Hayato Iwamoto

1.2k total citations
76 papers, 796 citations indexed

About

Hayato Iwamoto is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Hayato Iwamoto has authored 76 papers receiving a total of 796 indexed citations (citations by other indexed papers that have themselves been cited), including 72 papers in Electrical and Electronic Engineering, 14 papers in Biomedical Engineering and 11 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Hayato Iwamoto's work include Semiconductor materials and devices (32 papers), 3D IC and TSV technologies (24 papers) and Electronic Packaging and Soldering Technologies (16 papers). Hayato Iwamoto is often cited by papers focused on Semiconductor materials and devices (32 papers), 3D IC and TSV technologies (24 papers) and Electronic Packaging and Soldering Technologies (16 papers). Hayato Iwamoto collaborates with scholars based in Japan, Taiwan and United States. Hayato Iwamoto's co-authors include Yoshiya Hagimoto, Y. Kagawa, Nobutoshi Fujii, S. Kadomura, Suguru Saito, Takuichi Hirano, Keiji Tatani, Yuka Kobayashi, K. Ohno and Hiroki Nakayama and has published in prestigious journals such as Applied Physics Letters, Scientific Reports and IEEE Journal of Solid-State Circuits.

In The Last Decade

Hayato Iwamoto

68 papers receiving 694 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Hayato Iwamoto Japan 15 728 146 110 103 67 76 796
Byung Jae Chun South Korea 14 364 0.5× 293 2.0× 114 1.0× 78 0.8× 39 0.6× 27 713
Nobutoshi Fujii Japan 13 425 0.6× 92 0.6× 135 1.2× 195 1.9× 12 0.2× 34 513
Guoliang Deng China 15 387 0.5× 159 1.1× 86 0.8× 51 0.5× 13 0.2× 109 714
S. Kadomura Japan 11 499 0.7× 79 0.5× 75 0.7× 170 1.7× 8 0.1× 43 542
M. Bartek Netherlands 18 707 1.0× 288 2.0× 97 0.9× 28 0.3× 9 0.1× 90 853
David N. Hutchison United States 6 445 0.6× 132 0.9× 78 0.7× 28 0.3× 61 0.9× 7 577
Guangyao Liu China 15 464 0.6× 94 0.6× 58 0.5× 130 1.3× 24 0.4× 41 691
Zhiyi Zhang China 13 400 0.5× 163 1.1× 47 0.4× 41 0.4× 4 0.1× 50 693
Honglei Chen China 10 225 0.3× 133 0.9× 141 1.3× 42 0.4× 23 0.3× 59 559
Ridha Ben Mrad Canada 13 283 0.4× 209 1.4× 57 0.5× 20 0.2× 13 0.2× 39 452

Countries citing papers authored by Hayato Iwamoto

Since Specialization
Citations

This map shows the geographic impact of Hayato Iwamoto's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Hayato Iwamoto with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Hayato Iwamoto more than expected).

Fields of papers citing papers by Hayato Iwamoto

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Hayato Iwamoto. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Hayato Iwamoto. The network helps show where Hayato Iwamoto may publish in the future.

