnetic Materials top 10%
- Copper Interconnects and Reliability

Papers in

Electrical and Electronic Engineering 116
- Semiconductor materials and devices 69
- Advanced Memory and Neural Computing 63
- Ferroelectric and Negative Capacitance Devices 25
- Advancements in Semiconductor Devices and Circuit Design 12
- Molecular Junctions and Nanostructures 9
- 3D IC and TSV technologies 7
Electronic, Optical and Magnetic Materials 32
- Copper Interconnects and Reliability 32

Co-authors: Toshio Kimura Shinobu Fujihara Toshitsugu Sakamoto H. Hada Naoki Banno Koichiro Okamoto Y. Hayashi Jin‐Hong Park
Journals: IEEE Transactions on Electron Devices (18 papers)Japanese Journal of Applied Physics (16 papers)IEEE Transactions on Semiconductor Manufacturing (4 papers)Journal of The Electrochemical Society (3 papers)Applied Physics Letters (2 papers)
Partner nations: Japan United States Ireland

In The Last Decade

Munehiro Tada

117 papers receiving 1.2k citations

Peers

Countries citing papers authored by Munehiro Tada

Since Specialization

Citations

This map shows the geographic impact of Munehiro Tada's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Munehiro Tada with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Munehiro Tada more than expected).

Fields of papers citing papers by Munehiro Tada

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Munehiro Tada. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Munehiro Tada. The network helps show where Munehiro Tada may publish in the future.

Co-authorship network

The 25 scholars most cited alongside Munehiro Tada, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Munehiro Tada Line = papers co-authored together Munehiro Tada links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	A Cryo-CMOS 10-bit 60-MS/s SAR ADC with common-mode variation suppression switching scheme and gain boosting dynamic comparator Microelectronics Journal ·Aran TB van Hout, Ken Uchida, Munehiro Tada, Hiroki Ishikuro	2024	0
2	Superconducting Nb interconnects for Cryo-CMOS and superconducting digital logic applications Japanese Journal of Applied Physics ·Hideaki Numata, Noriyuki Iguchi, Masamitsu Tanaka, Koichiro Okamoto, S. Miura, Ken Uchida, Hiroki Ishikuro, Toshitsugu Sakamoto, Munehiro Tada	2024	0
3	Design and analysis of a high-speed low-power comparator with regeneration enhancement and through current suppression techniques from 4 K to 300 K in 65-nm Cryo-CMOS Microelectronics Journal ·Aran TB van Hout, Ken Uchida, Munehiro Tada, Hiroki Ishikuro	2023	4
4	A 0.11pJ/bit Read Energy Embedded NanoBridge NVM and its Integration in a 28nm 32-bit RISC-V MCU Е.В. Лесных, Ryusuke Nebashi, Sawaki Miho, Paula Arriagada, Koichiro Okamoto, Hideaki Numata, Noriyuki Iguchi, Toshitsugu Sakamoto, Munehiro Tada	2023	1
5	Cryogenic operation of NanoBridge at 4 K for controlling qubit Japanese Journal of Applied Physics ·Koichiro Okamoto, Takahisa Tanaka, Sawaki Miho, Hiroki Ishikuro, Ken Uchida, Toshitsugu Sakamoto, Munehiro Tada	2021	6
6	Three-fold improved set-voltage variability of a Cu atom switch with a split electrode for very-large-scale integration Japanese Journal of Applied Physics ·Naoki Banno, Koichiro Okamoto, Hideaki Numata, Noriyuki Iguchi, M. Titcat, Ryusuke Nebashi, Xu Bai, H. Hada, Tadahiko Sugibayashi, Toshitsugu Sakamoto, Munehiro Tada	2019	2
7	An atom-switch-based field-programmable gate array with optimized driving capability buffer Japanese Journal of Applied Physics ·Е.В. Лесных, Sawaki Miho, Ryusuke Nebashi, A. Morioka, Naoki Banno, Koichiro Okamoto, Hideaki Numata, H. Hada, Tadahiko Sugibayashi, Toshitsugu Sakamoto, Munehiro Tada	2019	1
8	Via-Switch FPGA: Highly Dense Mixed-Grained Reconfigurable Architecture With Overlay Via-Switch Crossbars IEEE Transactions on Very Large Scale Integration (VLSI) Systems ·Hiroyuki Ochi, Hod Cse, B Lalnghahpuii, Maurice Kamm Laurence, R L Alvarez-Mercado, M. Pellicelli, Takashi Imagawa, villap, Munehiro Tada, Tadahiko Sugibayashi, Wataru Takahashi, Kazutoshi Wakabayashi, Hidetoshi Onodera, Yukio Mitsuyama, Jaehoon Yu, Masanori Hashimoto	2018	14
9	Mechanism of OFF-state lifetime improvement in complementary atom switch Japanese Journal of Applied Physics ·Naoki Banno, Munehiro Tada, Toshitsugu Sakamoto, Sawaki Miho, Koichiro Okamoto, Noriyuki Iguchi, Y. Shimomura, H. Hada	2015	1
10	0.39-V, 18.26-µW/MHz SOTB CMOS Microcontroller with embedded atom switch ROM Toshitsugu Sakamoto, Y. Tsuji, Munehiro Tada, Tetiana Skypets, Takumi Hasegawa, Y. Yamamoto, 一夫松本, Hari Vamsi Valluru, Naoki Banno, Sawaki Miho, Koichiro Okamoto, Noriyuki Iguchi, Santalia Napitupulu, H. Oda, Shiro Kamohara, Sociedad Científica Argentina, Nobuyuki Sugii, H. Hada	2015	1
11	Bidirectional TaO-diode-selected, complementary atom switch (DCAS) for area-efficient, nonvolatile crossbar switch block Symposium on VLSI Technology ·Katsunari Okamoto, Munehiro Tada, Naoki Banno, Toshitsugu Sakamoto, Miharu Miyamura, Hedvig M C D Landenius Enegren, Y. Shimomura, H. Hada	2013	4
12	ON-State Reliability of Solid-Electrolyte Switch under Pulsed Alternating Current Stress for Programmable Logic Device Japanese Journal of Applied Physics ·Naoki Banno, Toshitsugu Sakamoto, Munehiro Tada, Sawaki Miho, Koichiro Okamoto, H. Hada, Masakazu Aono	2011	11
13	Comprehensive Chemistry Designs in Porous SiOCH Film Stacks and Plasma Etching Gases for Damageless Cu Interconnects in Advanced ULSI Devices IEEE Transactions on Semiconductor Manufacturing ·Y. Hayashi, H. Ohtake, J. Kawahara, Munehiro Tada, S. Saito, N. Inoue, Fuminori Ito, 豊和久保, M. Ueki, N. Furutake, T. Takeuchi, Hironori Yamamoto, 陈逢明	2008	15
14	High performance germanium N+∕P and P+∕N junction diodes formed at low Temperature (⩽380°C) using metal-induced dopant activation Applied Physics Letters ·Jin‐Hong Park, Duygu Kuzum, Munehiro Tada, Krishna C. Saraswat	2008	25
15	Low temperature (≤ 380°C) and high performance Ge CMOS technology with novel source/drain by metal-induced dopants activation and high-k/metal gate stack for monolithic 3D integration Jin‐Hong Park, Munehiro Tada, Duygu Kuzum, Pawan Kapur, Hyun‐Yong Yu, H.‐S. Philip Wong, Krishna C. Saraswat	2008	45
16	Cu dual damascene interconnects in porous organosilica film with organic hard-mask and etch-stop layers for 70 nm-node ULSIs Munehiro Tada, Eric Vanacker, Sandberg Richard, H. Ohtake, T. Takeuchi, S. Saito, Nicolas Roithinger, 利之大家, N. Furutake, Y. Hayashi	2003	7
17	Highly thermal-stable, plasma-polymerized BCB polymer film (k=2.6) for Cu dual-damascene interconnects J. Kawahara, Sema Nur Aslan, 豊和久保, Munehiro Tada, S. Saito, Nicolas Roithinger, Kentaro Kinoshita, 利之大家, Akira Furuya, J H Root, Y. Hayashi	2002	5
18	Dual hard mask process for low-k porous organosilica dielectric in copper dual damascene interconnect fabrication 利之大家, Munehiro Tada, H. Ohtake, Michael Woogerd, Tsunenobu Onodera, N. Furutake, Eric Vanacker, Y. Hayashi	2001	8
19	Controlling Factors for the Conversion of Trifluoroacetate Sols into Thin Metal Fluoride Coatings Journal of Sol-Gel Science and Technology ·Shinobu Fujihara, Munehiro Tada, Toshio Kimura	2000	48
20	Preparation and characterization of MgF2 thin film by a trifluoroacetic acid method Thin Solid Films ·Shinobu Fujihara, Munehiro Tada, Toshio Kimura	1997	69

