Paul C. Lemaire

1.3k citations

27 papers · 1.1k indexed · h-index 17

Materials Chemistry top 10%
Electrical and Electronic Engineering top 10%
Inorganic Chemistry top 5%
Electronic, Optical and Magnetic Materials
Biomedical Engineering

Co-authors: Gregory N. Parsons Junjie Zhao Gregory W. Peterson Mark D. Losego Howard J. Walls Christopher J. Oldham Sarah D. Shepherd Philip S. Williams
Topics: Semiconductor materials and devices (17 papers)Electronic and Structural Properties of Oxides (12 papers)Catalytic Processes in Materials Science (8 papers)
Cited by: Inorganic Chemistry Materials Chemistry Electrical and Electronic Engineering
Journals: Journal of the American Chemical Society The Journal of Chemical Physics Chemistry of Materials
Partner nations: United States Netherlands Chile

In The Last Decade

Paul C. Lemaire

27 papers receiving 1.0k citations

Peers

Countries citing papers authored by Paul C. Lemaire

Since Specialization

Citations

This map shows the geographic impact of Paul C. Lemaire's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Paul C. Lemaire with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Paul C. Lemaire more than expected).

Fields of papers citing papers by Paul C. Lemaire

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Paul C. Lemaire. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Paul C. Lemaire. The network helps show where Paul C. Lemaire may publish in the future.