Co-authorship network of co-authors of Hayato Iwamoto

This figure shows the co-authorship network connecting the top 25 collaborators of Hayato Iwamoto. A scholar is included among the top collaborators of Hayato Iwamoto based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Hayato Iwamoto. Hayato Iwamoto is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Komai, Norihiko, et al.. (2025). Simulation of Mechanical Cu-Pad Expansion Mechanism and Measures to Increase Expansion. 1488–1492. 1 indexed citations
2.
Nakamura, Ryoichi, H. Yamagishi, Yoshiyuki Suda, et al.. (2024). A Novel 1/1.3-inch 50 Megapixel Three-wafer-stacked CMOS Image Sensor with DNN Circuit for Edge Processing. 1–4. 3 indexed citations
3.
Enoki, Osamu, et al.. (2024). Pb-Free Colloidal InAs Quantum Dot Image Sensor for Infrared. 1–4. 1 indexed citations
4.
5.
Watanabe, Heiji, et al.. (2024). Comprehensive research on nitrided SiO2/SiC interfaces by high-temperature nitric oxide annealing formed on basal and non-basal planes. Japanese Journal of Applied Physics. 64(1). 10801–10801.
6.
Tatsumi, Tetsuya, et al.. (2023). Modeling and simulation of coverage and film properties in deposition process on large-scale pattern using statistical ensemble method. Japanese Journal of Applied Physics. 62(SI). SI1006–SI1006. 1 indexed citations
7.
Hirata, Akiko, Masanaga Fukasawa, Yoshiya Hagimoto, et al.. (2023). High-throughput SiN ALE: surface reaction and ion-induced damage generation mechanisms. Japanese Journal of Applied Physics. 62(SI). SI1015–SI1015. 1 indexed citations
8.
Hirata, Akiko, Masanaga Fukasawa, Kazuhiro Karahashi, et al.. (2022). Structural and electrical characteristics of ion-induced Si damage during atomic layer etching. Japanese Journal of Applied Physics. 61(SI). SI1003–SI1003. 3 indexed citations
9.
Hirata, Akiko, Masanaga Fukasawa, Yoshiya Hagimoto, et al.. (2022). Five-step plasma-enhanced atomic layer etching of silicon nitride with a stable etched amount per cycle. Japanese Journal of Applied Physics. 61(6). 66002–66002. 9 indexed citations
10.
Kodama, Yoshinori, et al.. (2020). Diffusion mechanism of fluorine in plasma processing of III–V semiconductor compounds. Japanese Journal of Applied Physics. 59(SJ). SJJB01–SJJB01. 6 indexed citations
11.
Hirata, Akiko, Masanaga Fukasawa, K. Kugimiya, et al.. (2020). On-wafer monitoring and control of ion energy distribution for damage minimization in atomic layer etching processes. Japanese Journal of Applied Physics. 59(SJ). SJJC01–SJJC01. 15 indexed citations
12.
Kagawa, Y. & Hayato Iwamoto. (2019). 3D Integration Technologies for the Stacked CMOS Image Sensors. 1–4. 14 indexed citations
13.
Yokogawa, Sozo, et al.. (2017). IR sensitivity enhancement of CMOS Image Sensor with diffractive light trapping pixels. Scientific Reports. 7(1). 3832–3832. 52 indexed citations
14.
Hagimoto, Yoshiya, et al.. (2012). Elucidation of an Isopropyl Alcohol (IPA) Adsorption Phenomenon on a Wafer Surface for Achieving an Ultra-Clean and IPA-Saving Drying Process in the Batch Cleaning System. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 187. 79–82. 1 indexed citations
15.
Hagimoto, Yoshiya, et al.. (2009). Defects of Silicon Substrates Caused by Electro-Static Discharge in Single Wafer Cleaning Process. Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena. 145-146. 185–188. 2 indexed citations
16.
Fujita, Shigeru, Hayato Iwamoto, S. Kadomura, et al.. (2008). Characteristics of in-situ phosphorus-doped silicon selective epitaxial growth at atmospheric pressure. Journal of Crystal Growth. 310(21). 4507–4510. 9 indexed citations
17.
Tanaka, Kazuki, Takashi Ando, Masashi Nakata, et al.. (2008). Threshold Voltage Modulation Technique using Fluorine Treatment through Atomic Layer Deposition TiN Suitable for Complementary Metal–Oxide–Semiconductor Devices. Japanese Journal of Applied Physics. 47(4S). 2345–2345. 6 indexed citations
18.
Ando, Takao, Tadafumi Kato, S Kanda, et al.. (2006). High Performance pMOSFET with ALD-TiN/HfO2 Gate Stack on (110) Substrate by Low Temperature Process. 43. 121–124. 4 indexed citations
19.
Ando, Takao, Yoshiya Hagimoto, Tadafumi Kato, et al.. (2006). High Performance Dual Metal Gate CMOS with High Mobility and Low Threshold Voltage Applicable to Bulk CMOS Technology. 152–153. 8 indexed citations
20.
Iwamoto, Hayato, et al.. (2002). A new economical wafer drying technology with high process performance. E13–E16. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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