Alain E. Kaloyeros

3.4k total citations
148 papers, 2.8k citations indexed

About

Alain E. Kaloyeros is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Alain E. Kaloyeros has authored 148 papers receiving a total of 2.8k indexed citations (citations by other indexed papers that have themselves been cited), including 114 papers in Electrical and Electronic Engineering, 66 papers in Materials Chemistry and 64 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Alain E. Kaloyeros's work include Semiconductor materials and devices (98 papers), Copper Interconnects and Reliability (61 papers) and Metal and Thin Film Mechanics (37 papers). Alain E. Kaloyeros is often cited by papers focused on Semiconductor materials and devices (98 papers), Copper Interconnects and Reliability (61 papers) and Metal and Thin Film Mechanics (37 papers). Alain E. Kaloyeros collaborates with scholars based in United States, Belgium and India. Alain E. Kaloyeros's co-authors include Eric Eisenbraun, Barry Arkles, Jonathan Goff, W. A. Lanford, Spyros Gallis, R.J. Gutmann, S. P. Murarka, Mengbing Huang, John J. Sullivan and Youlin Pan and has published in prestigious journals such as Journal of the American Chemical Society, SHILAP Revista de lepidopterología and Physical review. B, Condensed matter.

In The Last Decade

Alain E. Kaloyeros

140 papers receiving 2.7k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Alain E. Kaloyeros United States 28 1.9k 1.1k 1.1k 735 399 148 2.8k
Yoshinori Hatanaka Japan 32 2.8k 1.5× 1.3k 1.2× 3.0k 2.9× 465 0.6× 464 1.2× 245 4.4k
Peter Mascher Canada 25 2.3k 1.2× 789 0.7× 2.4k 2.2× 656 0.9× 549 1.4× 248 3.4k
L. Jastrabı́k Czechia 30 1.5k 0.8× 1.1k 1.0× 3.0k 2.8× 617 0.8× 444 1.1× 342 3.9k
Paul D. Bristowe United Kingdom 38 2.3k 1.2× 981 0.9× 3.6k 3.4× 350 0.5× 716 1.8× 145 4.5k
F. Plazaola Spain 33 727 0.4× 1.2k 1.0× 1.8k 1.6× 700 1.0× 658 1.6× 183 3.9k
Denis Shamiryan Belgium 25 2.4k 1.3× 1.8k 1.7× 1.1k 1.0× 992 1.3× 253 0.6× 94 3.3k
Shingo Tanaka Japan 31 1.3k 0.7× 370 0.3× 2.1k 2.0× 227 0.3× 488 1.2× 172 3.3k
S.T. Lee Hong Kong 34 2.2k 1.2× 361 0.3× 2.6k 2.5× 545 0.7× 518 1.3× 117 4.1k
Andreas Leineweber Germany 31 744 0.4× 622 0.6× 2.3k 2.2× 963 1.3× 330 0.8× 231 4.0k
C. Prieto Spain 27 865 0.5× 806 0.7× 1.7k 1.6× 226 0.3× 569 1.4× 212 3.0k

Countries citing papers authored by Alain E. Kaloyeros

Since Specialization
Citations

This map shows the geographic impact of Alain E. Kaloyeros's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Alain E. Kaloyeros with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Alain E. Kaloyeros more than expected).

Fields of papers citing papers by Alain E. Kaloyeros

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Alain E. Kaloyeros. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Alain E. Kaloyeros. The network helps show where Alain E. Kaloyeros may publish in the future.

