Michael Barnes

1.8k total citations · 1 hit paper
18 papers, 1.5k citations indexed

About

Michael Barnes is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Michael Barnes has authored 18 papers receiving a total of 1.5k indexed citations (citations by other indexed papers that have themselves been cited), including 14 papers in Electrical and Electronic Engineering, 7 papers in Mechanics of Materials and 3 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Michael Barnes's work include Plasma Diagnostics and Applications (13 papers), Metal and Thin Film Mechanics (6 papers) and Electrohydrodynamics and Fluid Dynamics (3 papers). Michael Barnes is often cited by papers focused on Plasma Diagnostics and Applications (13 papers), Metal and Thin Film Mechanics (6 papers) and Electrohydrodynamics and Fluid Dynamics (3 papers). Michael Barnes collaborates with scholars based in United States and Canada. Michael Barnes's co-authors include John H. Keller, John Forster, James A. O’Neill, M.E. Elta, Mark J. Kushner, John Holland, Michael Grapperhaus, Timothy J. Sommerer, Michael J. McCaughey and Walter Gekelman and has published in prestigious journals such as Physical Review Letters, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

Michael Barnes

18 papers receiving 1.4k citations

Hit Papers

Transport of dust particles in glow-discharge plasmas 1992 2026 2003 2014 1992 100 200 300 400 500
What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

  1. Transport of dust particles in glow-discharge plasmas
    1992 591 citations Michael Barnes, John H. Keller et al. Physical Review Letters profile →

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Michael Barnes United States 14 995 819 488 417 298 18 1.5k
B. N. Ganguly United States 21 836 0.8× 372 0.5× 219 0.4× 206 0.5× 75 0.3× 63 1.5k
K. Matyash Germany 20 819 0.8× 581 0.7× 224 0.5× 200 0.5× 54 0.2× 62 1.1k
J. L. Giuliani United States 20 598 0.6× 646 0.8× 90 0.2× 472 1.1× 133 0.4× 160 1.5k
Sanqiu Liu China 19 201 0.2× 675 0.8× 425 0.9× 91 0.2× 169 0.6× 154 1.4k
Suk‐Ho Hong South Korea 20 305 0.3× 365 0.4× 185 0.4× 209 0.5× 76 0.3× 118 1.3k
K.‐U. Riemann Germany 24 2.3k 2.4× 1.5k 1.9× 317 0.6× 840 2.0× 34 0.1× 51 2.6k
P.J. Turchi United States 17 721 0.7× 200 0.2× 218 0.4× 201 0.5× 85 0.3× 146 1.3k
R. S. Devoto United States 16 593 0.6× 1.1k 1.3× 138 0.3× 517 1.2× 68 0.2× 42 1.7k
B. R. Kusse United States 21 306 0.3× 499 0.6× 231 0.5× 452 1.1× 74 0.2× 151 1.5k
M.G. Mazarakis United States 21 783 0.8× 864 1.1× 77 0.2× 161 0.4× 50 0.2× 115 1.6k

Countries citing papers authored by Michael Barnes

Since Specialization
Citations

This map shows the geographic impact of Michael Barnes's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Michael Barnes with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Michael Barnes more than expected).

Fields of papers citing papers by Michael Barnes

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Michael Barnes. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Michael Barnes. The network helps show where Michael Barnes may publish in the future.

Co-authorship network of co-authors of Michael Barnes

This figure shows the co-authorship network connecting the top 25 collaborators of Michael Barnes. A scholar is included among the top collaborators of Michael Barnes based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Michael Barnes. Michael Barnes is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

18 of 18 papers shown
1.
Barnes, Michael, et al.. (2016). Fluxless Chip Join Process Using Formic Acid Atmosphere in a Continuous Mass Reflow Furnace. 574–579. 17 indexed citations
2.
Gekelman, Walter, et al.. (2011). Temporally resolved ion velocity distribution measurements in a radio-frequency plasma sheath. Physics of Plasmas. 18(5). 10 indexed citations
3.
Gekelman, Walter, et al.. (2010). Phase-Resolved Measurements of Ion Velocity in a Radio-Frequency Sheath. Physical Review Letters. 105(7). 15 indexed citations
4.
Hart, Gary C., et al.. (2010). Start of structural damage in stucco walls. The Structural Design of Tall and Special Buildings. 21(1). 16–27. 1 indexed citations
5.
Hart, Gary C., et al.. (2010). High performance/smart and living buildings: the benefits of using viscous dampers on a high‐rise building (Part I). The Structural Design of Tall and Special Buildings. 19(4). 457–477. 7 indexed citations
6.
Gekelman, Walter, Michael Barnes, S. Vincena, & Patrick Pribyl. (2009). Correlation Analysis of Waves above a Capacitive Plasma Applicator. Physical Review Letters. 103(4). 45003–45003. 4 indexed citations
7.
Gekelman, Walter, et al.. (2007). Laser-induced fluorescence measurements in an inductively coupled plasma reactor. Applied Physics Letters. 91(16). 17 indexed citations
8.
Barnes, Michael, et al.. (1998). Studies of the low-pressure inductively-coupled plasma etching for a larger area wafer using plasma modeling and Langmuir probe. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 16(1). 100–107. 65 indexed citations
9.
Kushner, Mark J., et al.. (1996). A three-dimensional model for inductively coupled plasma etching reactors: Azimuthal symmetry, coil properties, and comparison to experiments. Journal of Applied Physics. 80(3). 1337–1344. 92 indexed citations
10.
Barnes, Michael, John Forster, & John H. Keller. (1993). Electron energy distribution function measurements in a planar inductive oxygen radio frequency glow discharge. Applied Physics Letters. 62(21). 2622–2624. 91 indexed citations
11.
O’Neill, James A., Michael Barnes, & John H. Keller. (1993). Optical ion energy measurements in a radio-frequency-induction plasma source. Journal of Applied Physics. 73(4). 1621–1626. 52 indexed citations
12.
Keller, John H., John Forster, & Michael Barnes. (1993). Novel radio-frequency induction plasma processing techniques. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 11(5). 2487–2491. 212 indexed citations
13.
Barnes, Michael, et al.. (1992). Transport of dust particles in glow-discharge plasmas. Physical Review Letters. 68(3). 313–316. 591 indexed citations breakdown →
14.
Barnes, Michael, John Forster, & John H. Keller. (1991). Ion kinetics in low-pressure, electropositive, RF glow discharge sheaths. IEEE Transactions on Plasma Science. 19(2). 240–244. 59 indexed citations
15.
Sommerer, Timothy J., Michael Barnes, John H. Keller, Michael J. McCaughey, & Mark J. Kushner. (1991). Monte Carlo-fluid hybrid model of the accumulation of dust particles at sheath edges in radio-frequency discharges. Applied Physics Letters. 59(6). 638–640. 84 indexed citations
16.
Barnes, Michael, et al.. (1988). A staggered-mesh finite-difference numerical method for solving the transport equations in low pressure rf glow discharges. Journal of Computational Physics. 77(1). 53–72. 61 indexed citations
17.
Barnes, Michael, et al.. (1988). A Monte Carlo microtopography model for investigating plasma/reactive ion etch profile evolution. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 6(2). 542–550. 18 indexed citations
18.
Barnes, Michael, et al.. (1987). Large-signal time-domain modeling of low-pressure rf glow discharges. Journal of Applied Physics. 61(1). 81–89. 122 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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