Co-authorship network of co-authors of Paul C. Lemaire

This figure shows the co-authorship network connecting the top 25 collaborators of Paul C. Lemaire. A scholar is included among the top collaborators of Paul C. Lemaire based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Paul C. Lemaire. Paul C. Lemaire is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation 2024 ·Applied Surface Science ·(unknown),Marc J. M. Merkx,Ilker Tezsevin,Paul C. Lemaire,Dennis M. Hausmann,Tania E. Sandoval,W. M. M. Kessels,Adriaan J. M. Mackus	19
2	Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors 2022 ·The Journal of Physical Chemistry C ·Marc J. M. Merkx,(unknown),Alfredo Mameli,Jun Li,Paul C. Lemaire,Kashish Sharma,Dennis M. Hausmann,W. M. M. Kessels,Tania E. Sandoval,Adriaan J. M. Mackus	39
3	Functionalization of the SiO₂ Surface with Aminosilanes to Enable Area-Selective Atomic Layer Deposition of Al₂O₃ 2022 ·Langmuir ·Wanxing Xu,(unknown),Paul C. Lemaire,Kashish Sharma,Dennis M. Hausmann,Sumit Agarwal	26
4	Ultraviolet photo-enhanced atomic layer deposition for improving dielectric properties of low temperature deposited Al2O3 2022 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·(unknown),(unknown),Paul C. Lemaire,John F. Conley	2
5	Area-selective atomic layer deposition of Al2O3 on SiNx with SiO2 as the nongrowth surface 2021 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Wanxing Xu,(unknown),Paul C. Lemaire,Kashish Sharma,Dennis M. Hausmann,Sumit Agarwal	10
6	Mechanism for growth initiation on aminosilane-functionalized SiO2 during area-selective atomic layer deposition of ZrO2 2021 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Wanxing Xu,Paul C. Lemaire,Kashish Sharma,(unknown),Dennis M. Hausmann,Sumit Agarwal	13
7	Selective deposition of AlOx for Fully Aligned Via in nano Cu interconnects 2021 ·S. Nguyen,H. Shobha,(unknown),(unknown),Huai Huang,J. Li,J. Demarest,Bala Haran,Dennis M. Hausmann,Paul C. Lemaire,(unknown),(unknown),Arpan P. Mahorowala	3
8	Surface reaction mechanisms during atomic layer deposition of zirconium oxide using water, ethanol, and water-ethanol mixture as the oxygen sources 2019 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Wanxing Xu,Paul C. Lemaire,Kashish Sharma,Dennis M. Hausmann,Sumit Agarwal	16
9	Ab initio analysis of nucleation reactions during tungsten atomic layer deposition on Si(100) and W(110) substrates 2018 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·(unknown),(unknown),Paul C. Lemaire,Erik E. Santiso,Gregory N. Parsons	3
10	Tungsten–Carbon Nanotube Composite Photonic Crystals as Thermally Stable Spectral‐Selective Absorbers and Emitters for Thermophotovoltaics 2018 ·Advanced Energy Materials ·Kehang Cui,Paul C. Lemaire,Hangbo Zhao,(unknown),Gregory N. Parsons,A. John Hart	77
11	Thermally Driven Self-Limiting Atomic Layer Etching of Metallic Tungsten Using WF₆ and O₂ 2018 ·ACS Applied Materials & Interfaces ·Wenyi Xie,Paul C. Lemaire,Gregory N. Parsons	33
12	Thermal Selective Vapor Etching of TiO₂: Chemical Vapor Etching via WF₆ and Self-Limiting Atomic Layer Etching Using WF₆ and BCl₃ 2017 ·Chemistry of Materials ·Paul C. Lemaire,Gregory N. Parsons	42
13	Reversible Low-Temperature Metal Node Distortion during Atomic Layer Deposition of Al₂O₃ and TiO₂ on UiO-66-NH₂ Metal–Organic Framework Crystal Surfaces 2017 ·ACS Applied Materials & Interfaces ·Paul C. Lemaire,Dennis T. Lee,Junjie Zhao,Gregory N. Parsons	85
14	Wafer‐Scale Selective‐Area Deposition of Nanoscale Metal Oxide Features Using Vapor Saturation into Patterned Poly(methyl methacrylate) Templates 2015 ·Advanced Materials Interfaces ·Erinn C. Dandley,Paul C. Lemaire,Zhongwei Zhu,(unknown),(unknown),Gregory N. Parsons	20
15	Using Hydrogen To Expand the Inherent Substrate Selectivity Window During Tungsten Atomic Layer Deposition 2015 ·Chemistry of Materials ·Berç Kalanyan,Paul C. Lemaire,Sarah E. Atanasov,(unknown),Gregory N. Parsons	68
16	Facile Conversion of Hydroxy Double Salts to Metal–Organic Frameworks Using Metal Oxide Particles and Atomic Layer Deposition Thin-Film Templates 2015 ·Journal of the American Chemical Society ·Junjie Zhao,(unknown),Paul C. Lemaire,Yiliang Lin,Michael D. Dickey,Christopher J. Oldham,Howard J. Walls,Gregory W. Peterson,Mark D. Losego,Gregory N. Parsons	183
17	Rapid visible color change and physical swelling during water exposure in triethanolamine-metalcone films formed by molecular layer deposition 2015 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Paul C. Lemaire,Christopher J. Oldham,Gregory N. Parsons	12
18	Metal–Organic Frameworks: Highly Adsorptive, MOF‐Functionalized Nonwoven Fiber Mats for Hazardous Gas Capture Enabled by Atomic Layer Deposition (Adv. Mater. Interfaces 4/2014) 2014 ·Advanced Materials Interfaces ·Junjie Zhao,Mark D. Losego,Paul C. Lemaire,Philip S. Williams,Bo Gong,Sarah E. Atanasov,(unknown),Christopher J. Oldham,Howard J. Walls,Sarah D. Shepherd,Matthew A. Browe,Gregory W. Peterson,Gregory N. Parsons	5
19	Highly Adsorptive, MOF‐Functionalized Nonwoven Fiber Mats for Hazardous Gas Capture Enabled by Atomic Layer Deposition 2014 ·Advanced Materials Interfaces ·Junjie Zhao,Mark D. Losego,Paul C. Lemaire,Philip S. Williams,Bo Gong,Sarah E. Atanasov,(unknown),Christopher J. Oldham,Howard J. Walls,Sarah D. Shepherd,Matthew A. Browe,Gregory W. Peterson,Gregory N. Parsons	111
20	Oxidative dehydrogenation of ethanol to acetaldehyde and ethyl acetate by graphite nanofibers 2010 ·Carbon ·Randy D. Weinstein,(unknown),(unknown),Paul C. Lemaire	28

About Paul C. Lemaire

Paul C. Lemaire is a scholar working on Inorganic Chemistry, Electrical and Electronic Engineering and Materials Chemistry, having authored 27 papers that have together received 1.1k indexed citations. Recurring topics across this work include Semiconductor materials and devices (17 papers), Electronic and Structural Properties of Oxides (12 papers) and Catalytic Processes in Materials Science (8 papers). The work is most often cited by research in Inorganic Chemistry (388 citations), Materials Chemistry (670 citations) and Electrical and Electronic Engineering (535 citations). Paul C. Lemaire has collaborated with scholars based in United States, Netherlands and Chile. Frequent co-authors include Gregory N. Parsons, Junjie Zhao, Gregory W. Peterson, Mark D. Losego, Howard J. Walls, Christopher J. Oldham, Sarah D. Shepherd, Philip S. Williams, Sarah E. Atanasov and Dennis T. Lee. Their work appears in journals such as Journal of the American Chemical Society, The Journal of Chemical Physics and Chemistry of Materials.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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