Seitaro Matsuo
- Electrical and Electronic Engineering top 5%
- Mechanics of Materials top 5%
- Materials Chemistry
- Atomic and Molecular Physics, and Optics top 10%
- Electronic, Optical and Magnetic Materials top 10%
- Co-authors
- Mikiho KiuchiToshiro OnoChiharu TakahashiYoshio AdachiHiroshi NishimuraMasaru ShimadaM. OdaTai Tsuchizawa
- Topics
- Plasma Diagnostics and Applications (23 papers)Metal and Thin Film Mechanics (13 papers)Semiconductor materials and devices (13 papers)
- Cited by
- Electrical and Electronic EngineeringMechanics of MaterialsElectronic, Optical and Magnetic Materials
- Journals
- Applied Physics LettersJournal of The Electrochemical SocietyJapanese Journal of Applied Physics
- Partner nations
- Japan
In The Last Decade
Seitaro Matsuo
43 papers receiving 996 citations
Hit Papers
Peers
Comparison fields: 5 of 50
- Electrical and Electronic Engineering 864
- Mechanics of Materials 289
- Materials Chemistry 282
- Atomic and Molecular Physics, and Optics 200
- Electronic, Optical and Magnetic Materials 195
Countries citing papers authored by Seitaro Matsuo
This map shows the geographic impact of Seitaro Matsuo's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Seitaro Matsuo with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Seitaro Matsuo more than expected).
Fields of papers citing papers by Seitaro Matsuo
This network shows the impact of papers produced by Seitaro Matsuo. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Seitaro Matsuo. The network helps show where Seitaro Matsuo may publish in the future.
Co-authorship network of co-authors of Seitaro Matsuo
This figure shows the co-authorship network connecting the top 25 collaborators of Seitaro Matsuo. A scholar is included among the top collaborators of Seitaro Matsuo based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Seitaro Matsuo. Seitaro Matsuo is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | Deposition of High Quality Thin Films Using ECR Plasma( Advanced Techniques of Thin Films) | 1 |
| 2 | 3 | |
| 3 | 6 | |
| 4 | 6 | |
| 5 | 24 | |
| 6 | 8 | |
| 7 | 12 | |
| 8 | 2 | |
| 9 | 16 | |
| 10 | 2 | |
| 11 | 7 | |
| 12 | 121 | |
| 13 | Perfect Planar Technology for VLSIs | 1 |
| 14 | 118 | |
| 15 | 2 | |
| 16 | 24 | |
| 17 | 13 | |
| 18 | 7 | |
| 19 | 1 | |
| 20 | 13 |
About Seitaro Matsuo
Seitaro Matsuo is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Surfaces, Coatings and Films, having authored 43 papers that have together received 1.0k indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (23 papers), Metal and Thin Film Mechanics (13 papers) and Semiconductor materials and devices (13 papers). The work is most often cited by research in Electrical and Electronic Engineering (864 citations), Mechanics of Materials (289 citations) and Electronic, Optical and Magnetic Materials (195 citations). Seitaro Matsuo has collaborated with scholars based in Japan. Frequent co-authors include Mikiho Kiuchi, Toshiro Ono, Chiharu Takahashi, Yoshio Adachi, Hiroshi Nishimura, Masaru Shimada, M. Oda, Tai Tsuchizawa, Kazumi Nishimura and Koichi Wakita. Their work appears in journals such as Applied Physics Letters, Journal of The Electrochemical Society and Japanese Journal of Applied Physics.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.