Shuichi Noda
- Electrical and Electronic Engineering top 10%
- Materials Chemistry
- Mechanics of Materials top 10%
- Biomedical Engineering
- Radiation top 5%
- Co-authors
- Seiji SamukawaSatoshi MorishitaTakuya OzakiMasami InoueYukinobu HikosakaFuminori IshibashiHisataka HayashiTetsuya Tatsumi
- Topics
- Semiconductor materials and devices (23 papers)Plasma Diagnostics and Applications (14 papers)Advancements in Semiconductor Devices and Circuit Design (11 papers)
- Journals
- SHILAP Revista de lepidopterologíaApplied Physics LettersJournal of Applied Physics
- Partner nations
- JapanUnited StatesTaiwan
In The Last Decade
Shuichi Noda
55 papers receiving 675 citations
Peers
Comparison fields: 5 of 56
- Electrical and Electronic Engineering 503
- Materials Chemistry 161
- Mechanics of Materials 110
- Biomedical Engineering 109
- Radiation 105
Countries citing papers authored by Shuichi Noda
This map shows the geographic impact of Shuichi Noda's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Shuichi Noda with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Shuichi Noda more than expected).
Fields of papers citing papers by Shuichi Noda
This network shows the impact of papers produced by Shuichi Noda. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Shuichi Noda. The network helps show where Shuichi Noda may publish in the future.
Co-authorship network of co-authors of Shuichi Noda
This figure shows the co-authorship network connecting the top 25 collaborators of Shuichi Noda. A scholar is included among the top collaborators of Shuichi Noda based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Shuichi Noda. Shuichi Noda is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 8 | |
| 2 | AlN Film Characteristics Deposited by Minimal Fab Reactive Sputtering Tool (2) | 0 |
| 3 | 4 | |
| 4 | 14 | |
| 5 | 7 | |
| 6 | 28 | |
| 7 | 31 | |
| 8 | 23 | |
| 9 | 1 | |
| 10 | 24 | |
| 11 | 31 | |
| 12 | 二重飛行時間法を使った 235 Uと 239 Puに対して1から8MeVの中性子によって誘起された融合からの即発融合中性子スペクトル | 4 |
| 13 | 7 | |
| 14 | 7 | |
| 15 | 5 | |
| 16 | 14 | |
| 17 | 5 | |
| 18 | 1 | |
| 19 | 3 | |
| 20 | 3 |
About Shuichi Noda
Shuichi Noda is a scholar working on Radiation, Electrical and Electronic Engineering and Electronic, Optical and Magnetic Materials, having authored 58 papers that have together received 716 indexed citations. Recurring topics across this work include Semiconductor materials and devices (23 papers), Plasma Diagnostics and Applications (14 papers) and Advancements in Semiconductor Devices and Circuit Design (11 papers). The work is most often cited by research in Radiation (105 citations), Electrical and Electronic Engineering (503 citations) and Condensed Matter Physics (66 citations). Shuichi Noda has collaborated with scholars based in Japan, United States and Taiwan. Frequent co-authors include Seiji Samukawa, Satoshi Morishita, Takuya Ozaki, Masami Inoue, Yukinobu Hikosaka, Fuminori Ishibashi, Hisataka Hayashi, Tetsuya Tatsumi, Mitsuru Okigawa and Kazuhiko Endo. Their work appears in journals such as SHILAP Revista de lepidopterología, Applied Physics Letters and Journal of Applied Physics.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.