C. Leroux

1.0k total citations
56 papers, 715 citations indexed

About

C. Leroux is a scholar working on Electrical and Electronic Engineering, Condensed Matter Physics and Biomedical Engineering. According to data from OpenAlex, C. Leroux has authored 56 papers receiving a total of 715 indexed citations (citations by other indexed papers that have themselves been cited), including 54 papers in Electrical and Electronic Engineering, 8 papers in Condensed Matter Physics and 8 papers in Biomedical Engineering. Recurrent topics in C. Leroux's work include Semiconductor materials and devices (46 papers), Advancements in Semiconductor Devices and Circuit Design (37 papers) and Integrated Circuits and Semiconductor Failure Analysis (24 papers). C. Leroux is often cited by papers focused on Semiconductor materials and devices (46 papers), Advancements in Semiconductor Devices and Circuit Design (37 papers) and Integrated Circuits and Semiconductor Failure Analysis (24 papers). C. Leroux collaborates with scholars based in France, United States and Switzerland. C. Leroux's co-authors include X. Garros, G. Reimbold, G. Ghibaudo, F. Martín, B. Guillaumot, Jean‐Luc Autran, Jérôme Mitard, Pascal Le Masson, D. Blachier and Michel Houssa and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Advanced Functional Materials.

In The Last Decade

C. Leroux

55 papers receiving 687 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
C. Leroux France 15 613 179 96 80 71 56 715
Rashmi Singh India 11 317 0.5× 311 1.7× 54 0.6× 56 0.7× 28 0.4× 28 483
G. Berti Italy 14 314 0.5× 279 1.6× 122 1.3× 89 1.1× 60 0.8× 36 513
Yuheng Zhang China 10 262 0.4× 334 1.9× 171 1.8× 92 1.1× 103 1.5× 27 541
Yoann Tomczak Belgium 12 311 0.5× 201 1.1× 114 1.2× 27 0.3× 34 0.5× 19 403
O. Seifarth Germany 14 282 0.5× 356 2.0× 78 0.8× 27 0.3× 80 1.1× 25 487
Süleyman Çabuk Türkiye 11 189 0.3× 296 1.7× 66 0.7× 40 0.5× 33 0.5× 30 391
Uwe Treske Germany 12 184 0.3× 283 1.6× 89 0.9× 64 0.8× 50 0.7× 19 387
Liang-Chiun Chao Taiwan 15 392 0.6× 473 2.6× 50 0.5× 71 0.9× 70 1.0× 46 638
D. Sweatman Australia 11 672 1.1× 138 0.8× 112 1.2× 73 0.9× 24 0.3× 51 770
Eda Goldenberg Türkiye 12 341 0.6× 232 1.3× 67 0.7× 70 0.9× 137 1.9× 31 463

Countries citing papers authored by C. Leroux

Since Specialization
Citations

This map shows the geographic impact of C. Leroux's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. Leroux with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. Leroux more than expected).

Fields of papers citing papers by C. Leroux

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C. Leroux. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. Leroux. The network helps show where C. Leroux may publish in the future.

