Alfredo Mameli

716 total citations
20 papers, 578 citations indexed

About

Alfredo Mameli is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Polymers and Plastics. According to data from OpenAlex, Alfredo Mameli has authored 20 papers receiving a total of 578 indexed citations (citations by other indexed papers that have themselves been cited), including 18 papers in Electrical and Electronic Engineering, 13 papers in Materials Chemistry and 2 papers in Polymers and Plastics. Recurrent topics in Alfredo Mameli's work include Semiconductor materials and devices (15 papers), Electronic and Structural Properties of Oxides (10 papers) and Catalytic Processes in Materials Science (6 papers). Alfredo Mameli is often cited by papers focused on Semiconductor materials and devices (15 papers), Electronic and Structural Properties of Oxides (10 papers) and Catalytic Processes in Materials Science (6 papers). Alfredo Mameli collaborates with scholars based in Netherlands, United States and United Kingdom. Alfredo Mameli's co-authors include F. Roozeboom, W. M. M. Kessels, Adriaan J. M. Mackus, Bora Karasulu, Marc J. M. Merkx, Marcel A. Verheijen, Andrew V. Teplyakov, Bart Macco, B. Barcones and Paul Poodt and has published in prestigious journals such as Advanced Materials, Accounts of Chemical Research and ACS Nano.

In The Last Decade

Alfredo Mameli

20 papers receiving 573 citations

Peers

Alfredo Mameli
Marc J. M. Merkx Netherlands
Cory S. Wajda United States
Christopher Jezewski United States
G. J. Leusink United States
C. Hobbs United States
M. Schmidt Germany
Greg Mordi United States
Marc J. M. Merkx Netherlands
Alfredo Mameli
Citations per year, relative to Alfredo Mameli Alfredo Mameli (= 1×) peers Marc J. M. Merkx

Countries citing papers authored by Alfredo Mameli

Since Specialization
Citations

This map shows the geographic impact of Alfredo Mameli's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Alfredo Mameli with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Alfredo Mameli more than expected).

Fields of papers citing papers by Alfredo Mameli

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Alfredo Mameli. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Alfredo Mameli. The network helps show where Alfredo Mameli may publish in the future.

Co-authorship network of co-authors of Alfredo Mameli

This figure shows the co-authorship network connecting the top 25 collaborators of Alfredo Mameli. A scholar is included among the top collaborators of Alfredo Mameli based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Alfredo Mameli. Alfredo Mameli is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Mameli, Alfredo, Kandabara Tapily, Jie Shen, et al.. (2024). Unfolding an Elusive Area-Selective Deposition Process: Atomic Layer Deposition of TiO2 and TiON on SiN vs SiO2. ACS Applied Materials & Interfaces. 16(11). 14288–14295. 6 indexed citations
2.
Karasulu, Bora, F. Roozeboom, & Alfredo Mameli. (2023). High‐Throughput Area‐Selective Spatial Atomic Layer Deposition of SiO2 with Interleaved Small Molecule Inhibitors and Integrated Back‐Etch Correction for Low Defectivity. Advanced Materials. 35(25). e2301204–e2301204. 22 indexed citations
3.
Shen, Jie, F. Roozeboom, & Alfredo Mameli. (2023). Atmospheric-Pressure Plasma-Enhanced Spatial Atomic Layer Deposition of Silicon Nitride at Low Temperature. 1 indexed citations
4.
Shen, Jie, F. Roozeboom, & Alfredo Mameli. (2023). Atmospheric-pressure plasma-enhanced spatial atomic layer deposition of silicon nitride at low temperature. University of Twente Research Information. 1. 1–11. 3 indexed citations
5.
Mameli, Alfredo, Hylke B. Akkerman, Angelika Lampert, et al.. (2023). Beyond mobile phone displays: Flat panel display technology for biomedical applications. Microelectronic Engineering. 277. 112016–112016. 1 indexed citations
6.
Mameli, Alfredo & Andrew V. Teplyakov. (2023). Selection Criteria for Small-Molecule Inhibitors in Area-Selective Atomic Layer Deposition: Fundamental Surface Chemistry Considerations. Accounts of Chemical Research. 56(15). 2084–2095. 29 indexed citations
7.
Merkx, Marc J. M., Alfredo Mameli, Jun Li, et al.. (2022). Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors. The Journal of Physical Chemistry C. 126(10). 4845–4853. 39 indexed citations
8.
Mameli, Alfredo, et al.. (2022). High‐Throughput Atomic Layer Deposition of P‐Type SnO Thin Film Transistors Using Tin(II)bis(tert‐amyloxide). Advanced Materials Interfaces. 9(9). 16 indexed citations
9.
Vandalon, Vincent, et al.. (2021). Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2Studied by Gas-Phase Infrared and Optical Emission Spectroscopy. The Journal of Physical Chemistry C. 125(45). 24945–24957. 13 indexed citations
10.
Głowienka, Damian, Francesco Di Giacomo, Mehrdad Najafi, et al.. (2020). Effect of Different Bromine Sources on the Dual Cation Mixed Halide Perovskite Solar Cells. ACS Applied Energy Materials. 3(9). 8285–8294. 13 indexed citations
11.
Merkx, Marc J. M., Alfredo Mameli, Paul C. Lemaire, et al.. (2020). Insight into the removal and reapplication of small inhibitor molecules during area-selective atomic layer deposition of SiO2. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 39(1). 25 indexed citations
12.
Mameli, Alfredo, Bora Karasulu, Marcel A. Verheijen, et al.. (2019). Area-Selective Atomic Layer Deposition of ZnO by Area Activation Using Electron Beam-Induced Deposition. Chemistry of Materials. 31(4). 1250–1257. 78 indexed citations
13.
Petruzzella, Maurangelo, Ž. Zobenica, Michele Cotrufo, et al.. (2018). Anti-stiction coating for mechanically tunable photonic crystal devices. Optics Express. 26(4). 3882–3882. 8 indexed citations
14.
Mameli, Alfredo, Marcel A. Verheijen, Adriaan J. M. Mackus, W. M. M. Kessels, & F. Roozeboom. (2018). Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O2 Plasma. ACS Applied Materials & Interfaces. 10(44). 38588–38595. 44 indexed citations
15.
Mameli, Alfredo, Yinghuan Kuang, Morteza Aghaee, et al.. (2017). Area-Selective Atomic Layer Deposition of In2O3:H Using a μ-Plasma Printer for Local Area Activation. Chemistry of Materials. 29(3). 921–925. 63 indexed citations
16.
Mameli, Alfredo, Marc J. M. Merkx, Bora Karasulu, et al.. (2017). Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle. ACS Nano. 11(9). 9303–9311. 158 indexed citations
17.
Mameli, Alfredo, Bora Karasulu, Marcel A. Verheijen, et al.. (2017). (Invited) Area-Selective Atomic Layer Deposition: Role of Surface Chemistry. ECS Transactions. 80(3). 39–48. 11 indexed citations
18.
Poodt, Paul, et al.. (2016). Effect of reactor pressure on the conformal coating inside porous substrates by atomic layer deposition. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 35(2). 39 indexed citations
19.
Mameli, Alfredo, et al.. (2016). On the Growth, Percolation and Wetting of Silver Thin Films Grown by Atmospheric-Plasma Enhanced Spatial Atomic Layer Deposition. ECS Transactions. 75(6). 129–142. 7 indexed citations
20.
Mameli, Alfredo, et al.. (2015). On the Growth of Silver Thin Films By Atmospheric-Plasma Spatial ALD. ECS Meeting Abstracts. MA2015-02(26). 997–997. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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