Marion Geidel

489 total citations
21 papers, 416 citations indexed

About

Marion Geidel is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Marion Geidel has authored 21 papers receiving a total of 416 indexed citations (citations by other indexed papers that have themselves been cited), including 19 papers in Electrical and Electronic Engineering, 10 papers in Materials Chemistry and 7 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Marion Geidel's work include Semiconductor materials and devices (16 papers), Electronic and Structural Properties of Oxides (7 papers) and Copper Interconnects and Reliability (6 papers). Marion Geidel is often cited by papers focused on Semiconductor materials and devices (16 papers), Electronic and Structural Properties of Oxides (7 papers) and Copper Interconnects and Reliability (6 papers). Marion Geidel collaborates with scholars based in Germany, United States and Canada. Marion Geidel's co-authors include Thomas Mikolajick, Johann W. Bartha, U. Schröder, Matthias Albert, Thomas Olsen, Andreas Krause, Dominik Martin, Johannes Müller, Stefan Müller and Aarti Singh and has published in prestigious journals such as ACS Nano, Applied Physics Letters and Thin Solid Films.

In The Last Decade

Marion Geidel

21 papers receiving 408 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Marion Geidel Germany 11 395 213 64 51 37 21 416
Cory S. Wajda United States 11 385 1.0× 172 0.8× 81 1.3× 39 0.8× 55 1.5× 46 419
Mohamed Boutchich France 13 231 0.6× 270 1.3× 42 0.7× 77 1.5× 82 2.2× 37 403
S. Kalpat United States 10 314 0.8× 158 0.7× 49 0.8× 55 1.1× 36 1.0× 23 383
Yusaku Kashiwagi Japan 10 268 0.7× 247 1.2× 35 0.5× 48 0.9× 62 1.7× 19 352
B. Roberds United States 9 461 1.2× 108 0.5× 41 0.6× 84 1.6× 53 1.4× 15 503
Pyungho Choi South Korea 10 292 0.7× 203 1.0× 36 0.6× 44 0.9× 47 1.3× 43 380
C. Huffman United States 14 502 1.3× 203 1.0× 66 1.0× 66 1.3× 37 1.0× 38 581
Vijaykumar Toutam India 9 219 0.6× 266 1.2× 76 1.2× 83 1.6× 57 1.5× 18 345
T. Iwabuchi Japan 11 366 0.9× 204 1.0× 59 0.9× 76 1.5× 43 1.2× 31 422
Jean-Louis Codron France 7 220 0.6× 216 1.0× 83 1.3× 126 2.5× 66 1.8× 9 368

Countries citing papers authored by Marion Geidel

Since Specialization
Citations

This map shows the geographic impact of Marion Geidel's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Marion Geidel with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Marion Geidel more than expected).

Fields of papers citing papers by Marion Geidel

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Marion Geidel. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Marion Geidel. The network helps show where Marion Geidel may publish in the future.

Co-authorship network of co-authors of Marion Geidel

This figure shows the co-authorship network connecting the top 25 collaborators of Marion Geidel. A scholar is included among the top collaborators of Marion Geidel based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Marion Geidel. Marion Geidel is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Panchenko, Iuliana, et al.. (2018). Characterisation of Cu/Cu bonding using self-assembled monolayer. Soldering and Surface Mount Technology. 30(2). 106–111. 10 indexed citations
2.
Trommer, Jens, André Heinzig, Uwe Mühle, et al.. (2017). Enabling Energy Efficiency and Polarity Control in Germanium Nanowire Transistors by Individually Gated Nanojunctions. ACS Nano. 11(2). 1704–1711. 88 indexed citations
3.
Löffler, Markus, Marion Geidel, Matthias Albert, et al.. (2017). Area-selective atomic layer deposition of Ru on electron-beam-written Pt(C) patterns versus SiO2substratum. Nanotechnology. 28(39). 395301–395301. 17 indexed citations
4.
Panchenko, Iuliana, et al.. (2017). Cu passivation with self-assembled monolayers for direct metal bonding in 3D integration. Fraunhofer-Publica (Fraunhofer-Gesellschaft). 1–6. 3 indexed citations
6.
Henke, Thomas, Martin Knaut, Christoph Hoßbach, et al.. (2016). Growth of aluminum oxide thin films with enhanced film density by the integration of in situ flash annealing into low-temperature atomic layer deposition. Surface and Coatings Technology. 309. 600–608. 14 indexed citations
7.
Henke, Thomas, Martin Knaut, Christoph Hoßbach, et al.. (2015). Flash-Enhanced Atomic Layer Deposition: Basics, Opportunities, Review, and Principal Studies on the Flash-Enhanced Growth of Thin Films. ECS Journal of Solid State Science and Technology. 4(7). P277–P287. 12 indexed citations
8.
Henke, Thomas, Martin Knaut, Christoph Hoßbach, et al.. (2014). Flash-Lamp-Enhanced Atomic Layer Deposition of Thin Films. ECS Transactions. 64(9). 167–189. 1 indexed citations
9.
Singh, Aarti, Hannes Klumbies, U. Schröder, et al.. (2013). Barrier performance optimization of atomic layer deposited diffusion barriers for organic light emitting diodes using x-ray reflectivity investigations. Applied Physics Letters. 103(23). 22 indexed citations
10.
Merkel, U., Johann W. Bartha, Martin Knaut, et al.. (2013). Characterization of Ru–Mn composites for ULSI interconnects. Microelectronic Engineering. 112. 103–109. 14 indexed citations
11.
Grube, Matthias, Andre Wachowiak, Marion Geidel, et al.. (2013). Molecular beam deposited zirconium dioxide as a high-κ dielectric for future GaN based power devices. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 31(3). 3 indexed citations
12.
Olsen, Thomas, U. Schröder, Stefan Müller, et al.. (2012). Co-sputtering yttrium into hafnium oxide thin films to produce ferroelectric properties. Applied Physics Letters. 101(8). 82905–82905. 152 indexed citations
13.
Geidel, Marion, et al.. (2012). In-situ analysis on the initial growth of ultra-thin ruthenium films with atomic layer deposition. Microelectronic Engineering. 107. 151–155. 17 indexed citations
14.
Knaut, Martin, et al.. (2011). In situ ellipsometric investigations during the ALD growth of Ru. 1 indexed citations
15.
Kaltofen, R., U. Merkel, Steffen Strehle, et al.. (2011). Electrical Evaluation of Ru–W(-N), Ru–Ta(-N) and Ru–Mn films as Cu diffusion barriers. Microelectronic Engineering. 92. 71–75. 29 indexed citations
17.
Geidel, Marion, Martin Knaut, Matthias Albert, & Johann W. Bartha. (2011). In situ XPS investigation of the chemical surface composition during the ALD of ultra-thin aluminum oxide films. 1–4. 6 indexed citations
18.
Bartha, Johann W., et al.. (2011). In situ monitoring for ALD process control. 1 indexed citations
19.
Knaut, Martin, et al.. (2010). In-situ characterization of ruthenium and ruthenium dioxide film growth. 1 indexed citations
20.
Knaut, Martin, et al.. (2010). In-situ analysis of ultra thin ALD capacitor stacks for novel applications. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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