I. Hoflijk

816 total citations
56 papers, 670 citations indexed

About

I. Hoflijk is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Radiation. According to data from OpenAlex, I. Hoflijk has authored 56 papers receiving a total of 670 indexed citations (citations by other indexed papers that have themselves been cited), including 36 papers in Electrical and Electronic Engineering, 27 papers in Surfaces, Coatings and Films and 25 papers in Radiation. Recurrent topics in I. Hoflijk's work include Electron and X-Ray Spectroscopy Techniques (27 papers), X-ray Spectroscopy and Fluorescence Analysis (24 papers) and Semiconductor materials and devices (23 papers). I. Hoflijk is often cited by papers focused on Electron and X-Ray Spectroscopy Techniques (27 papers), X-ray Spectroscopy and Fluorescence Analysis (24 papers) and Semiconductor materials and devices (23 papers). I. Hoflijk collaborates with scholars based in Belgium, United States and Netherlands. I. Hoflijk's co-authors include Trudo Clarysse, Wilfried Vandervorst, Marc Meuris, Thierry Conard, Brice De Jaeger, A. Satta, Eddy Simoen, A. Benedetti, Bert Brijs and Tom Janssens and has published in prestigious journals such as Applied Physics Letters, Journal of The Electrochemical Society and Thin Solid Films.

In The Last Decade

I. Hoflijk

54 papers receiving 657 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
I. Hoflijk Belgium 13 602 254 188 85 77 56 670
C. J. Hitzman United States 9 503 0.8× 242 1.0× 140 0.7× 112 1.3× 59 0.8× 22 607
E. Wintersberger Austria 13 442 0.7× 418 1.6× 279 1.5× 298 3.5× 28 0.4× 24 694
P. Mur France 17 727 1.2× 215 0.8× 499 2.7× 254 3.0× 54 0.7× 53 890
Katsunori Makihara Japan 12 496 0.8× 219 0.9× 338 1.8× 124 1.5× 44 0.6× 130 615
M. V. Gomoyunova Russia 12 165 0.3× 303 1.2× 189 1.0× 57 0.7× 36 0.5× 65 450
Seiichi Iwata Japan 9 489 0.8× 142 0.6× 198 1.1× 33 0.4× 77 1.0× 33 565
M. Alonso Spain 12 367 0.6× 411 1.6× 192 1.0× 71 0.8× 33 0.4× 40 636
G. Zoth Germany 5 570 0.9× 286 1.1× 306 1.6× 97 1.1× 53 0.7× 10 710
H.L. Hughes United States 15 605 1.0× 62 0.2× 221 1.2× 43 0.5× 62 0.8× 62 684
D.P. Datta India 14 386 0.6× 89 0.4× 322 1.7× 89 1.0× 449 5.8× 40 567

Countries citing papers authored by I. Hoflijk

Since Specialization
Citations

This map shows the geographic impact of I. Hoflijk's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by I. Hoflijk with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites I. Hoflijk more than expected).

Fields of papers citing papers by I. Hoflijk

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by I. Hoflijk. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by I. Hoflijk. The network helps show where I. Hoflijk may publish in the future.

Co-authorship network of co-authors of I. Hoflijk

This figure shows the co-authorship network connecting the top 25 collaborators of I. Hoflijk. A scholar is included among the top collaborators of I. Hoflijk based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with I. Hoflijk. I. Hoflijk is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Lagrain, Pieter, Stefanie Sergeant, I. Hoflijk, et al.. (2024). Achieving High Ferroelectric Polarization in Ultrathin BaTiO3 Films on Si. Advanced Electronic Materials. 11(4). 3 indexed citations
2.
Darnon, Maxime, et al.. (2024). Transient-assisted plasma etching (TAPE): Concept, mechanism, and prospects. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 42(3). 1 indexed citations
3.
Hoflijk, I., et al.. (2023). High energy x-ray photoelectron spectroscopy (HAXPES) Cr Kα measurement of bulk bismuth. Surface Science Spectra. 30(2). 1 indexed citations
4.
Hoflijk, I., et al.. (2023). High energy x-ray photoelectron spectroscopy (HAXPES) Cr Kα measurement of bulk Ag. Surface Science Spectra. 30(2). 1 indexed citations
5.
Hoflijk, I., et al.. (2023). High energy x-ray photoelectron spectroscopy (HAXPES) Cr Kα measurement of bulk gold. Surface Science Spectra. 30(2). 1 indexed citations
6.
Hoflijk, I., et al.. (2023). HAXPES Cr Kα measurement of bulk indium. Surface Science Spectra. 30(2). 1 indexed citations
7.
Hoflijk, I., et al.. (2023). High energy x-ray photoelectron spectroscopy Cr Kα measurement of bulk gadolinium. Surface Science Spectra. 30(2). 1 indexed citations
8.
Hoflijk, I., et al.. (2023). HAXPES Cr Kα measurement of bulk hafnium. Surface Science Spectra. 30(2). 1 indexed citations
9.
10.
Hoflijk, I., et al.. (2022). High-energy x-ray photoelectron spectroscopy spectra of TiN measured by Cr Kα. Surface Science Spectra. 29(1). 2 indexed citations
11.
Hoflijk, I., et al.. (2022). HAXPES on SiO2 with Ga Kα photons. Surface Science Spectra. 29(1). 2 indexed citations
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14.
Frank, Martin M., Rita Vos, Sophia Arnauts, et al.. (2007). Post Ion-Implant Photoresist Removal via Wet Chemical Cleans Combined with Physical Force Pretreatments. ECS Transactions. 11(2). 219–226. 10 indexed citations
15.
Elshocht, Sven Van, Matty Caymax, Thierry Conard, et al.. (2006). Study of CVD high-k gate oxides on high-mobility Ge and Ge/Si substrates. Thin Solid Films. 508(1-2). 1–5. 14 indexed citations
16.
Satta, A., Eddy Simoen, Tom Janssens, et al.. (2006). Shallow Junction Ion Implantation in Ge and Associated Defect Control. Journal of The Electrochemical Society. 153(3). G229–G229. 62 indexed citations
17.
Puurunen, Riikka L., Annelies Delabie, Sven Van Elshocht, et al.. (2005). Hafnium oxide films by atomic layer deposition for high-κ gate dielectric applications: Analysis of the density of nanometer-thin films. Applied Physics Letters. 86(7). 40 indexed citations
18.
Satta, A., Tom Janssens, Trudo Clarysse, et al.. (2005). P implantation on doping of Ge: diffusion, activation, re-crystallization. 2 indexed citations
19.
Clarysse, Trudo, et al.. (2004). Characterization of electrically active dopant profiles with the spreading resistance probe. Materials Science and Engineering R Reports. 47(5-6). 123–206. 43 indexed citations
20.
Zhang, Wenqi, Sywert Brongersma, Trudo Clarysse, et al.. (2003). The thickness and temperature dependent resistivity of thin copper films. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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