Co-authorship network of co-authors of Alain E. Kaloyeros

This figure shows the co-authorship network connecting the top 25 collaborators of Alain E. Kaloyeros. A scholar is included among the top collaborators of Alain E. Kaloyeros based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Alain E. Kaloyeros. Alain E. Kaloyeros is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Kaloyeros, Alain E. & Barry Arkles. (2024). Review—Silicon Carbide Thin Film Technologies: Recent Advances in Processing, Properties, and Applications: Part II. PVD and Alternative (Non-PVD and Non-CVD) Deposition Techniques. ECS Journal of Solid State Science and Technology. 13(4). 43001–43001. 10 indexed citations
2.
Kaloyeros, Alain E., Youlin Pan, Jonathan Goff, & Barry Arkles. (2020). Review—Silicon Nitride and Silicon Nitride-Rich Thin Film Technologies: State-of-the-Art Processing Technologies, Properties, and Applications. ECS Journal of Solid State Science and Technology. 9(6). 63006–63006. 111 indexed citations
3.
Ford, Brian, et al.. (2015). Strong visible light emission from silicon-oxycarbide nanowire arrays prepared by electron beam lithography and reactive ion etching. Journal of materials research/Pratt's guide to venture capital sources. 30(23). 3692–3699. 22 indexed citations
4.
Mosier, Aaron P., et al.. (2013). Development of antifouling surfaces to reduce bacterial attachment. Soft Matter. 9(27). 6235–6235. 65 indexed citations
5.
Kamineni, Vimal, Richard Moore, Spyros Gallis, et al.. (2012). Optical and structural characterization of thermal oxidation effects of erbium thin films deposited by electron beam on silicon. Journal of Applied Physics. 111(1). 26 indexed citations
6.
Gallis, Spyros, et al.. (2011). Thermal annealing effects on photoluminescence properties of carbon-doped silicon-rich oxide thin films implanted with erbium. Journal of Applied Physics. 109(9). 7 indexed citations
7.
Carlsen, Autumn, Seiichiro Higashiya, Kathleen Dunn, et al.. (2011). Metallization of a Genetically Engineered Polypeptide. Macromolecular Bioscience. 12(2). 269–273. 2 indexed citations
8.
Gadre, Anand, et al.. (2007). Design, fabrication, and characterization of polymeric bioMEMS for the detection of feline immunodeficiency virus (FIV). Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6430. 643012–643012. 1 indexed citations
9.
Consiglio, Steven, et al.. (2006). Metallorganic Chemical Vapor Deposition of Hafnium Silicate Thin Films Using a Dual Source Dimethyl-alkylamido Approach. Journal of The Electrochemical Society. 153(11). F249–F249. 7 indexed citations
10.
Sirinakis, George, et al.. (2005). Microstructure and Optical Properties of Au–Y2O3-stabilized ZrO2 Nanocomposite Films. Journal of materials research/Pratt's guide to venture capital sources. 20(9). 2516–2522. 3 indexed citations
11.
Straten, O. van der, Yu Zhu, Kathleen Dunn, Eric Eisenbraun, & Alain E. Kaloyeros. (2004). Atomic layer deposition of tantalum nitride for ultrathin liner applications in advanced copper metallization schemes. Journal of materials research/Pratt's guide to venture capital sources. 19(2). 447–453. 39 indexed citations
12.
Skordas, Spyridon, et al.. (2003). Low-temperature metalorganic chemical vapor deposition of Al2O3 for advanced complementary metal-oxide semiconductor gate dielectric applications. Journal of materials research/Pratt's guide to venture capital sources. 18(8). 1868–1876. 5 indexed citations
13.
Oktyabrsky, S., James Castracane, & Alain E. Kaloyeros. (2002). Emerging technologies for chip-level optical interconnects. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4652. 213–213. 12 indexed citations
14.
Banger, K.K., Andrei Kornilov, Eric Eisenbraun, et al.. (2001). The first metal complex containing a silylated β-diketonate ligand: bis(2,2,6,6-tetramethyl-2-sila-3,5-heptanedionato) copper(II). Inorganic Chemistry Communications. 4(9). 496–500. 15 indexed citations
15.
Chen, Xiaomeng, G. G. Peterson, Cindy Goldberg, et al.. (1999). Low-temperature chemical vapor deposition of tantalum nitride from tantalum pentabromide for integrated circuitry copper metallization applications. Journal of materials research/Pratt's guide to venture capital sources. 14(5). 2043–2052. 18 indexed citations
16.
Endisch, D., et al.. (1997). Mocvd SrS:Ce for Applications in Electroluminescent Devices. MRS Proceedings. 471. 4 indexed citations
17.
18.
Gutmann, R.J., T. Paul Chow, William N. Gill, et al.. (1994). Copper Metallization Manufacturing Issues for Future ICs. MRS Proceedings. 337. 8 indexed citations
19.
Eisenbraun, Eric, et al.. (1992). Remote plasma chemical vapor deposition of copper for applications in microelectronics. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(4). 1337–1340. 9 indexed citations
20.
Kaloyeros, Alain E., et al.. (1991). The Effect of Grain Boundaries and Substrate Interactions with Hydrogen on the CVD Growth of Device-Quality Copper.. MRS Proceedings. 229. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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