David N. Hutchison
- Electrical and Electronic Engineering top 10%
- Atomic and Molecular Physics, and Optics top 10%
- Biomedical Engineering
- Materials Chemistry
- Surfaces, Coatings and Films top 10%
- Co-authors
- J. K. DoylendAvi FeshaliHaisheng RongJohn HeckWoosung KimJie SunRanjeet KumarChristopher T. Phare
- Topics
- Carbon Nanotubes in Composites (3 papers)Mechanical and Optical Resonators (3 papers)Advanced MEMS and NEMS Technologies (2 papers)
- Partner nations
- United States
In The Last Decade
David N. Hutchison
7 papers receiving 524 citations
Hit Papers
Peers
Comparison fields: 5 of 47
- Electrical and Electronic Engineering 445
- Atomic and Molecular Physics, and Optics 230
- Biomedical Engineering 132
- Materials Chemistry 78
- Surfaces, Coatings and Films 62
Countries citing papers authored by David N. Hutchison
This map shows the geographic impact of David N. Hutchison's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by David N. Hutchison with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites David N. Hutchison more than expected).
Fields of papers citing papers by David N. Hutchison
This network shows the impact of papers produced by David N. Hutchison. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by David N. Hutchison. The network helps show where David N. Hutchison may publish in the future.
Co-authorship network of co-authors of David N. Hutchison
This figure shows the co-authorship network connecting the top 25 collaborators of David N. Hutchison. A scholar is included among the top collaborators of David N. Hutchison based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with David N. Hutchison. David N. Hutchison is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | High-resolution aliasing-free optical beam steeringbreakdown → | 405 |
| 2 | Graphene rubber band: suspended graphene sheets with controlled uniaxial strain | 1 |
| 3 | 21 | |
| 4 | 60 | |
| 5 | 3D Printing in Space: Enabling New Markets and Accelerating the Growth of Orbital Infrastructure | 16 |
| 6 | 7 | |
| 7 | 67 |
About David N. Hutchison
David N. Hutchison is a scholar working on Atomic and Molecular Physics, and Optics, Materials Chemistry and Automotive Engineering, having authored 7 papers that have together received 577 indexed citations. Recurring topics across this work include Carbon Nanotubes in Composites (3 papers), Mechanical and Optical Resonators (3 papers) and Advanced MEMS and NEMS Technologies (2 papers). The work is most often cited by research in Instrumentation (61 citations), Acoustics and Ultrasonics (11 citations) and Surfaces, Coatings and Films (62 citations). David N. Hutchison has collaborated with scholars based in United States. Frequent co-authors include J. K. Doylend, Avi Feshali, Haisheng Rong, John Heck, Woosung Kim, Jie Sun, Ranjeet Kumar, Christopher T. Phare, Robert C. Davis and Richard Vanfleet. Their work appears in journals such as Advanced Functional Materials, Journal of Microelectromechanical Systems and Optica.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.