Harrison Sejoon Kim

504 total citations
30 papers, 424 citations indexed

About

Harrison Sejoon Kim is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Mechanics of Materials. According to data from OpenAlex, Harrison Sejoon Kim has authored 30 papers receiving a total of 424 indexed citations (citations by other indexed papers that have themselves been cited), including 27 papers in Electrical and Electronic Engineering, 23 papers in Materials Chemistry and 3 papers in Mechanics of Materials. Recurrent topics in Harrison Sejoon Kim's work include Semiconductor materials and devices (20 papers), Ferroelectric and Negative Capacitance Devices (16 papers) and MXene and MAX Phase Materials (12 papers). Harrison Sejoon Kim is often cited by papers focused on Semiconductor materials and devices (20 papers), Ferroelectric and Negative Capacitance Devices (16 papers) and MXene and MAX Phase Materials (12 papers). Harrison Sejoon Kim collaborates with scholars based in United States, South Korea and Japan. Harrison Sejoon Kim's co-authors include Jiyoung Kim, Si Joon Kim, Jaidah Mohan, Yong Chan Jung, Chadwin D. Young, Jaebeom Lee, Su Min Hwang, Luigi Colombo, Scott R. Summerfelt and Tamer San and has published in prestigious journals such as Applied Physics Letters, Scientific Reports and ACS Applied Materials & Interfaces.

In The Last Decade

Harrison Sejoon Kim

29 papers receiving 414 citations

Peers

Countries citing papers authored by Harrison Sejoon Kim

Since Specialization

Citations

This map shows the geographic impact of Harrison Sejoon Kim's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Harrison Sejoon Kim with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Harrison Sejoon Kim more than expected).

Fields of papers citing papers by Harrison Sejoon Kim

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Harrison Sejoon Kim. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Harrison Sejoon Kim. The network helps show where Harrison Sejoon Kim may publish in the future.