Co-authorship network of co-authors of C. Leroux

This figure shows the co-authorship network connecting the top 25 collaborators of C. Leroux. A scholar is included among the top collaborators of C. Leroux based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with C. Leroux. C. Leroux is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Tremblay, Benoît, A. E. Boudreau, Nurshaun Sreedhar, et al.. (2025). Characterizing Hydrated Polymers via Dielectric Relaxation Spectroscopy: Connecting Relative Permittivity, State of Water, and Salt Transport Properties of Sulfonated Polysulfones. Macromolecules. 58(15). 8271–8287. 2 indexed citations
2.
Leroux, C., Geoffrey M. Geise, & Gary M. Koenig. (2025). Selective Membrane for Non‐Aqueous Electrochemical Flow Cells. Advanced Functional Materials. 35(47). 1 indexed citations
3.
Leroux, C., et al.. (2024). Transport properties of ethylene glycol functionalized membranes exposed to nonaqueous electrolytes. Polymer. 300. 126986–126986. 4 indexed citations
4.
Martin, M., Christophe Jany, Léopold Virot, et al.. (2021). Monolithically integrated InGaAs/AlGaAs multiple quantum well photodetectors on 300 mm Si wafers. AIP Advances. 11(8). 8 indexed citations
5.
Leroux, C., J. Cluzel, Laura Vauche, et al.. (2021). Accurate statistical extraction of AlGaN/GaN HEMT device parameters using the Y-function. Solid-State Electronics. 184. 108078–108078. 7 indexed citations
6.
Leroux, C., et al.. (2018). Metal/Acid Bifunctional Catalysis and Intimacy Criterion for Ethylcyclohexane Hydroconversion: When Proximity Does Not Matter. ACS Catalysis. 8(7). 6035–6046. 50 indexed citations
7.
Kumar, Pushpendra, C. Leroux, A. Toffoli, et al.. (2017). Effect of La and Al addition used for threshold voltage shift on the BTI reliability of HfON-based FDSOI MOSFETs. HAL (Le Centre pour la Communication Scientifique Directe). 2B–2.1. 2 indexed citations
8.
Leroux, C., et al.. (2017). Characterization of 2DEG in AlGaN/GaN heterostructure by Hall effect. Microelectronic Engineering. 178. 128–131. 12 indexed citations
9.
Gassilloud, R., et al.. (2014). Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C–V. Applied Surface Science. 303. 388–392. 32 indexed citations
10.
Leroux, C., Matthew Charles, A. Torres, et al.. (2013). Sheet resistance measurement on AlGaN/GaN wafers and dispersion study. Microelectronic Engineering. 109. 334–337. 5 indexed citations
11.
Gassilloud, R., C. Leroux, P. Chevalier, et al.. (2013). Investigation of Mg Diffusion in Ta(N) Based Electrodes on HfO2 for Sub-32nm CMOS Gate-Last Transistors. ECS Transactions. 50(4). 177–183. 2 indexed citations
12.
Emboras, Alexandros, Adel Najar, Philippe Grosse, et al.. (2012). MNOS stack for reliable, low optical loss, Cu based CMOS plasmonic devices. Optics Express. 20(13). 13612–13612. 19 indexed citations
13.
Ghibaudo, G., J. Coignus, Jérôme Mitard, et al.. (2011). Recent Findings in Electrical Behavior of CMOS High-K Dielectric/Metal Gate Stacks. ECS Transactions. 35(4). 773–804. 1 indexed citations
14.
Garros, X., Jérôme Mitard, C. Leroux, G. Reimbold, & F. Boulanger. (2007). In Depth Analysis of VT Instabilities in HFO2 Technologies by Charge Pumping Measurements and Electrical Modeling. 61–66. 8 indexed citations
15.
Garros, X., G. Reimbold, O. Louveau, et al.. (2006). Process damages in HfO/sub 2/TiN stacks: the key role of H/sup 0/ and H/sub 2/ anneals. 237. 191–194. 2 indexed citations
16.
Poncet, A., et al.. (2005). Characterization of ultra-thin SiO2 by capacitance–voltage and charge pumping measurements. Microelectronic Engineering. 81(1). 59–65. 2 indexed citations
17.
Leroux, C., Jérôme Mitard, X. Garros, et al.. (2005). Characterization and modeling of hysteresis phenomena in high K dielectrics. 737–740. 86 indexed citations
18.
Damlencourt, J.-F., O. Renault, Anne‐Marie Papon, et al.. (2003). Electrical and physico-chemical characterization of HfO2/SiO2 gate oxide stacks prepared by atomic layer deposition. Solid-State Electronics. 47(10). 1613–1616. 44 indexed citations
19.
Garros, X., et al.. (2002). Investigation of HfO2 Dielectric Stacks Deposited by ALD with a Mercury Probe. 97?12. 411–414. 7 indexed citations
20.
Leroux, C., et al.. (1997). Light emission microscopy for thin oxide reliability analysis. Microelectronic Engineering. 36(1-4). 297–300. 24 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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