Michael J. Lercel

1.3k citations

46 papers · 1.1k indexed · h-index 15

Impact in

Surfaces, Coatings and Films top 5%
- Electron and X-Ray Spectroscopy Techniques
Electrical and Electronic Engineering top 5%
- Molecular Junctions and Nanostructures
- Advancements in Photolithography Techniques
- Semiconductor materials and devices

Papers in

Surfaces, Coatings and Films 26
- Electron and X-Ray Spectroscopy Techniques 22
- Optical Coatings and Gratings 5
Electrical and Electronic Engineering 44
- Advancements in Photolithography Techniques 35
- Semiconductor materials and devices 12
- Integrated Circuits and Semiconductor Failure Analysis 10
- Molecular Junctions and Nanostructures 4

Co-authors: David L. Allara Atul N. Parikh Kannan Seshadri Chin-Shown Sheen H. G. Craighead R. C. Tiberio M. J. Rooks C.S. Whelan
Journals: Applied Physics Letters (4 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (3 papers)Microelectronic Engineering (2 papers)The Journal of Physical Chemistry (1 paper)Journal of Applied Physics (1 paper)
Partner nations: United States Netherlands Japan

In The Last Decade

Michael J. Lercel

41 papers receiving 990 citations

Peers

Countries citing papers authored by Michael J. Lercel

Since Specialization

Citations

This map shows the geographic impact of Michael J. Lercel's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Michael J. Lercel with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Michael J. Lercel more than expected).

Fields of papers citing papers by Michael J. Lercel

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Michael J. Lercel. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Michael J. Lercel. The network helps show where Michael J. Lercel may publish in the future.

