J. Nulman

1.1k citations

45 papers · 782 indexed · h-index 12

Impact in

Industrial and Manufacturing Engineering top 2%
- Scheduling and Optimization Algorithms
- Manufacturing Process and Optimization
- Advanced Manufacturing and Logistics Optimization
Electrical and Electronic Engineering top 10%
- Semiconductor materials and devices
- Advancements in Semiconductor Devices and Circuit Design

Papers in

Electrical and Electronic Engineering 40
- Semiconductor materials and devices 24
- Advancements in Semiconductor Devices and Circuit Design 13
- Thin-Film Transistor Technologies 7
- Silicon and Solar Cell Technologies 6
Mechanics of Materials 8
- Metal and Thin Film Mechanics 6

Co-authors: J.P. Krusius A. Gat Yang Yang Mengze Li Francesca Iacopi Jianfeng Zhu Shaowei Liao T.C. Mele
Journals: IEEE Transactions on Electron Devices (6 papers)IEEE Electron Device Letters (5 papers)Applied Physics Letters (3 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2 papers)Vacuum (1 paper)
Partner nations: United States Australia Israel

In The Last Decade

J. Nulman

43 papers receiving 745 citations

Peers

Countries citing papers authored by J. Nulman

Since Specialization

Citations

This map shows the geographic impact of J. Nulman's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. Nulman with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. Nulman more than expected).

Fields of papers citing papers by J. Nulman

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J. Nulman. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. Nulman. The network helps show where J. Nulman may publish in the future.

Co-authorship network

The 25 scholars most cited alongside J. Nulman, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with J. Nulman Line = papers co-authored together J. Nulman links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Unique multi -level metal layer electronics solutions offered by advanced 3D printing Mengze Li, Yang Yang, J. Nulman, Minoru Yamada, Francesca Iacopi	2022	2
2	Additively Manufactured Millimeter-Wave Dual-Band Single-Polarization Shared Aperture Fresnel Zone Plate Metalens Antenna IEEE Transactions on Antennas and Propagation ·Jianfeng Zhu, Yang Yang, Mengze Li, David McGloin, Shaowei Liao, J. Nulman, Minoru Yamada, Francesca Iacopi	2021	56
3	A Fully Integrated Conductive and Dielectric Additive Manufacturing Technology for Microwave Circuits and Antennas Mengze Li, Yang Yang, Yunpeng Zhang, Francesca Iacopi, Michelle Adrianne da Costa de Jesus, J. Nulman	2021	8
4	3D-Printed Low-Profile Single-Substrate Multi-Metal Layer Antennas and Array With Bandwidth Enhancement IEEE Access ·Mengze Li, Yang Yang, Francesca Iacopi, J. Nulman, Indah Yuliani	2020	34
5	A novel low-temperature process for high dielectric constant BST thin films for ULSI DRAM applications R. Khamankar, Bo Jiang, R. Tsu, William Y. Hsu, J. Nulman, Scott R. Summerfelt, Michael Anthony, Stefanie Stürner	2002	2
6	Sub-quarter micron metallization using ionized metal plasma (IMP) technology Vacuum ·Y. Tanaka, 建次甲斐, Adwapa Gladys, John Forster, Ante Cvitanović, José Luis Palazón Martínez, J. Nulman, Feng Chen	1998	6
7	A steady-state throughput analysis of cluster tools: dual-blade versus single-blade robots IEEE Transactions on Semiconductor Manufacturing ·Báo Db, 文久橋本, Fernanda Patrícia Gullo Luzente, J. Nulman	1997	209
8	<title>Correlation between aluminum alloy sputtering target metallurgical characteristics, arc initiation, and in-film defect intensity</title> Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Ana Karina Soccheta Barros de Figueiredo, Shikang Gao, S. Chiang, Alberto Onofre, Karlee F. Kleiber, Chang H. Kuo, B. Smadja, J. Nulman, D. Restaino	1997	5
9	Observation of silicon wafer emissivity in rapid thermal processing chambers for pyrometric temperature monitoring Applied Physics Letters ·J. Nulman, 肖斌, Ray Harishankar	1990	20
10	Emissivity Issues In Pyrometric Temperature Monitoring For RTP Systems Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·J. Nulman	1990	6
11	Gate bias polarity dependence of charge trapping and time-dependent dielectric breakdown in nitrided and reoxidized nitrided oxides IEEE Electron Device Letters ·A.T. Wu, V. Murali, J. Nulman, B. B. Triplett, David B. Fraser, 大平純二	1989	28
12	A Comparison of RTO and Furnace Oxides MRS Proceedings ·Ramdani Salam, Joshua J Dalupe, J. Nulman, Peter Fejes, Xue Xiaol	1987	2
13	Low Temperature Rapid Thermal Formation of Tin Barrier Layers MRS Proceedings ·Dimitra Nastouli, J. Nulman	1987	2
14	Self-aligned dual surface lithography Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ·J.P. Krusius, J. Nulman, Wlodzimierz Wieczlak	1986	1
15	Ultrathin gate dielectrics on 150 mm Si wafers via rapid thermal processing Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·J. Nulman, J.P. Krusius, Intan Mustika Ramadhani, A. Gat, Phillip S. Brody	1986	8
16	Characterization of PSG Films Reflowed in Steam Using Rapid Thermal Processing MRS Proceedings ·P Uroservich, Sonia Souto-Camba, Niloufar Sharif, J. Nulman, Amir D. Gat	1985	2
17	Selective and anisotropic reactive ion etch of LPCVD silicon nitride with CHF3 based gases Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ·T.C. Mele, J. Nulman, J.P. Krusius	1984	21
18	Electrical and structural characteristics of thin nitrided gate oxides prepared by rapid thermal nitridation J. Nulman, J.P. Krusius, L. Rathbun	1984	11
19	Local plasma oxidation and reactive ion etching of metal films for ultrafine line pattern inversion and transfer Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ·J. Nulman, J.P. Krusius	1983	4
20	Two-and three-dimensional analytical solutions for post-anneal implant profiles through arbitrary mask edges IEEE Transactions on Electron Devices ·J.P. Krusius, J. Nulman, 陈吉力, J. Frey	1982	5

About J. Nulman

J. Nulman is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials, Electronic, Optical and Magnetic Materials, Aerospace Engineering and Atomic and Molecular Physics, and Optics, having authored 45 papers that have together received 782 indexed citations. Recurring topics across this work include Semiconductor materials and devices (24 papers), Advancements in Semiconductor Devices and Circuit Design (13 papers), Thin-Film Transistor Technologies (7 papers), Advanced Antenna and Metasurface Technologies (7 papers), Antenna Design and Analysis (7 papers), Semiconductor materials and interfaces (6 papers), Silicon and Solar Cell Technologies (6 papers) and Metal and Thin Film Mechanics (6 papers). The work is most often cited by research in Industrial and Manufacturing Engineering (209 citations), Electrical and Electronic Engineering (412 citations), Aerospace Engineering (152 citations), Electronic, Optical and Magnetic Materials (112 citations) and Computational Theory and Mathematics (89 citations). J. Nulman has collaborated with scholars based in United States, Australia and Israel. Frequent co-authors include J.P. Krusius, A. Gat, Yang Yang, Mengze Li, Francesca Iacopi, Jianfeng Zhu, Shaowei Liao, T.C. Mele, Minoru Yamada and Minoru Yamada. Their work appears in journals such as IEEE Transactions on Electron Devices, IEEE Electron Device Letters, Applied Physics Letters, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films and Vacuum.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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