Kimiyoshi Deguchi

451 total citations
37 papers, 356 citations indexed

About

Kimiyoshi Deguchi is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Kimiyoshi Deguchi has authored 37 papers receiving a total of 356 indexed citations (citations by other indexed papers that have themselves been cited), including 34 papers in Electrical and Electronic Engineering, 14 papers in Biomedical Engineering and 13 papers in Surfaces, Coatings and Films. Recurrent topics in Kimiyoshi Deguchi's work include Advancements in Photolithography Techniques (32 papers), Electron and X-Ray Spectroscopy Techniques (13 papers) and Advanced Surface Polishing Techniques (10 papers). Kimiyoshi Deguchi is often cited by papers focused on Advancements in Photolithography Techniques (32 papers), Electron and X-Ray Spectroscopy Techniques (13 papers) and Advanced Surface Polishing Techniques (10 papers). Kimiyoshi Deguchi collaborates with scholars based in Japan and United States. Kimiyoshi Deguchi's co-authors include Hiroshi Ban, Jiro Nakamura, Akinobu Tanaka, T. Ishii, M. Oda, Yoshio Kawai, Akira Ozawa, Hideo Yoshihara, Toshiyuki Horiuchi and Makoto Fukuda and has published in prestigious journals such as Journal of Applied Polymer Science, Japanese Journal of Applied Physics and Journal of Electron Spectroscopy and Related Phenomena.

In The Last Decade

Kimiyoshi Deguchi

36 papers receiving 334 citations

Peers

Kimiyoshi Deguchi
T. R. Groves United States
James S. Greeneich United States
L. P. Muray United States
A. Meshalkin Moldova
Vadim Sidorkin Netherlands
T. R. Groves United States
Kimiyoshi Deguchi
Citations per year, relative to Kimiyoshi Deguchi Kimiyoshi Deguchi (= 1×) peers T. R. Groves

Countries citing papers authored by Kimiyoshi Deguchi

Since Specialization
Citations

This map shows the geographic impact of Kimiyoshi Deguchi's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Kimiyoshi Deguchi with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Kimiyoshi Deguchi more than expected).

Fields of papers citing papers by Kimiyoshi Deguchi

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Kimiyoshi Deguchi. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Kimiyoshi Deguchi. The network helps show where Kimiyoshi Deguchi may publish in the future.

