R.W. Dutton

525 total citations
21 papers, 335 citations indexed

About

R.W. Dutton is a scholar working on Electrical and Electronic Engineering, Industrial and Manufacturing Engineering and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, R.W. Dutton has authored 21 papers receiving a total of 335 indexed citations (citations by other indexed papers that have themselves been cited), including 17 papers in Electrical and Electronic Engineering, 4 papers in Industrial and Manufacturing Engineering and 3 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in R.W. Dutton's work include Semiconductor materials and devices (10 papers), Silicon and Solar Cell Technologies (7 papers) and Advancements in Semiconductor Devices and Circuit Design (5 papers). R.W. Dutton is often cited by papers focused on Semiconductor materials and devices (10 papers), Silicon and Solar Cell Technologies (7 papers) and Advancements in Semiconductor Devices and Circuit Design (5 papers). R.W. Dutton collaborates with scholars based in United States, Japan and Italy. R.W. Dutton's co-authors include P. Fahey, Masoud Moslehi, Mark Horowitz, Sha Lu, C.S. Rafferty, Mark E. Law, J.P. McVittie, Alexander S. Wong, A. R. Neureuther and Peter M. Pinsky and has published in prestigious journals such as Applied Physics Letters, IEEE Journal of Solid-State Circuits and IEEE Electron Device Letters.

In The Last Decade

R.W. Dutton

20 papers receiving 310 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
R.W. Dutton United States 8 310 110 39 39 21 21 335
T. Sudo Japan 14 399 1.3× 90 0.8× 55 1.4× 19 0.5× 11 0.5× 32 445
P.K. Chatterjee United States 12 381 1.2× 43 0.4× 37 0.9× 22 0.6× 9 0.4× 29 420
H.C. Poon Japan 10 657 2.1× 108 1.0× 25 0.6× 14 0.4× 7 0.3× 15 697
Kyupil Lee South Korea 8 207 0.7× 80 0.7× 19 0.5× 26 0.7× 7 0.3× 20 287
Young-Kwan Park South Korea 14 495 1.6× 45 0.4× 64 1.6× 70 1.8× 12 0.6× 55 552
Cyrus Tabery United States 11 668 2.2× 47 0.4× 32 0.8× 50 1.3× 52 2.5× 50 704
J. Hicks United States 14 635 2.0× 30 0.3× 93 2.4× 28 0.7× 15 0.7× 40 681
Nirmal K. Viswanathan India 7 299 1.0× 62 0.6× 165 4.2× 18 0.5× 7 0.3× 14 337
Jongwook Kye United States 11 368 1.2× 24 0.2× 59 1.5× 15 0.4× 24 1.1× 56 395
J.-H. Chern United States 8 374 1.2× 24 0.2× 102 2.6× 7 0.2× 8 0.4× 24 414

Countries citing papers authored by R.W. Dutton

Since Specialization
Citations

This map shows the geographic impact of R.W. Dutton's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by R.W. Dutton with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites R.W. Dutton more than expected).

Fields of papers citing papers by R.W. Dutton

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by R.W. Dutton. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by R.W. Dutton. The network helps show where R.W. Dutton may publish in the future.

Co-authorship network of co-authors of R.W. Dutton

This figure shows the co-authorship network connecting the top 25 collaborators of R.W. Dutton. A scholar is included among the top collaborators of R.W. Dutton based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with R.W. Dutton. R.W. Dutton is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
2.
Iwai, Hiroshi, et al.. (2003). A manufacturing-oriented environment for synthesis of fabrication processes. 30. 376–379. 2 indexed citations
3.
Law, Mark E., J.R. Pfiester, & R.W. Dutton. (2003). The effect of implantation damage on arsenic/phosphorus codiffusion. 640–643. 1 indexed citations
4.
Dutton, R.W., et al.. (2000). GEODESIC: A New and Extensible Geometry Tool and Framework with Application to MEMS. TechConnect Briefs. 716–719. 1 indexed citations
5.
Dutton, R.W., et al.. (1999). A Novel Method to Utilize Existing TCAD Tools to Build Accurate Geometry Required for MEMS Simulation. TechConnect Briefs. 120–123. 2 indexed citations
6.
Dutton, R.W., et al.. (1992). A tool towards integration of IC process, device, and circuit simulation. IEEE Journal of Solid-State Circuits. 27(3). 265–273. 2 indexed citations
7.
Wong, Alexander S., et al.. (1992). A utility-based integrated system for process simulation. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems. 11(7). 911–920. 4 indexed citations
8.
Boning, Duane S., et al.. (1991). Linking TCAD to EDA---benefits and issues. 573–578. 5 indexed citations
9.
Wong, Alexander S., et al.. (1990). A utility-based integrated process simulation system. 97–98. 9 indexed citations
10.
Fahey, P. & R.W. Dutton. (1988). Investigation of point-defect generation in silicon during oxidation of a deposited WSi2 layer. Applied Physics Letters. 52(13). 1092–1094. 6 indexed citations
11.
Law, Mark E., C.S. Rafferty, & R.W. Dutton. (1986). New n-well fabrication techniques based on 2D process simulation. 518–521. 11 indexed citations
12.
Dutton, R.W., et al.. (1986). A Best-First Search Algorithm for Optimal PLA Folding. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems. 5(3). 433–442. 20 indexed citations
13.
McVittie, J.P., et al.. (1986). Kinetic Modeling and Measurement of Active Species Distributions During Dry Etching. MRS Proceedings. 68. 2 indexed citations
14.
Lu, Sha & R.W. Dutton. (1985). An Analytical Algorithm for Placement of Arbitrarily Sized Rectangular Blocks. 602–608. 32 indexed citations
15.
Chang, Gerard J., et al.. (1984). Electrical endpoint detection of VLSI contact plasma etching. IEEE Electron Device Letters. 5(12). 514–517. 4 indexed citations
16.
Fahey, P., R.W. Dutton, & Masoud Moslehi. (1983). Effect of thermal nitridation processes on boron and phosphorus diffusion in 〈100〉 silicon. Applied Physics Letters. 43(7). 683–685. 54 indexed citations
17.
Horowitz, Mark & R.W. Dutton. (1983). Resistance Extraction from Mask Layout Data. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems. 2(3). 145–150. 51 indexed citations
18.
Dutton, R.W.. (1981). Stanford overview in VLSI research. IEEE Transactions on Circuits and Systems. 28(7). 654–665. 2 indexed citations
19.
Dutton, R.W., et al.. (1980). A surface kinetics model for plasma etching. 831–832. 3 indexed citations
20.
Dutton, R.W., et al.. (1980). Process design using coupled 2D process and device simulators. 223–226. 8 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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