C. Laviron

991 total citations
43 papers, 365 citations indexed

About

C. Laviron is a scholar working on Electrical and Electronic Engineering, Computational Mechanics and Biomedical Engineering. According to data from OpenAlex, C. Laviron has authored 43 papers receiving a total of 365 indexed citations (citations by other indexed papers that have themselves been cited), including 38 papers in Electrical and Electronic Engineering, 12 papers in Computational Mechanics and 6 papers in Biomedical Engineering. Recurrent topics in C. Laviron's work include Silicon and Solar Cell Technologies (23 papers), Integrated Circuits and Semiconductor Failure Analysis (23 papers) and Semiconductor materials and devices (10 papers). C. Laviron is often cited by papers focused on Silicon and Solar Cell Technologies (23 papers), Integrated Circuits and Semiconductor Failure Analysis (23 papers) and Semiconductor materials and devices (10 papers). C. Laviron collaborates with scholars based in France, Switzerland and Japan. C. Laviron's co-authors include Miguel Hernández, T. Sarnet, J. Boulmer, P. Lecoq, J. Venturini, D. Débarre, M.N. Séméria, M. Marezio, J.L. Hodeau and S. Miraglia and has published in prestigious journals such as Applied Surface Science, Thin Solid Films and Surface and Coatings Technology.

In The Last Decade

C. Laviron

39 papers receiving 338 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
C. Laviron France 12 263 85 70 63 62 43 365
M. K. Linnarsson Sweden 10 341 1.3× 73 0.9× 115 1.6× 49 0.8× 68 1.1× 17 408
T. Eschrich United States 7 252 1.0× 170 2.0× 152 2.2× 78 1.2× 23 0.4× 13 380
W. Vandervorst Belgium 10 282 1.1× 103 1.2× 92 1.3× 48 0.8× 65 1.0× 21 331
B. van Someren Netherlands 8 156 0.6× 81 1.0× 98 1.4× 18 0.3× 152 2.5× 22 389
Hiroki Hamada Japan 11 375 1.4× 141 1.7× 192 2.7× 11 0.2× 42 0.7× 52 434
Anatoly M. Strel’chuk Russia 14 672 2.6× 103 1.2× 244 3.5× 54 0.9× 21 0.3× 95 712
Danielle Vanhaeren Belgium 13 381 1.4× 153 1.8× 165 2.4× 48 0.8× 45 0.7× 38 460
J.H. Evans–Freeman United Kingdom 10 274 1.0× 131 1.5× 156 2.2× 11 0.2× 40 0.6× 54 336
Andreas Biermanns Germany 14 253 1.0× 194 2.3× 158 2.3× 17 0.3× 126 2.0× 30 424
G. Strauch Germany 11 218 0.8× 92 1.1× 112 1.6× 44 0.7× 11 0.2× 36 316

Countries citing papers authored by C. Laviron

Since Specialization
Citations

This map shows the geographic impact of C. Laviron's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. Laviron with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. Laviron more than expected).

Fields of papers citing papers by C. Laviron

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C. Laviron. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. Laviron. The network helps show where C. Laviron may publish in the future.

Co-authorship network of co-authors of C. Laviron

This figure shows the co-authorship network connecting the top 25 collaborators of C. Laviron. A scholar is included among the top collaborators of C. Laviron based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with C. Laviron. C. Laviron is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Lamy, Yann, et al.. (2013). Which interconnects for which 3D applications? Status and perspectives. 16. 1–6. 3 indexed citations
2.
Coudrain, P., A. Jouve, T. Magis, et al.. (2012). Towards efficient and reliable 300mm 3D technology for wide I/O interconnects. 330–335. 11 indexed citations
3.
Laviron, C., V. Lapras, P. Galbiati, et al.. (2009). Via first approach optimisation for Through Silicon Via applications. 14–19. 22 indexed citations
4.
Planes, N., V. Huard, C. Laviron, et al.. (2008). Process Architecture for Spatial and Temporal Variability Improvement of SRAM Circuits at the 45nm Node. 3 indexed citations
5.
Pavelka, T., et al.. (2008). Junction Photovoltage Metrology and High Resolution Mapping of Ion Implants Electrically Isolated from the Wafer Surface. AIP conference proceedings. 113–116. 3 indexed citations
6.
Jaraı́z, M., P. Castrillo, C. Laviron, et al.. (2008). The Role of Implanter Parameters on Implant Damage Generation: an Atomistic Simulation Study. AIP conference proceedings. 209–212. 1 indexed citations
7.
Laviron, C., et al.. (2007). Shallow Junction Engineering by Phosphorus and Carbon Co-implantation: Optimization of Carbon Dose and Energy. MRS Proceedings. 994. 1 indexed citations
9.
Laviron, C., et al.. (2006). Defect Behavior in BF2 Implants For S/D Applications as a Function of Ion Beam Characteristics. AIP conference proceedings. 866. 133–136. 5 indexed citations
10.
Pouydebasque, A., B. Dumont, A. Halimaoui, et al.. (2005). CMOS integration of solid phase epitaxy for sub-50nm devices. 2004. 419–422. 3 indexed citations
11.
Venturini, J., Miguel Hernández, Karim Huet, et al.. (2005). Integration of a long pulse laser thermal process for ultra shallow junction formation of CMOS devices. SPIRE - Sciences Po Institutional REpository. 73–78. 3 indexed citations
12.
Defranoux, Christophe, J. Venturini, Pierre Boher, et al.. (2004). Infrared spectroscopic ellipsometry applied to the characterization of ultra shallow junction on silicon and SOI. Thin Solid Films. 455-456. 150–156. 4 indexed citations
13.
Laviron, C., F. Cristiano, N. Cherkashin, et al.. (2004). Solid Phase Epitaxy process integration on 50-nm PMOS devices: Effects of defects on chemical and electrical characteristics of ultra shallow junctions. MRS Proceedings. 810. 1 indexed citations
14.
15.
Torregrosa, Frank, et al.. (2004). Realization of ultra shallow junctions by PIII: application to solar cells. Surface and Coatings Technology. 186(1-2). 93–98. 26 indexed citations
16.
Hernández, Miguel, C. Laviron, T. Sarnet, et al.. (2003). Optical characterization of laser processed ultra-shallow junctions. Applied Surface Science. 208-209. 277–284. 23 indexed citations
17.
Hernández, Miguel, J. Venturini, J. Boulmer, et al.. (2003). Laser thermal processing for ultra shallow junction formation: numerical simulation and comparison with experiments. Applied Surface Science. 208-209. 345–351. 30 indexed citations
18.
Noguchi, Takashi, T. Sarnet, D. Débarre, et al.. (2002). Single-Shot Excimer Laser Annealing and In Process Ellipsometry Analysis for Ultra Shallow Junctions. MRS Proceedings. 717. 3 indexed citations
20.
Miraglia, S., J.L. Hodeau, M. Marezio, et al.. (1986). Nature of the structural distortion and of the chemical bonding in SnM3Rh4Sn12 (M = LaGd, Yb, Ca, Sr, and Th). Journal of Solid State Chemistry. 63(3). 358–368. 40 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Rankless by CCL
2026