Tadahiro Ohmi
- Electrical and Electronic Engineering top 1%
- Materials Chemistry top 5%
- Atomic and Molecular Physics, and Optics top 5%
- Electronic, Optical and Magnetic Materials top 5%
- Biomedical Engineering top 5%
- Co-authors
- Akinobu TeramotoShigetoshi SugawaTadashi ShibataMasaki HirayamaH. GotôJunichi MurotaMizuho MoritaRihito Kuroda
- Topics
- Semiconductor materials and devices (208 papers)Advancements in Semiconductor Devices and Circuit Design (90 papers)Integrated Circuits and Semiconductor Failure Analysis (69 papers)
- Cited by
- Electrical and Electronic EngineeringElectronic, Optical and Magnetic MaterialsSurfaces, Coatings and Films
- Partner nations
- JapanUnited StatesCanada
In The Last Decade
Tadahiro Ohmi
435 papers receiving 4.1k citations
Peers
Comparison fields: 5 of 89
- Electrical and Electronic Engineering 3.4k
- Materials Chemistry 1.1k
- Atomic and Molecular Physics, and Optics 652
- Electronic, Optical and Magnetic Materials 620
- Biomedical Engineering 574
Countries citing papers authored by Tadahiro Ohmi
This map shows the geographic impact of Tadahiro Ohmi's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Tadahiro Ohmi with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Tadahiro Ohmi more than expected).
Fields of papers citing papers by Tadahiro Ohmi
This network shows the impact of papers produced by Tadahiro Ohmi. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Tadahiro Ohmi. The network helps show where Tadahiro Ohmi may publish in the future.
Co-authorship network of co-authors of Tadahiro Ohmi
This figure shows the co-authorship network connecting the top 25 collaborators of Tadahiro Ohmi. A scholar is included among the top collaborators of Tadahiro Ohmi based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Tadahiro Ohmi. Tadahiro Ohmi is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | Combined Histogram-based Features of DCT Coefficients in Low-frequency Domains for Face Recognition | 4 |
| 2 | Fast search for MPEG video clips from large video database using combined histogram features | 1 |
| 3 | 1 | |
| 4 | Silicon Wafer Thinning Technology for Three-Dimensional Integrated Circuit by Wet Etching | 2 |
| 5 | The data analysis technique of the atomic force microscopy for the atomically flat silicon surface | 2 |
| 6 | The data analysis technique of the atomic force microscopy for the atomically flat silicon surface(Session9A: Silicon Devices IV) | 3 |
| 7 | 1 | |
| 8 | 8 | |
| 9 | 13 | |
| 10 | Eye Detection from color images Using Separability Filter and Vector Quantization Histogram Method | 0 |
| 11 | Development of NBTI Lifetime Prediction Method and Evaluation Method using Hole Injection Technique | 1 |
| 12 | Analysis of high-speed signal behavior in a miniaturized interconnect | 2 |
| 13 | Fully-parallel VLSI implementation of vector quantization processor using neuron-MOS technology | 4 |
| 14 | The Nature of Metallic Contamination on Various Silicon Substrates | 0 |
| 15 | Functionality Enahncement in Elemental Devices for Implementing Intelligence on Integrated Circuits | 0 |
| 16 | Neutralization of Static Electricity by Soft X-Ray and Vacuum Ultraviolet (UV)-Ray Irradiation (Special Issue on Scientific ULSI Manufacturing Technology) | 2 |
| 17 | Advanced Fluorite Regeneration Technology to Recover Spent Fluoride Chemicals Drained from Semiconductor Manufacturing Process (Special Issue on Scientific ULSI Manufacturing Technology) | 2 |
| 18 | A Model for the Electrochemical Deposition and Removal of Metallic Impurities on Si Surfaces | 4 |
| 19 | Advanced Fluorite Regeneration Technology to Recover Spent Fluoride Chemicals Drained from Semi-conductor Manufacturing Process | 1 |
| 20 | Optimization of Photolithography Developing Process without Residual Surfactant on Surfaces | 1 |
About Tadahiro Ohmi
Tadahiro Ohmi is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Surfaces, Coatings and Films, having authored 466 papers that have together received 4.3k indexed citations. Recurring topics across this work include Semiconductor materials and devices (208 papers), Advancements in Semiconductor Devices and Circuit Design (90 papers) and Integrated Circuits and Semiconductor Failure Analysis (69 papers). The work is most often cited by research in Electrical and Electronic Engineering (3.4k citations), Electronic, Optical and Magnetic Materials (620 citations) and Surfaces, Coatings and Films (185 citations). Tadahiro Ohmi has collaborated with scholars based in Japan, United States and Canada. Frequent co-authors include Akinobu Teramoto, Shigetoshi Sugawa, Tadashi Shibata, Masaki Hirayama, H. Gotô, Junichi Murota, Mizuho Morita, Rihito Kuroda, Tetsuya Goto and Tomoyuki Suwa. Their work appears in journals such as Physical review. B, Condensed matter, Applied Physics Letters and Journal of Applied Physics.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.