Vacuum

230.1k citations
17.1k papers · indexed · active since 1950

Vacuum

16.0k papers receiving 217.0k citations

Peers

Vacuum
Comparison fields: 5 of 227
  • Materials Chemistry 119.1k
  • Mechanics of Materials 50.3k
  • Ceramics and Composites 8.9k
  • Mechanical Engineering 57.0k
  • Surfaces, Coatings and Films 10.7k
Replace Review of Scientific Instruments with:
Review of Scientific Instruments United States
Applied Physics A China
Computational Materials Science China
physica status solidi (b) Germany
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films United States
Journal of Material Science and Technology China
Materials science forum China
Materials & Design China
Advanced Engineering Materials China
Powder Technology China
Vacuum relative to Review of Scientific Instruments United States Review of Scientific Instruments's profile →
Citations per field
00.5×1.5×
Review of Scientific Instruments · 1×
Citations per year

Countries where authors publish in Vacuum

Since Specialization
Citations

This map shows the geographic impact of research published in Vacuum. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by papers published in Vacuum with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Vacuum more than expected).

Fields of papers published in Vacuum

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers published in Vacuum. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers published in Vacuum.

About Vacuum

The 17.1k papers published in Vacuum in the last decades have received a total of 230.1k indexed citations . Papers published in Vacuum usually cover Materials Chemistry (7.6k papers), Surfaces, Coatings and Films (1.1k papers), Mechanics of Materials (3.7k papers), Electrical and Electronic Engineering (6.9k papers) and Computational Mechanics (2.1k papers) specifically the topics of Metal and Thin Film Mechanics (3.0k papers), Semiconductor materials and devices (1.9k papers), Diamond and Carbon-based Materials Research (1.7k papers), Ion-surface interactions and analysis (1.7k papers), Plasma Diagnostics and Applications (1.4k papers), ZnO doping and properties (1.3k papers), Advanced materials and composites (846 papers) and Gas Sensing Nanomaterials and Sensors (815 papers). The most active scholars publishing in Vacuum are P. A. Redhead, M.E. Haine, W Steckelmacher, Lars Hultman, Peter Kelly, R.D. Arnell, M.K. Miller, Yong Pan, J. Azoulay and J. Musil.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore journals with similar magnitude of impact

Rankless by CCL
2026