T. Eschrich

480 citations
13 papers · 380 indexed · h-index 7

Impact in

Papers in

Journals
Applied Physics Letters (4 papers)Journal of Applied Physics (1 paper)Physics Letters A (1 paper)Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena (2 papers)Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena (2 papers)
Partner nations
United States

In The Last Decade

T. Eschrich

13 papers receiving 354 citations

Peers

T. Eschrich
Comparison fields: 5 of 32
  • Surfaces, Coatings and Films 40
  • Atomic and Molecular Physics, and Optics 152
  • Electrical and Electronic Engineering 252
  • Electronic, Optical and Magnetic Materials 78
  • Materials Chemistry 170
Replace Le Thanh Vinh with:
Le Thanh Vinh France
Toshihiro Uchiyama Japan
O. Yastrubchak Poland
Ş. Kalem Türkiye
C. Rosenblad Switzerland
V. Loup France
Jorge Santiago United States
A. Pesek Austria
A. Steckenborn Germany
V. Doormann Germany
T. Eschrich relative to Le Thanh Vinh France Le Thanh Vinh's profile →
Citations per field
00.5×1.5×2.3×
Le Thanh Vinh · 1×
Citations per year

Countries citing papers authored by T. Eschrich

Since Specialization
Citations

This map shows the geographic impact of T. Eschrich's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by T. Eschrich with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites T. Eschrich more than expected).

Fields of papers citing papers by T. Eschrich

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by T. Eschrich. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by T. Eschrich. The network helps show where T. Eschrich may publish in the future.

Co-authorship network

The 25 scholars most cited alongside T. Eschrich, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with T. Eschrich Line = papers co-authored together T. Eschrich links everyone, so they are left out of the graph.

All Works

13 of 13 papers shown
#Work
1 200720
2 20075
3 200469
4 20031
5 200361
6 200224
7 19906
8 198910
9 198851
10 19885
11 19871
12 1986126
13 19801

About T. Eschrich

T. Eschrich is a scholar working on Atomic and Molecular Physics, and Optics, Condensed Matter Physics, Electrical and Electronic Engineering, Surfaces, Coatings and Films and Materials Chemistry, having authored 13 papers that have together received 380 indexed citations. Recurring topics across this work include Semiconductor materials and devices (6 papers), Semiconductor Quantum Structures and Devices (5 papers), Electronic and Structural Properties of Oxides (4 papers), Physics of Superconductivity and Magnetism (2 papers), Thermodynamic and Structural Properties of Metals and Alloys (1 paper), Perovskite Materials and Applications (1 paper), Advanced Surface Polishing Techniques (1 paper) and Ion-surface interactions and analysis (1 paper). The work is most often cited by research in Surfaces, Coatings and Films (40 citations), Atomic and Molecular Physics, and Optics (152 citations), Electrical and Electronic Engineering (252 citations), Electronic, Optical and Magnetic Materials (78 citations) and Materials Chemistry (170 citations). T. Eschrich has collaborated with scholars based in United States. Frequent co-authors include B. R. Weinberger, G. G. Peterson, Zhiyi Yu, J. Kulik, Ravi Droopad, Yong Liang, R. N. Sacks, S. Tehrani, Nicholas D. Rizzo and R. W. Dave. Their work appears in journals such as Applied Physics Letters, Journal of Applied Physics, Physics Letters A, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena and Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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