S. Springer

417 total citations
12 papers, 298 citations indexed

About

S. Springer is a scholar working on Electrical and Electronic Engineering, Hardware and Architecture and Infectious Diseases. According to data from OpenAlex, S. Springer has authored 12 papers receiving a total of 298 indexed citations (citations by other indexed papers that have themselves been cited), including 11 papers in Electrical and Electronic Engineering, 1 paper in Hardware and Architecture and 0 papers in Infectious Diseases. Recurrent topics in S. Springer's work include Advancements in Semiconductor Devices and Circuit Design (10 papers), Semiconductor materials and devices (8 papers) and Integrated Circuits and Semiconductor Failure Analysis (3 papers). S. Springer is often cited by papers focused on Advancements in Semiconductor Devices and Circuit Design (10 papers), Semiconductor materials and devices (8 papers) and Integrated Circuits and Semiconductor Failure Analysis (3 papers). S. Springer collaborates with scholars based in United States and Switzerland. S. Springer's co-authors include Jean‐Olivier Plouchart, R. Williams, N. Zamdmer, L. Wagner, G. Freeman, A. Chou, Sungjae Lee, John J. Pekarik, B. Jagannathan and Jonghae Kim and has published in prestigious journals such as IEEE Transactions on Electron Devices, IEEE Transactions on Circuits and Systems I Regular Papers and Symposium on VLSI Technology.

In The Last Decade

S. Springer

11 papers receiving 277 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
S. Springer United States 8 293 37 34 24 20 12 298
R. Williams United States 9 400 1.4× 23 0.6× 26 0.8× 46 1.9× 21 1.1× 22 409
Magali De Matos France 9 196 0.7× 39 1.1× 37 1.1× 14 0.6× 17 0.8× 35 209
A. Cros France 11 341 1.2× 29 0.8× 36 1.1× 20 0.8× 12 0.6× 32 346
D. Céli France 9 302 1.0× 39 1.1× 28 0.8× 6 0.3× 9 0.5× 38 309
I. Post United Kingdom 9 354 1.2× 89 2.4× 30 0.9× 12 0.5× 33 1.6× 20 360
Curtis M. Grens United States 11 315 1.1× 29 0.8× 24 0.7× 6 0.3× 9 0.5× 24 323
J.L. Pelloie France 14 771 2.6× 31 0.8× 33 1.0× 32 1.3× 27 1.4× 72 780
E.G. Ioannidis France 13 376 1.3× 22 0.6× 39 1.1× 13 0.5× 17 0.8× 29 381
R. Hayami Japan 11 291 1.0× 59 1.6× 25 0.7× 9 0.4× 12 0.6× 27 292
Yi-Cheng Wu United States 11 295 1.0× 17 0.5× 43 1.3× 12 0.5× 13 0.7× 30 307

Countries citing papers authored by S. Springer

Since Specialization
Citations

This map shows the geographic impact of S. Springer's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by S. Springer with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites S. Springer more than expected).

Fields of papers citing papers by S. Springer

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by S. Springer. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by S. Springer. The network helps show where S. Springer may publish in the future.

Co-authorship network of co-authors of S. Springer

This figure shows the co-authorship network connecting the top 25 collaborators of S. Springer. A scholar is included among the top collaborators of S. Springer based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with S. Springer. S. Springer is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

12 of 12 papers shown
1.
Deng, Jie, R. Thomä, Ning Lu, et al.. (2015). SOI FinFET nFET-to-pFET Tracking Variability Compact Modeling and Impact on Latch Timing. IEEE Transactions on Electron Devices. 62(6). 1760–1768. 8 indexed citations
2.
Wachnik, R., Sungjae Lee, Hongmei Li, et al.. (2014). Gate Stack Resistance and Limits to CMOS Logic Performance. IEEE Transactions on Circuits and Systems I Regular Papers. 61(8). 2318–2325. 3 indexed citations
3.
Wang, Cindy, Hailing Wang, C.M. Schnabel, et al.. (2014). Experimental Study of Gate-First FinFET Threshold-Voltage Mismatch. IEEE Transactions on Electron Devices. 61(2). 643–646. 18 indexed citations
4.
Wachnik, R., L. Wagner, J. Johnson, et al.. (2013). Experimental analysis and modeling of self heating effect in dielectric isolated planar and fin devices. Symposium on VLSI Technology. 30 indexed citations
5.
Wachnik, R., et al.. (2013). Gate stack resistance and limits to CMOS logic performance. 1–4. 9 indexed citations
6.
Springer, S., et al.. (2009). Elements of Statistical SPICE Models. TechConnect Briefs. 3(2009). 616–619. 2 indexed citations
7.
8.
Liang, Qingqing, J. Johnson, Ming Cai, et al.. (2007). A simple hardware-based statistical model on 65nm SOI CMOS technology. 1–2.
9.
Lee, Sungjae, B. Jagannathan, A. Chou, et al.. (2007). Record RF performance of 45-nm SOI CMOS Technology. 255–258. 138 indexed citations
10.
Springer, S., Sunghoon Lee, Ning Lu, et al.. (2006). Modeling of Variation in Submicrometer CMOS ULSI Technologies. IEEE Transactions on Electron Devices. 53(9). 2168–2178. 60 indexed citations
11.
12.
Frear, D. R., et al.. (2002). Motorola MEMS switch technology for high frequency applications. 22–24. 15 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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