John H. Keller

2.3k citations

31 papers · 1.9k indexed · 1 hit paper · h-index 15

Impact in

Astronomy and Astrophysics top 5%
- Ionosphere and magnetosphere dynamics
Atomic and Molecular Physics, and Optics top 5%
- Dust and Plasma Wave Phenomena

Papers in

Mechanics of Materials 11
- Metal and Thin Film Mechanics 11
Electrical and Electronic Engineering 25
- Plasma Diagnostics and Applications 15
- Semiconductor materials and devices 8
- Integrated Circuits and Semiconductor Failure Analysis 6
- Electrohydrodynamics and Fluid Dynamics 4
- Electrostatic Discharge in Electronics 4

Co-authors: Michael Barnes John Forster James A. O’Neill Klaus Köhler J. W. Coburn D. E. Horne E. Kay William B. Pennebaker
Journals: Journal of Applied Physics (4 papers)IBM Journal of Research and Development (3 papers)Applied Physics Letters (2 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2 papers)Japanese Journal of Applied Physics (1 paper)
Partner nations: United States Australia Germany

In The Last Decade

John H. Keller

31 papers receiving 1.8k citations

Hit Papers

align trajectories log scale

Transport of dust particles in glow-discharge plasmas 1992 · 591 citations

Peers

Countries citing papers authored by John H. Keller

Since Specialization

Citations

This map shows the geographic impact of John H. Keller's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by John H. Keller with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites John H. Keller more than expected).

Fields of papers citing papers by John H. Keller

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by John H. Keller. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by John H. Keller. The network helps show where John H. Keller may publish in the future.

Co-authorship network

The 25 scholars most cited alongside John H. Keller, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with John H. Keller Line = papers co-authored together John H. Keller links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Detection of endolymphatic hydrops using traditional MR imaging sequences American Journal of Otolaryngology ·John H. Keller, Barry E. Hirsch, Nikos Motsanos, Barton F. Branstetter	2017	11
2	Plasma-etching processes for ULSI semiconductor circuits IBM Journal of Research and Development ·照夫近藤, Maurice M Patterson, Rich Wise, Wenjin Yan, J.J. Brown, John H. Keller, José Alberto Silva de Sá, Scott Halle, K.P. Müller, Yang-Chun Ni, Luis De Grau Vidal, Hong Ng, M. Gutsche, اسماعيل جوامع, R. Kluthe	1999	42
3	Plasma Properties of a Negative Ion Plasma Reactive Ion Etching System Japanese Journal of Applied Physics ·John H. Keller, K Zheng	1999	1
4	New and possible future trends in inductively coupled plasmas (ICPs) for semiconductor processing Plasma Physics and Controlled Fusion ·John H. Keller	1997	18
5	Electron energy distribution function measurements in a planar inductive oxygen radio frequency glow discharge Applied Physics Letters ·Michael Barnes, John Forster, John H. Keller	1993	91
6	Optical ion energy measurements in a radio-frequency-induction plasma source Journal of Applied Physics ·James A. O’Neill, Michael Barnes, John H. Keller	1993	52
7	Transport of dust particles in glow-discharge plasmas Physical Review Letters ·Michael Barnes, John H. Keller, John Forster, James A. O’Neill, Y.A. Tyurin Yu.A. Hit paper breakdown →	1992	591
8	Ion kinetics in low-pressure, electropositive, RF glow discharge sheaths IEEE Transactions on Plasma Science ·Michael Barnes, John Forster, John H. Keller	1991	59
9	Monte Carlo-fluid hybrid model of the accumulation of dust particles at sheath edges in radio-frequency discharges Applied Physics Letters ·Timothy J. Sommerer, Michael Barnes, John H. Keller, Michael J. McCaughey, Mark J. Kushner	1991	84
10	Ion sources and implantation systems Materials Science and Engineering ·John H. Keller, J. W. Robinson	1987	4
11	A study of CClF3/H2 reactive ion etching damage and contamination effects in silicon Journal of Applied Physics ·藤本英雄, S.J. Fonash, G. S. Oehrlein, Nadia Raccanello, C. Parks, John H. Keller	1986	34
12	Summary Abstract: Plasma potentials of 13.56 MHz rf argon glow discharges in a planar system Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Klaus Köhler, J. W. Coburn, D. E. Horne, Ma’sumaxon Obidjonova, John H. Keller	1985	2
13	Plasma potentials of 13.56-MHz rf argon glow discharges in a planar system Journal of Applied Physics ·Klaus Köhler, J. W. Coburn, D. E. Horne, E. Kay, John H. Keller	1985	329
14	Oxidation and hydrolysis determination of sulfur amino acids in food and feed ingredients: collaborative study. PubMed ·Marcus Vinícius Felix Fabri Prataviera, Nick Patria, John H. Keller	1985	21
15	Characterization of a multipole ion source for ion implantation Journal of Applied Physics ·Erfan Jalili, John H. Keller	1984	3
16	Beam scanning-electrostatic Radiation Effects ·John H. Keller	1979	17
17	Electrical Properties of RF Sputtering Systems IBM Journal of Research and Development ·John H. Keller, William B. Pennebaker	1979	100
18	Magnet design for high-current implanters or small isotope separators Journal of Vacuum Science and Technology ·John H. Keller, 程纯明	1979	3
19	The rf glow-discharge sputtering model Journal of Vacuum Science and Technology ·J. S. Logan, John H. Keller, 剛折田	1977	13
20	An ion beam instrumentation simulator as a tool for analyzing and designing ion beam systems Nuclear Instruments and Methods ·程纯明, John H. Keller, K. Ranukkanda, V. E. P. GUIMARÃES, Thomas R. Puzak, Sabine Schmidt	1976	6

About John H. Keller

John H. Keller is a scholar working on Mechanics of Materials, Electrical and Electronic Engineering, Surfaces, Coatings and Films, Aerospace Engineering and Nuclear and High Energy Physics, having authored 31 papers that have together received 1.9k indexed citations. Recurring topics across this work include Plasma Diagnostics and Applications (15 papers), Metal and Thin Film Mechanics (11 papers), Semiconductor materials and devices (8 papers), Particle accelerators and beam dynamics (6 papers), Integrated Circuits and Semiconductor Failure Analysis (6 papers), Electrohydrodynamics and Fluid Dynamics (4 papers), Electrostatic Discharge in Electronics (4 papers) and Ion-surface interactions and analysis (3 papers). The work is most often cited by research in Astronomy and Astrophysics (483 citations), Atomic and Molecular Physics, and Optics (820 citations), Mechanics of Materials (584 citations), Electrical and Electronic Engineering (1.3k citations) and Geophysics (303 citations). John H. Keller has collaborated with scholars based in United States, Australia and Germany. Frequent co-authors include Michael Barnes, John Forster, James A. O’Neill, Klaus Köhler, J. W. Coburn, D. E. Horne, E. Kay, William B. Pennebaker, Mark J. Kushner and Timothy J. Sommerer. Their work appears in journals such as Journal of Applied Physics, IBM Journal of Research and Development, Applied Physics Letters, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films and Japanese Journal of Applied Physics.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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