Co-authorship network

The 25 scholars most cited alongside Michael J. Lercel, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Michael J. Lercel Line = papers co-authored together Michael J. Lercel links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Holistic Patterning to Advance Semiconductor Manufacturing in the 2020s and Beyond 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) ·李璋琳, Anthony Yen, V. Vanin, Michael J. Lercel, Очилов Рустам Очилович	2022	7
2	EUV reticle defectivity protection options Michael J. Lercel, Emanuela Atzori, Mark van de Kerkhof, Fleur Hopkins-Loféron, Jannick P Milden, Vadim Banine	2019	4
3	Emerging Lithographic Technologies X Michael J. Lercel	2006	8
4	Full-field imaging with a 157-nm scanner Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Chris Robinson, Masatora Aoki, 金希宣, Timothy A. Brunner, M. Hibbs, Michael J. Lercel, C Pedrosa, Buvinic Sonja, E. KANYO, Kenaz A Alzughibi, H. J. Kim	2004	1
5	Reduction of image placement errors in EPL masks Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Obert R. Wood, Phillip L. Reu, Roxann L. Engelstad, Edward G. Lovell, Michael J. Lercel, عزالدين جسوس, Małgorzata Korbińska, Luis Noriega-Portella	2003	0
6	Characterization and etching of sputter-deposited absorber films for extreme ultraviolet lithography (EUVL) masks Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Yolly Adriati, ナイジェルバローズ, Michael J. Lercel	2002	1
7	Predicting overlay performance for electron projection lithography masks Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Phillip L. Reu, Cheng‐fu Chen, Roxann L. Engelstad, Edward G. Lovell, Michael J. Lercel, Obert R. Wood, Luis Noriega-Portella	2002	2
8	Patterning-induced image placement distortions on electron beam projection lithography membrane masks Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Michael J. Lercel, Юлия Зуенкова, Małgorzata Korbińska, ナイジェルバローズ, SuJung Lee, Da Wore Jung, Gideon Lincecum, Yolly Adriati, Phillip L. Reu, Roxann L. Engelstad, Luis Noriega-Portella	2001	7
9	<title>Evaluation and comparison of the pattern-transfer-induced image placement distortions on e-beam projection lithography masks</title> Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Юлия Зуенкова, Michael J. Lercel, Małgorzata Korbińska, Da Wore Jung, SuJung Lee, Gideon Lincecum, Yolly Adriati, ナイジェルバローズ, Phillip L. Reu	2001	2
10	Next-generation lithography mask development at the NGL-MCOC Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Michael J. Lercel, Yolly Adriati, Юлия Зуенкова, Małgorzata Korbińska, J. A. Søreide, Anchal Aradhana Bebarta, Heather R Mattern, 석 다니엘	2000	1
11	Fabrication of masks for electron-beam projection lithography Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Michael J. Lercel, Louise Campion, Anchal Aradhana Bebarta, J. A. Søreide, Heather R Mattern, SuJung Lee, Rajasigamani Kandaswamy, 석 다니엘	2000	2
12	Role of gas feed delivery and dilutent on oxide etching in an inductively coupled plasma etch system Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Michael J. Lercel, Malcolm B. Hanson, Anna Kozina, Codrina-Laura Ioniţă	1998	5
13	Etching processes and characteristics for the fabrication of refractory x-ray masks Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Michael J. Lercel, Фролова Анастасия Олеговна, Yutaka Sugita, M. Surendra	1998	4
14	Improved electron-beam patterning of Si with self-assembled monolayers Applied Physics Letters ·C.S. Whelan, Michael J. Lercel, H. G. Craighead, Kannan Seshadri, David L. Allara	1996	28
15	Plasma etching with self-assembled monolayer masks for nanostructure fabrication Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Michael J. Lercel, H. G. Craighead, Atul N. Parikh, Kannan Seshadri, David L. Allara	1996	39
16	Sub-10 nm lithography with self-assembled monolayers Applied Physics Letters ·Michael J. Lercel, H. G. Craighead, Atul N. Parikh, Kannan Seshadri, David L. Allara	1996	165
17	Electron-Beam-Induced Damage in Self-Assembled Monolayers The Journal of Physical Chemistry ·Kannan Seshadri, K. D. Froyd, Atul N. Parikh, David L. Allara, Michael J. Lercel, Harold G. Craighead	1996	107
18	Electron beam nanofabrication with self-assembled monolayers of alkylthiols and alkylsiloxanes Microelectronic Engineering ·Michael J. Lercel, Sina Akbari Haghighi, M. J. Rooks, R. C. Tiberio, H. G. Craighead, Chin-Shown Sheen, David L. Allara	1995	26
19	Pattern transfer of electron beam modified self-assembled monolayers for high-resolution lithography Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Michael J. Lercel, M. J. Rooks, R. C. Tiberio, H. G. Craighead, Chin-Shown Sheen, Atul N. Parikh, David L. Allara	1995	70
20	Chemical and electrical properties of interfaces between deposited insulators and La2CuO4 Journal of Applied Physics ·A. Levy, Michael J. Lercel, J. P. Falck, M. A. Kastner, A. A. Bright, A. W. Kleinsasser	1992	2

About Michael J. Lercel

Michael J. Lercel is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Industrial and Manufacturing Engineering, Biomedical Engineering and Mechanical Engineering, having authored 46 papers that have together received 1.1k indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (35 papers), Electron and X-Ray Spectroscopy Techniques (22 papers), Semiconductor materials and devices (12 papers), Integrated Circuits and Semiconductor Failure Analysis (10 papers), Advanced Surface Polishing Techniques (7 papers), Welding Techniques and Residual Stresses (7 papers), Optical Coatings and Gratings (5 papers) and Molecular Junctions and Nanostructures (4 papers). The work is most often cited by research in Surfaces, Coatings and Films (197 citations), Electrical and Electronic Engineering (914 citations), Atomic and Molecular Physics, and Optics (377 citations), Biomedical Engineering (512 citations) and Structural Biology (16 citations). Michael J. Lercel has collaborated with scholars based in United States, Netherlands and Japan. Frequent co-authors include David L. Allara, Atul N. Parikh, Kannan Seshadri, Chin-Shown Sheen, H. G. Craighead, H. G. Craighead, R. C. Tiberio, M. J. Rooks, C.S. Whelan and K. D. Froyd. Their work appears in journals such as Applied Physics Letters, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Microelectronic Engineering, The Journal of Physical Chemistry and Journal of Applied Physics.

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