Takehiro Seshimo

566 total citations
21 papers, 484 citations indexed

About

Takehiro Seshimo is a scholar working on Materials Chemistry, Electrical and Electronic Engineering and Organic Chemistry. According to data from OpenAlex, Takehiro Seshimo has authored 21 papers receiving a total of 484 indexed citations (citations by other indexed papers that have themselves been cited), including 14 papers in Materials Chemistry, 10 papers in Electrical and Electronic Engineering and 9 papers in Organic Chemistry. Recurrent topics in Takehiro Seshimo's work include Block Copolymer Self-Assembly (13 papers), Advanced Polymer Synthesis and Characterization (9 papers) and Advancements in Photolithography Techniques (8 papers). Takehiro Seshimo is often cited by papers focused on Block Copolymer Self-Assembly (13 papers), Advanced Polymer Synthesis and Characterization (9 papers) and Advancements in Photolithography Techniques (8 papers). Takehiro Seshimo collaborates with scholars based in Japan, United States and Belgium. Takehiro Seshimo's co-authors include Christopher M. Bates, Michael J. Maher, C. Grant Willson, Leon M. Dean, Christopher J. Ellison, Julia D. Cushen, William J. Durand, Gregory Blachut, Teruaki Hayakawa and Rina Maeda and has published in prestigious journals such as Science, Nature Communications and Advanced Functional Materials.

In The Last Decade

Takehiro Seshimo

19 papers receiving 478 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Takehiro Seshimo Japan 6 406 243 141 103 88 21 484
Sunshine X. Zhou United States 8 319 0.8× 197 0.8× 84 0.6× 97 0.9× 70 0.8× 8 396
Matthew C. Carlson United States 9 421 1.0× 249 1.0× 121 0.9× 102 1.0× 71 0.8× 10 469
Austin P. Lane United States 8 340 0.8× 212 0.9× 109 0.8× 87 0.8× 85 1.0× 11 423
Adam Nunns United Kingdom 11 320 0.8× 283 1.2× 83 0.6× 104 1.0× 66 0.8× 14 457
Evan L. Schwartz United States 9 340 0.8× 145 0.6× 238 1.7× 130 1.3× 125 1.4× 12 530
U. Jeong South Korea 5 362 0.9× 159 0.7× 66 0.5× 106 1.0× 106 1.2× 6 417
Li‐Chen Cheng United States 12 322 0.8× 273 1.1× 53 0.4× 147 1.4× 58 0.7× 12 437
Karl O. Stuen United States 10 678 1.7× 358 1.5× 195 1.4× 224 2.2× 138 1.6× 13 752
Changhak Shin South Korea 7 374 0.9× 189 0.8× 73 0.5× 89 0.9× 49 0.6× 8 415
Hidekazu Sugimori Japan 10 338 0.8× 235 1.0× 77 0.5× 103 1.0× 60 0.7× 24 428

Countries citing papers authored by Takehiro Seshimo

Since Specialization
Citations

This map shows the geographic impact of Takehiro Seshimo's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Takehiro Seshimo with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Takehiro Seshimo more than expected).

Fields of papers citing papers by Takehiro Seshimo

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Takehiro Seshimo. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Takehiro Seshimo. The network helps show where Takehiro Seshimo may publish in the future.

