J. Strümpfel

510 total citations
13 papers, 390 citations indexed

About

J. Strümpfel is a scholar working on Mechanics of Materials, Electrical and Electronic Engineering and Materials Chemistry. According to data from OpenAlex, J. Strümpfel has authored 13 papers receiving a total of 390 indexed citations (citations by other indexed papers that have themselves been cited), including 10 papers in Mechanics of Materials, 10 papers in Electrical and Electronic Engineering and 7 papers in Materials Chemistry. Recurrent topics in J. Strümpfel's work include Metal and Thin Film Mechanics (9 papers), Semiconductor materials and devices (6 papers) and ZnO doping and properties (4 papers). J. Strümpfel is often cited by papers focused on Metal and Thin Film Mechanics (9 papers), Semiconductor materials and devices (6 papers) and ZnO doping and properties (4 papers). J. Strümpfel collaborates with scholars based in Germany. J. Strümpfel's co-authors include Christian May, S. Schiller, U. Heisig, K. Steinfelder, G. Beister, J. Reschke, P.D. Greene, William K. Sieber, Mike Oertel and R. Menner and has published in prestigious journals such as Thin Solid Films, Surface and Coatings Technology and Vacuum.

In The Last Decade

J. Strümpfel

13 papers receiving 349 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
J. Strümpfel Germany 10 299 257 208 50 31 13 390
G. Beister Germany 9 255 0.9× 272 1.1× 243 1.2× 68 1.4× 20 0.6× 13 426
C. Eggs Germany 10 189 0.6× 376 1.5× 229 1.1× 24 0.5× 77 2.5× 18 446
M. Audronis United Kingdom 17 182 0.6× 456 1.8× 447 2.1× 56 1.1× 30 1.0× 30 583
J. Reschke Germany 5 244 0.8× 306 1.2× 325 1.6× 45 0.9× 24 0.8× 9 438
Amitabh Jain United States 12 329 1.1× 195 0.8× 134 0.6× 104 2.1× 73 2.4× 125 497
Hamidreza Hajihoseini Iceland 14 243 0.8× 270 1.1× 359 1.7× 90 1.8× 39 1.3× 20 419
M. Ruske Germany 12 401 1.3× 380 1.5× 78 0.4× 46 0.9× 72 2.3× 21 539
W. M. Posadowski Poland 10 226 0.8× 175 0.7× 282 1.4× 42 0.8× 18 0.6× 24 371
S. Mikhailov France 11 312 1.0× 609 2.4× 414 2.0× 51 1.0× 49 1.6× 24 746
T. Lin United States 10 224 0.7× 174 0.7× 102 0.5× 83 1.7× 65 2.1× 10 350

Countries citing papers authored by J. Strümpfel

Since Specialization
Citations

This map shows the geographic impact of J. Strümpfel's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. Strümpfel with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. Strümpfel more than expected).

Fields of papers citing papers by J. Strümpfel

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J. Strümpfel. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. Strümpfel. The network helps show where J. Strümpfel may publish in the future.

Co-authorship network of co-authors of J. Strümpfel

This figure shows the co-authorship network connecting the top 25 collaborators of J. Strümpfel. A scholar is included among the top collaborators of J. Strümpfel based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with J. Strümpfel. J. Strümpfel is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

13 of 13 papers shown
1.
Heisig, U., et al.. (2015). 40 Jahre industrielles Magnetron‐Sputtern in Europa. Vakuum in Forschung und Praxis. 27(6). 21–26. 3 indexed citations
2.
May, Christian, et al.. (2003). Deposition of TCO films by reactive magnetron sputtering from metallic Zn:Al alloy targets. Surface and Coatings Technology. 169-170. 512–516. 25 indexed citations
3.
May, Christian, et al.. (2003). Optical investigations in a PEM controlled reactive magnetron sputter process for aluminium doped zinc oxide layers using metallic alloy targets. Surface and Coatings Technology. 174-175. 222–228. 21 indexed citations
4.
Greene, P.D., et al.. (2003). Equipment, materials and processes: a review of high rate sputtering technology for glass coating. Thin Solid Films. 442(1-2). 11–14. 28 indexed citations
5.
Strümpfel, J. & Christian May. (2000). Low ohm large area ITO coating by reactive magnetron sputtering in DC and MF mode. Vacuum. 59(2-3). 500–505. 17 indexed citations
6.
May, Christian & J. Strümpfel. (1999). ITO coating by reactive magnetron sputtering–comparison of properties from DC and MF processing. Thin Solid Films. 351(1-2). 48–52. 63 indexed citations
7.
Strümpfel, J., et al.. (1997). The industrial establishment of a new highly productive deposition technique for reflection increasing layer systems. Surface and Coatings Technology. 93(1). 51–57. 4 indexed citations
8.
Neumann, M., et al.. (1991). Möglichkeiten zur Bandbeschichtung mit Siliciumoxid. Chemie Ingenieur Technik. 63(4). 396–397. 1 indexed citations
9.
Schiller, S., et al.. (1989). The effect of target-substrate coupling on reactive direct current magnetron sputtering. Surface and Coatings Technology. 39-40. 549–564. 10 indexed citations
10.
Schiller, S., U. Heisig, G. Beister, et al.. (1987). Reactive d.c. high-rate sputtering as production technology. Surface and Coatings Technology. 33. 405–423. 84 indexed citations
11.
Schiller, S., U. Heisig, G. Beister, et al.. (1984). Deposition of hard wear-resistant coatings by reactive D.C. Plasmatron sputtering. Thin Solid Films. 118(3). 255–270. 45 indexed citations
12.
Schiller, S., et al.. (1982). On the investigation of d.c. plasmatron discharges by optical emission spectrometry. Thin Solid Films. 96(3). 235–240. 38 indexed citations
13.
Schiller, S., U. Heisig, K. Steinfelder, & J. Strümpfel. (1979). Reactive D.C. sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide films. Thin Solid Films. 63(2). 369–375. 51 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Breakdown of academic impact, for papers by G. Beister Breakdown of academic impact, for papers by C. Eggs Breakdown of academic impact, for papers by M. Audronis Breakdown of academic impact, for papers by J. Reschke Breakdown of academic impact, for papers by Amitabh Jain Breakdown of academic impact, for papers by Hamidreza Hajihoseini Breakdown of academic impact, for papers by M. Ruske Breakdown of academic impact, for papers by W. M. Posadowski Breakdown of academic impact, for papers by S. Mikhailov Breakdown of academic impact, for papers by T. Lin
Rankless by CCL
2026