Ronald S. Nowicki

482 total citations
19 papers, 366 citations indexed

About

Ronald S. Nowicki is a scholar working on Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Ronald S. Nowicki has authored 19 papers receiving a total of 366 indexed citations (citations by other indexed papers that have themselves been cited), including 14 papers in Atomic and Molecular Physics, and Optics, 13 papers in Electrical and Electronic Engineering and 6 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Ronald S. Nowicki's work include Semiconductor materials and interfaces (14 papers), Semiconductor materials and devices (11 papers) and Copper Interconnects and Reliability (6 papers). Ronald S. Nowicki is often cited by papers focused on Semiconductor materials and interfaces (14 papers), Semiconductor materials and devices (11 papers) and Copper Interconnects and Reliability (6 papers). Ronald S. Nowicki collaborates with scholars based in United States and Canada. Ronald S. Nowicki's co-authors include Joel M. Harris, M.‐A. Nicolet, I.V. Mitchell, M‐A. Nicolet, J. F. Moulder, S.S. Lau, M.−A. Nicolet, Arthur J. Learn, Krishna C. Saraswat and R. Seguin and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

Ronald S. Nowicki

18 papers receiving 337 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Ronald S. Nowicki United States 10 255 150 125 98 97 19 366
X.‐A. Zhao United States 11 214 0.8× 127 0.8× 104 0.8× 104 1.1× 224 2.3× 23 442
K. Hieber Germany 9 253 1.0× 98 0.7× 148 1.2× 123 1.3× 65 0.7× 25 345
M. Bartur United States 10 292 1.1× 300 2.0× 55 0.4× 52 0.5× 104 1.1× 22 414
K. A. Ellis United States 10 263 1.0× 137 0.9× 45 0.4× 141 1.4× 143 1.5× 18 415
S. Zirinsky United States 9 256 1.0× 231 1.5× 66 0.5× 49 0.5× 174 1.8× 11 479
J.J. van den Broek Netherlands 11 107 0.4× 104 0.7× 98 0.8× 209 2.1× 167 1.7× 26 431
Takashi Kouzaki Japan 11 223 0.9× 136 0.9× 42 0.3× 46 0.5× 177 1.8× 28 379
Arthur J. Learn United States 13 450 1.8× 149 1.0× 106 0.8× 267 2.7× 111 1.1× 37 538
Suresh C. Jain India 6 185 0.7× 200 1.3× 97 0.8× 41 0.4× 170 1.8× 9 382
J.C. Blair United States 10 368 1.4× 177 1.2× 68 0.5× 211 2.2× 104 1.1× 14 442

Countries citing papers authored by Ronald S. Nowicki

Since Specialization
Citations

This map shows the geographic impact of Ronald S. Nowicki's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ronald S. Nowicki with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ronald S. Nowicki more than expected).

Fields of papers citing papers by Ronald S. Nowicki

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Ronald S. Nowicki. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ronald S. Nowicki. The network helps show where Ronald S. Nowicki may publish in the future.

Co-authorship network of co-authors of Ronald S. Nowicki

This figure shows the co-authorship network connecting the top 25 collaborators of Ronald S. Nowicki. A scholar is included among the top collaborators of Ronald S. Nowicki based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Ronald S. Nowicki. Ronald S. Nowicki is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

19 of 19 papers shown
1.
Myrick, Amie C., et al.. (2018). Empowering nondeployed spouses and children through filial therapy.. International Journal of Play Therapy. 27(3). 166–175. 1 indexed citations
2.
Busta, H.H., Gordon Gammie, S. L. Skala, et al.. (2002). Volcano-shaped field emitters for large area displays. 405–408. 3 indexed citations
3.
Nowicki, Ronald S., et al.. (1993). Improving The Barrier Properties of Nickel. Chrome and Nichrome Films on Silicon. MRS Proceedings. 303. 1 indexed citations
4.
Nowicki, Ronald S., et al.. (1991). I ns i t u native oxide clean followed by chemical vapor deposition of tungsten silicide on polysilicon in a cluster tool. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 9(3). 1073–1082. 5 indexed citations
5.
Nowicki, Ronald S.. (1982). Diffusion barriers between gold and semiconductors. Gold bulletin. 15(1). 21–24. 9 indexed citations
6.
Nowicki, Ronald S. & M.‐A. Nicolet. (1982). General aspects of barrier layers for very-large-scale integration applications II: Practice. Thin Solid Films. 96(4). 317–326. 42 indexed citations
7.
Saraswat, Krishna C., Ronald S. Nowicki, & J. F. Moulder. (1982). Thermal oxidation of tantalum silicide in O2 and H2O. Applied Physics Letters. 41(12). 1127–1129. 25 indexed citations
8.
Nowicki, Ronald S. & J. F. Moulder. (1981). Comparison of the Properties of Molybdenum Silicide Films Deposited by D‐C Magnetron and RF Diode Co‐Deposition. Journal of The Electrochemical Society. 128(3). 562–567. 9 indexed citations
9.
Nowicki, Ronald S. & J. F. Moulder. (1981). Studies of CrNAu as an improved die attach metallization system. Thin Solid Films. 83(2). 209–216. 1 indexed citations
10.
Nowicki, Ronald S. & Arthur J. Learn. (1980). Studies of silicon regrowth with aluminum and aluminum alloy metallizations. Thin Solid Films. 67(2). 385–393. 7 indexed citations
11.
Baker, J. E., et al.. (1980). Thermal annealing study of Au/TiW metallization on silicon. Thin Solid Films. 69(1). 53–62. 17 indexed citations
12.
Nowicki, Ronald S.. (1980). Influence of residual gases on the properties of dc magnetron-sputtered aluminum–silicon. Journal of Vacuum Science and Technology. 17(1). 384–387. 8 indexed citations
13.
Learn, Arthur J. & Ronald S. Nowicki. (1979). Methods for minimizing silicon regrowth in aluminum films. Applied Physics Letters. 35(8). 611–614. 9 indexed citations
14.
Nowicki, Ronald S., Joel M. Harris, M‐A. Nicolet, & I.V. Mitchell. (1978). Studies of the Ti-W/Au metallization on aluminum. Thin Solid Films. 53(2). 195–205. 63 indexed citations
15.
Nowicki, Ronald S., et al.. (1978). Improvement of the diffusion barrier properties of rf-sputtered molybdenum. Journal of Vacuum Science and Technology. 15(2). 235–237. 19 indexed citations
16.
Nowicki, Ronald S.. (1977). Properties of rf‐sputtered Al2O3 films deposited by planar magnetron. Journal of Vacuum Science and Technology. 14(1). 127–133. 69 indexed citations
17.
Harris, Joel M., S.S. Lau, M.−A. Nicolet, & Ronald S. Nowicki. (1976). Studies of the Ti‐W Metallization System on Si. Journal of The Electrochemical Society. 123(1). 120–124. 40 indexed citations
18.
Nowicki, Ronald S., et al.. (1974). Effects of deposition parameters on properties of rf sputtered molybdenum films. Journal of Vacuum Science and Technology. 11(4). 675–679. 21 indexed citations
19.
Fagen, E. A., Ronald S. Nowicki, & R. Seguin. (1974). Effects of dc substrate bias on the properties of rf-sputtered amorphous germanium ditelluride films. Journal of Applied Physics. 45(1). 50–59. 17 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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