Co-authorship network of co-authors of Takehiro Seshimo

This figure shows the co-authorship network connecting the top 25 collaborators of Takehiro Seshimo. A scholar is included among the top collaborators of Takehiro Seshimo based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Takehiro Seshimo. Takehiro Seshimo is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Maekawa, S., Hyo Seon Suh, Takehiro Seshimo, et al.. (2025). High‐Fidelity Directed Self‐Assembly Using Higher‐ χ Polystyrene‐ Block ‐Poly(Methyl Methacrylate) Derivatives for Dislocation‐Free Sub‐10 nm Features. Advanced Functional Materials. 35(24). 2 indexed citations
2.
Maekawa, S., Takehiro Seshimo, Kazufumi Sato, et al.. (2024). Dual function of precisely modified hydroxy-PS- b -PMMA as neutral layers and thin films for perpendicularly oriented lamella. RSC Applied Interfaces. 2(1). 74–81.
3.
Maekawa, S., Takehiro Seshimo, Kazufumi Sato, et al.. (2024). Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly. Nature Communications. 15(1). 5671–5671. 16 indexed citations
4.
Maekawa, S., Takehiro Seshimo, Kazufumi Sato, et al.. (2024). Synthesis of ABC/ACB-Type Triblock Copolymers Composed of Polystyrene and Polymethacrylate via Living Anionic Polymerization and Analyzing the Effect of Casting Solvents on Higher-Order Structures. Journal of Photopolymer Science and Technology. 37(2). 151–156. 1 indexed citations
5.
Dong, Lei, et al.. (2020). Synthesis and Morphology Studies of Polysiloxane-based Triblock Copolymers. Journal of Photopolymer Science and Technology. 32(6). 817–822. 1 indexed citations
6.
Iso, Yoshiki, et al.. (2019). Ligand Exchange of Core/Shell CuInS<sub>2</sub>/ZnS Quantum Dots for Preparation of Their Homogeneous Ink. Proceedings of the International Display Workshops. 803–803. 1 indexed citations
7.
Seshimo, Takehiro, et al.. (2018). Behavior of Si-Si Bond Oxidation by Electron Beam Lithography. Journal of Photopolymer Science and Technology. 31(4). 581–585. 3 indexed citations
8.
Yamada, Kazuki, et al.. (2017). Silicon Infiltration into Functional Polymer for Nano-scale Pattern Development. Journal of Photopolymer Science and Technology. 30(3). 361–365. 2 indexed citations
9.
Seshimo, Takehiro, et al.. (2017). Perpendicularly-Oriented Block Copolymers Containing Silicon-Rich Hyperbranched Polymers for High Resistance to O<sub>2</sub>-RIE. Journal of Photopolymer Science and Technology. 30(2). 191–196. 2 indexed citations
10.
Seshimo, Takehiro, et al.. (2016). Perpendicularly oriented sub-10-nm block copolymer lamellae by atmospheric thermal annealing for one minute. Scientific Reports. 6(1). 19481–19481. 49 indexed citations
11.
Seshimo, Takehiro, et al.. (2016). Perpendicularly Oriented Cylinders of Si-containing Block Copolymers by Atmospheric Thermal Annealing. Journal of Photopolymer Science and Technology. 29(5). 689–693.
12.
Seshimo, Takehiro, et al.. (2016). Perpendicular orientation control in thin films of POSS-containing block copolymer domains with a top-coat surface treatment. Polymer Journal. 48(4). 407–411. 15 indexed citations
13.
Seshimo, Takehiro, et al.. (2016). Ionic Liquid for Directed Self-Assembly of PS-<i>b</i>-PMMA. Journal of Photopolymer Science and Technology. 29(5). 667–670. 1 indexed citations
14.
Seshimo, Takehiro, et al.. (2014). Guided self-assembly of Si-containing block copolymer with a topcoat surface treatment. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9049. 90490X–90490X. 1 indexed citations
15.
Seshimo, Takehiro, Christopher M. Bates, Leon M. Dean, et al.. (2012). Block Copolymer Orientation Control Using a Top-Coat Surface Treatment. Journal of Photopolymer Science and Technology. 25(1). 125–130. 14 indexed citations
16.
Bates, Christopher M., Takehiro Seshimo, Michael J. Maher, et al.. (2012). Polarity-Switching Top Coats Enable Orientation of Sub–10-nm Block Copolymer Domains. Science. 338(6108). 775–779. 344 indexed citations
17.
Hagiwara, Yuji, Brandon Rawlings, Ryan Mesch, et al.. (2011). Photobase generator enabled pitch division: a progress report. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7972. 79720F–79720F. 5 indexed citations
18.
Seshimo, Takehiro, et al.. (2009). Studies of the Photo Acid Generator Material Design for Chemically Amplified Photoresists. Japanese Journal of Applied Physics. 48(6S). 06FC07–06FC07. 22 indexed citations
19.
Seshimo, Takehiro, et al.. (2009). A study of the photo acid generator material design for chemically amplified photoresists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7273. 72732F–72732F. 3 indexed citations
20.
Seshimo, Takehiro, Hideo Hada, Tsuyoshi Nakamura, et al.. (2008). Study of PAG Material Design for ArF Immersion Photoresist. Journal of Photopolymer Science and Technology. 21(6). 719–723. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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