R. Scholl
- Mechanics of Materials top 5%
- Electrical and Electronic Engineering
- Materials Chemistry
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics
- Co-authors
- A. BelkindMing‐Show WongW.D. SproulMichael E. GrahamZhenfu ZhaoZengli ZhaoD. EckertRaphaël P. Hermann
- Topics
- Metal and Thin Film Mechanics (9 papers)Semiconductor materials and devices (6 papers)Magnetic Properties and Applications (6 papers)
- Journals
- Journal of Magnetism and Magnetic MaterialsSurface and Coatings TechnologyIEEE Transactions on Instrumentation and Measurement
- Partner nations
- United StatesGermanySwitzerland
In The Last Decade
R. Scholl
18 papers receiving 296 citations
Peers
Comparison fields: 5 of 34
- Mechanics of Materials 218
- Electrical and Electronic Engineering 203
- Materials Chemistry 170
- Electronic, Optical and Magnetic Materials 64
- Atomic and Molecular Physics, and Optics 46
Countries citing papers authored by R. Scholl
This map shows the geographic impact of R. Scholl's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by R. Scholl with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites R. Scholl more than expected).
Fields of papers citing papers by R. Scholl
This network shows the impact of papers produced by R. Scholl. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by R. Scholl. The network helps show where R. Scholl may publish in the future.
Co-authorship network of co-authors of R. Scholl
This figure shows the co-authorship network connecting the top 25 collaborators of R. Scholl. A scholar is included among the top collaborators of R. Scholl based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with R. Scholl. R. Scholl is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 14 | |
| 2 | 11 | |
| 3 | Reactive Sputtering Using a Dual-Anode Magnetron System | 1 |
| 4 | Pulsed-DC Reactive Sputtering of Dielectrics: Pulsing Parameter Effects | 8 |
| 5 | 69 | |
| 6 | 28 | |
| 7 | 34 | |
| 8 | 4 | |
| 9 | 14 | |
| 10 | 87 | |
| 11 | 5 | |
| 12 | 3 | |
| 13 | 5 | |
| 14 | 17 | |
| 15 | 7 | |
| 16 | 8 | |
| 17 | 1 | |
| 18 | 2 | |
| 19 | 4 | |
| 20 | 1 |
About R. Scholl
R. Scholl is a scholar working on Electronic, Optical and Magnetic Materials, Metals and Alloys and Mechanics of Materials, having authored 20 papers that have together received 323 indexed citations. Recurring topics across this work include Metal and Thin Film Mechanics (9 papers), Semiconductor materials and devices (6 papers) and Magnetic Properties and Applications (6 papers). The work is most often cited by research in Mechanics of Materials (218 citations), Materials Chemistry (170 citations) and Electrical and Electronic Engineering (203 citations). R. Scholl has collaborated with scholars based in United States, Germany and Switzerland. Frequent co-authors include A. Belkind, Ming‐Show Wong, W.D. Sproul, Michael E. Graham, Zhenfu Zhao, Zengli Zhao, D. Eckert, Raphaël P. Hermann, E. Seppi and Julius J. Muray. Their work appears in journals such as Journal of Magnetism and Magnetic Materials, Surface and Coatings Technology and IEEE Transactions on Instrumentation and Measurement.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.