Co-authorship network of co-authors of Harrison Sejoon Kim

This figure shows the co-authorship network connecting the top 25 collaborators of Harrison Sejoon Kim. A scholar is included among the top collaborators of Harrison Sejoon Kim based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Harrison Sejoon Kim. Harrison Sejoon Kim is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Thermal budget study to simultaneously achieve low-temperature (<400 °C) process and high endurance of ferroelectric Hf0.5Zr0.5O2 thin films 2025 ·Applied Physics Letters ·(unknown), (unknown), (unknown), (unknown), Jin-Hyun Kim, (unknown), Dushyant Narayan, (unknown), (unknown), Harrison Sejoon Kim, Yong Chan Jung, Rino Choi, Jiyoung Kim, Si Joon Kim	2
2	Analysis of ferroelectric properties of ALD-Hf0.5Zr0.5O2 thin films according to oxygen sources 2024 ·Solid-State Electronics ·(unknown), Yong Chan Jung, (unknown), (unknown), (unknown), (unknown), (unknown), Jin-Hyun Kim, (unknown), Jaidah Mohan, Harrison Sejoon Kim, Jiyoung Kim, Si Joon Kim	2
3	High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane 2022 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Su Min Hwang, Harrison Sejoon Kim, (unknown), (unknown), Jaebeom Lee, Yong Chan Jung, Sangwoo Kim, Si Joon Kim, Rino Choi, Jinho Ahn, (unknown), (unknown), Jiyoung Kim	5
4	Robust low-temperature (350 °C) ferroelectric Hf0.5Zr0.5O2 fabricated using anhydrous H2O2 as the ALD oxidant 2022 ·Applied Physics Letters ·Yong Chan Jung, Jin-Hyun Kim, (unknown), Jaidah Mohan, Su Min Hwang, (unknown), (unknown), Harrison Sejoon Kim, Kihyun Kim, Rino Choi, Chang‐Yong Nam, (unknown), (unknown), Si Joon Kim, (unknown), (unknown)	11
5	Nano-polycrystalline Ag-doped ZnO layer for steep-slope threshold switching selectors 2021 ·AIP Advances ·(unknown), Harrison Sejoon Kim, Jaidah Mohan, (unknown), Yong Chan Jung, Si Joon Kim, Jang‐Sik Lee, Jinho Ahn, (unknown), Jiyoung Kim	2
6	Highly Reliable Selection Behavior With Controlled Ag Doping of Nano-Polycrystalline ZnO Layer for 3D X-Point Framework 2021 ·IEEE Electron Device Letters ·(unknown), Harrison Sejoon Kim, Jaidah Mohan, Yong Chan Jung, (unknown), (unknown), Si Joon Kim, Jang‐Sik Lee, Jinho Ahn, Jiyoung Kim	2
7	Plasma-Enhanced Atomic-Layer Deposition of Nanometer-Thick SiN_x Films Using Trichlorodisilane for Etch-Resistant Coatings 2021 ·ACS Applied Nano Materials ·Su Min Hwang, Harrison Sejoon Kim, (unknown), (unknown), (unknown), Jaebeom Lee, Yong Chan Jung, Si Joon Kim, Jinho Ahn, (unknown), (unknown), (unknown), Jiyoung Kim	11
8	A Novel Combinatorial Approach to the Ferroelectric Properties in Hf_xZr_1−xO₂ Deposited by Atomic Layer Deposition 2021 ·physica status solidi (RRL) - Rapid Research Letters ·Yong Chan Jung, Jaidah Mohan, Su Min Hwang, Jin-Hyun Kim, (unknown), (unknown), Nam Hoon Kim, (unknown), Jean-François Veyan, Harrison Sejoon Kim, Si Joon Kim, Rino Choi, Jiyoung Kim	5
9	Low‐Thermal‐Budget Fluorite‐Structure Ferroelectrics for Future Electronic Device Applications 2021 ·physica status solidi (RRL) - Rapid Research Letters ·Hyojeong Kim, (unknown), Yong Chan Jung, Jaidah Mohan, (unknown), Young In Kim, (unknown), Harrison Sejoon Kim, Jiyoung Kim, Si Joon Kim	6
10	Correlation between ferroelectricity and ferroelectric orthorhombic phase of HfxZr1−xO2 thin films using synchrotron x-ray analysis 2021 ·APL Materials ·Takashi Onaya, Toshihide Nabatame, Yong Chan Jung, (unknown), Jaidah Mohan, Harrison Sejoon Kim, Naomi Sawamoto, Chang‐Yong Nam, Esther H. R. Tsai, Takahiro Nagata, Jiyoung Kim, Atsushi Ogura	19
11	Low Temperature Thermal Atomic Layer Deposition of Aluminum Nitride Using Hydrazine as the Nitrogen Source 2020 ·Materials ·Yong Chan Jung, Su Min Hwang, (unknown), (unknown), Jaidah Mohan, Sangwoo Kim, Jin-Hyun Kim, Antonio T. Lucero, (unknown), Harrison Sejoon Kim, Si Joon Kim, Rino Choi, Jinho Ahn, (unknown), (unknown), (unknown), (unknown)	13
12	A Comprehensive Study on the Effect of TiN Top and Bottom Electrodes on Atomic Layer Deposited Ferroelectric Hf0.5Zr0.5O2 Thin Films 2020 ·Materials ·Si Joon Kim, Jaidah Mohan, Harrison Sejoon Kim, Su Min Hwang, (unknown), Yong Chan Jung, (unknown), Kihyun Kim, Hyun‐Yong Yu, Pil-Ryung Cha, Chadwin D. Young, Rino Choi, Jinho Ahn, Jiyoung Kim	36
13	Improvement in ferroelectricity and breakdown voltage of over 20-nm-thick HfxZr1−xO2/ZrO2 bilayer by atomic layer deposition 2020 ·Applied Physics Letters ·Takashi Onaya, Toshihide Nabatame, (unknown), Yong Chan Jung, (unknown), Jaidah Mohan, Harrison Sejoon Kim, Naomi Sawamoto, Takahiro Nagata, Jiyoung Kim, Atsushi Ogura	27
14	Ozone based high-temperature atomic layer deposition of SiO ₂ thin films 2020 ·Japanese Journal of Applied Physics ·Su Min Hwang, (unknown), Harrison Sejoon Kim, (unknown), Yong Chan Jung, Si Joon Kim, Jinho Ahn, (unknown), Jiyoung Kim	4
15	Top-down fabrication of high-uniformity nanodiamonds by self-assembled block copolymer masks 2019 ·Scientific Reports ·Jiabao Zheng, Benjamin Lienhard, Gregory S. Doerk, Mircea Cotlet, Eric Bersin, Harrison Sejoon Kim, Youngchul Byun, Chang‐Yong Nam, Jiyoung Kim, Charles T. Black, Dirk Englund	11
16	Realization of Spatially Addressable Library by a Novel Combinatorial Approach on Atomic Layer Deposition: A Case Study of Zinc Oxide 2019 ·ACS Combinatorial Science ·Harrison Sejoon Kim, Joy S. Lee, Si Joon Kim, Jaebeom Lee, Antonio T. Lucero, Myung Mo Sung, Jiyoung Kim	4
17	Hollow Cathode Plasma (HCP) Enhanced Atomic Layer Deposition of Silicon Nitride (SiN_x) Thin Films Using Pentachlorodisilane (PCDS) 2019 ·ECS Transactions ·Su Min Hwang, (unknown), (unknown), Harrison Sejoon Kim, Xin Meng, Jiyoung Kim, (unknown), (unknown), (unknown), (unknown)	6
18	Stress-Induced Crystallization of Thin Hf_1–XZr_XO₂ Films: The Origin of Enhanced Energy Density with Minimized Energy Loss for Lead-Free Electrostatic Energy Storage Applications 2019 ·ACS Applied Materials & Interfaces ·Si Joon Kim, Jaidah Mohan, Joy S. Lee, Harrison Sejoon Kim, Jaebeom Lee, Chadwin D. Young, Luigi Colombo, Scott R. Summerfelt, Tamer San, Jiyoung Kim	31
19	Investigation of the Physical Properties of Plasma Enhanced Atomic Layer Deposited Silicon Nitride as Etch Stopper 2018 ·ACS Applied Materials & Interfaces ·Harrison Sejoon Kim, Xin Meng, Si Joon Kim, Antonio T. Lucero, Lanxia Cheng, Youngchul Byun, Joy S. Lee, Su Min Hwang, (unknown), Robert M. Wallace, Gary Goodman, A. Wan, (unknown), (unknown), Jiyoung Kim	30
20	Low-voltage operation and high endurance of 5-nm ferroelectric Hf0.5Zr0.5O2 capacitors 2018 ·Applied Physics Letters ·Si Joon Kim, Jaidah Mohan, Harrison Sejoon Kim, Jaebeom Lee, Chadwin D. Young, Luigi Colombo, Scott R. Summerfelt, Tamer San, Jiyoung Kim	73

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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