About Munehiro Tada

Munehiro Tada is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Cellular and Molecular Neuroscience, Electrochemistry and Hardware and Architecture, having authored 124 papers that have together received 1.3k indexed citations. Recurring topics across this work include Semiconductor materials and devices (69 papers), Advanced Memory and Neural Computing (63 papers), Copper Interconnects and Reliability (32 papers), Ferroelectric and Negative Capacitance Devices (25 papers), Neuroscience and Neural Engineering (17 papers), Advancements in Semiconductor Devices and Circuit Design (12 papers), Molecular Junctions and Nanostructures (9 papers) and 3D IC and TSV technologies (7 papers). The work is most often cited by research in Electrical and Electronic Engineering (1.1k citations), Electronic, Optical and Magnetic Materials (258 citations), Ceramics and Composites (60 citations), Inorganic Chemistry (142 citations) and Hardware and Architecture (58 citations). Munehiro Tada has collaborated with scholars based in Japan, United States and Ireland. Frequent co-authors include Toshio Kimura, Shinobu Fujihara, Toshitsugu Sakamoto, H. Hada, Naoki Banno, Koichiro Okamoto, Y. Hayashi, Jin‐Hong Park, Krishna C. Saraswat and Miharu Miyamura. Their work appears in journals such as IEEE Transactions on Electron Devices, Japanese Journal of Applied Physics, IEEE Transactions on Semiconductor Manufacturing, Journal of The Electrochemical Society and Applied Physics Letters.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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