Thomas R. Omstead

500 total citations
13 papers, 413 citations indexed

About

Thomas R. Omstead is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Materials Chemistry. According to data from OpenAlex, Thomas R. Omstead has authored 13 papers receiving a total of 413 indexed citations (citations by other indexed papers that have themselves been cited), including 9 papers in Electrical and Electronic Engineering, 4 papers in Electronic, Optical and Magnetic Materials and 4 papers in Materials Chemistry. Recurrent topics in Thomas R. Omstead's work include Semiconductor materials and devices (5 papers), Copper Interconnects and Reliability (4 papers) and Semiconductor Quantum Structures and Devices (2 papers). Thomas R. Omstead is often cited by papers focused on Semiconductor materials and devices (5 papers), Copper Interconnects and Reliability (4 papers) and Semiconductor Quantum Structures and Devices (2 papers). Thomas R. Omstead collaborates with scholars based in United States. Thomas R. Omstead's co-authors include Klavs F. Jensen, Peter W. Lee, Carl M. Lampert, John A. T. Norman, J. E. Parmeter, David A. Roberts, Arthur K. Hochberg, John J. Sullivan, G. G. Peterson and D. Manger and has published in prestigious journals such as Applied Physics Letters, Chemistry of Materials and Journal of The Electrochemical Society.

In The Last Decade

Thomas R. Omstead

13 papers receiving 389 citations

Peers

Thomas R. Omstead

EEE

AMPO

EOMM

CMP

J. Haigh United Kingdom

Yoshinori Hayafuji Japan

Michihisa Kyoto Japan

M. Gsell Germany

Patrick W. DeHaven United States

C. Bovier France

L. C. Isett United States

Lalitha Sirdeshmukh India

N. M. Ravindra India

Yuemei L. Yang United States

J. Haigh United Kingdom

Thomas R. Omstead

359 ×1.4

EEE

191 ×1.4

AMPO

229 ×1.8

44 ×0.4

EOMM

28 ×0.5

CMP

Citations per year, relative to Thomas R. Omstead Thomas R. Omstead (= 1×) peers J. Haigh

Countries citing papers authored by Thomas R. Omstead

Since Specialization

Citations

This map shows the geographic impact of Thomas R. Omstead's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Thomas R. Omstead with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Thomas R. Omstead more than expected).

Fields of papers citing papers by Thomas R. Omstead

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Thomas R. Omstead. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Thomas R. Omstead. The network helps show where Thomas R. Omstead may publish in the future.

Co-authorship network of co-authors of Thomas R. Omstead

This figure shows the co-authorship network connecting the top 25 collaborators of Thomas R. Omstead. A scholar is included among the top collaborators of Thomas R. Omstead based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Thomas R. Omstead. Thomas R. Omstead is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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13 of 13 papers shown

Manger, D., Aaron R. Burke, G. G. Peterson, et al.. (1996). Chemical vapor deposition of copper from CuI hexafluoroacetylacetonate trimethylvinylsilane for ultralarge scale integration applications. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(3). 1828–1836. 29 indexed citations

Parmeter, J. E., G. A. Petersen, Christopher A. Apblett, et al.. (1995). Characterization of thin copper films grown via chemical vapor deposition using liquid coinjection of trimethylvinylsilane and (hexafluoroacetylacetonate) Cu (trimethylvinylsilane). Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 13(1). 130–136. 17 indexed citations

Norman, John A. T., et al.. (1995). Chemical additives for improved copper chemical vapour deposition processing. Thin Solid Films. 262(1-2). 46–51. 47 indexed citations

Parmeter, J. E., et al.. (1995). Enhanced Chemical Vapor Deposition of Copper from ( hfac ) Cu ( TMVS ) Using Liquid Coinjection of TMVS. Journal of The Electrochemical Society. 142(3). 939–944. 23 indexed citations

Omstead, Thomas R., Ananth Annapragada, & Klavs F. Jensen. (1990). Microwave plasma generation of arsine from hydrogen and solid arsenic. Applied Physics Letters. 57(24). 2543–2545. 7 indexed citations

Omstead, Thomas R. & Klavs F. Jensen. (1990). Kinetic model for metal-organic chemical vapor deposition of gallium arsenide with organometallic-arsenic precursors. Chemistry of Materials. 2(1). 39–49. 8 indexed citations

Omstead, Thomas R., et al.. (1989). Gas Phase and Surface Reactions of Organometallic Arsenic Sources. MRS Proceedings. 145. 3 indexed citations

Omstead, Thomas R., et al.. (1988). Gas phase and surface reactions in the MOCVD of GaAs from triethylgallium, trimethylgallium, and tertiarybutylarsine. Journal of Crystal Growth. 93(1-4). 20–28. 25 indexed citations

Lee, Peter W., et al.. (1988). In situ mass spectroscopy studies of the decomposition of organometallic arsenic compounds in the presence of Ga(CH3)3 and Ga(C2H5)3. Journal of Crystal Growth. 93(1-4). 134–142. 75 indexed citations

10.

Omstead, Thomas R., et al.. (1988). Gas Phase and Surface Reactions in Mocvd of GaAs from Triethylgallium, Trimethylgallium, and Organometallic Arsenic Precursors. MRS Proceedings. 131. 1 indexed citations

11.

Lee, Peter W., et al.. (1987). In situ mass spectroscopy and thermogravimetric studies of GaAs MOCVD gas phase and surface reactions. Journal of Crystal Growth. 85(1-2). 165–174. 115 indexed citations

12.

Lampert, Carl M., et al.. (1986). Chemical and optical properties of electrochromic nickel oxide films. Solar Energy Materials. 14(3-5). 161–174. 61 indexed citations

13.

Lampert, Carl M., et al.. (1985). Chemical and Optical Properties of Electrochromic Nickel Oxide Films. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 562. 15–15. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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