Co-authorship network of co-authors of Kimiyoshi Deguchi

This figure shows the co-authorship network connecting the top 25 collaborators of Kimiyoshi Deguchi. A scholar is included among the top collaborators of Kimiyoshi Deguchi based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Kimiyoshi Deguchi. Kimiyoshi Deguchi is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Deguchi, Kimiyoshi, Jiro Nakamura, Yoshio Kawai, et al.. (1999). Lithographic Performance of a Chemically Amplified Resist Developed for Synchrotron Radiation Lithography in the Sub-100-nm Region. Japanese Journal of Applied Physics. 38(12S). 7090–7090. 4 indexed citations
2.
Fukuda, Makoto, Masanori Suzuki, Tsuneyuki Haga, et al.. (1999). Performance of X-Ray Stepper for Next-Generation Lithography. Japanese Journal of Applied Physics. 38(12S). 7059–7059. 6 indexed citations
3.
Kawai, Yoshio, Kimiyoshi Deguchi, & Jiro Nakamura. (1999). Phantom Exposure of Chemically Amplified Resist in KrF Excimer Laser Lithography. Japanese Journal of Applied Physics. 38(12S). 6994–6994. 5 indexed citations
4.
Okada, Ikuo, et al.. (1998). Mask Contamination Induced by X-Ray Exposure. Japanese Journal of Applied Physics. 37(12S). 6808–6808. 5 indexed citations
5.
Miyake, Masayasu, Toshio Kobayashi, Yutaka Sakakibara, Kimiyoshi Deguchi, & Mitsutoshi Takahashi. (1998). Deep-Submicron Single-Gate Complementary Metal Oxide Semiconductor (CMOS) Technology Using Channel Preamorphization. Japanese Journal of Applied Physics. 37(3S). 1050–1050. 1 indexed citations
6.
Nakamura, Jiro, Kimiyoshi Deguchi, & Hiroshi Ban. (1998). Resist Surface Roughness Calculated using Theoretical Percolation Model.. Journal of Photopolymer Science and Technology. 11(4). 571–576. 16 indexed citations
7.
Kikuchi, Yukiko, Shinji Sugihara, Hiroshi Nomura, et al.. (1996). Evaluation of Replicated Dynamic Random Access Memory Cell Patterns using X-Ray Lithography. Japanese Journal of Applied Physics. 35(12S). 6452–6452. 5 indexed citations
8.
Deguchi, Kimiyoshi, et al.. (1996). Recent progress in synchrotron radiation lithography. Journal of Electron Spectroscopy and Related Phenomena. 80. 321–327. 1 indexed citations
9.
Deguchi, Kimiyoshi, et al.. (1996). Extendibility of synchrotron radiation lithography to the sub-100 nm region. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 14(6). 4294–4297. 30 indexed citations
10.
Ban, Hiroshi, Kimiyoshi Deguchi, Akinobu Tanaka, & Jiro Nakamura. (1994). Overcoat Processing Technique for a Highly-sensitive Chemically Amplified Positive X-ray Resist.. Journal of Photopolymer Science and Technology. 7(1). 17–22. 4 indexed citations
11.
Deguchi, Kimiyoshi. (1993). Synchrotron radiation X-ray lithography for the fabrication of sub-quartermicron large-scale-integrated circuits.. Journal of Photopolymer Science and Technology. 6(4). 445–456. 1 indexed citations
12.
Deguchi, Kimiyoshi, et al.. (1992). X-Ray Phase-Shifting Mask for 0.1-µm Pattern Replication under a Large Proximity Gap Condition. Japanese Journal of Applied Physics. 31(12S). 4221–4221. 18 indexed citations
13.
Deguchi, Kimiyoshi, et al.. (1992). Application of x-ray lithography with a single-layer resist process to subquartermicron large scale integrated circuit fabrication. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(6). 3145–3149. 22 indexed citations
14.
Deguchi, Kimiyoshi, et al.. (1992). Effects of Fresnel Diffraction on Resolution and Linewidth Control in Synchrotron Radiation Lithography. Japanese Journal of Applied Physics. 31(3R). 938–938. 10 indexed citations
15.
Deguchi, Kimiyoshi, et al.. (1992). Patterning Characteristics of a Chemically-Amplified Negative Resist in Synchrotron Radiation Lithography. Japanese Journal of Applied Physics. 31(9R). 2954–2954. 50 indexed citations
16.
Nakamura, Jiro, Hiroshi Ban, Kimiyoshi Deguchi, & Akinobu Tanaka. (1991). Effect of Acid Diffusion on Resolution of a Chemically Amplified Resist in X-Ray Lithography. Japanese Journal of Applied Physics. 30(10R). 2619–2619. 72 indexed citations
17.
Deguchi, Kimiyoshi, et al.. (1990). Effects of Photo- and Auger Electron Scattering on Resolution and Linewidth Control in SR Lithography. Japanese Journal of Applied Physics. 29(10R). 2207–2207. 8 indexed citations
18.
Ban, Hiroshi, Akinobu Tanaka, Yoshio Kawai, & Kimiyoshi Deguchi. (1989). Alkali-Developable Silicone-Based Negative Photoresist (SNP) for Deep UV, Electron Beam, and X-Ray Lithographies. Japanese Journal of Applied Physics. 28(10A). L1863–L1863. 7 indexed citations
19.
Deguchi, Kimiyoshi, Hideo Namatsu, Kazuhiko Komatsu, & Akira Yoshikawa. (1987). Effects of photoelectrons ejected from the substrate on patterning characteristics in x-ray lithography. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 5(2). 551–554. 8 indexed citations
20.
Kinoshita, Hiroo, et al.. (1986). Air bearing guided high speed XY stage.. Journal of the Japan Society for Precision Engineering. 52(10). 1713–1718. 8 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Rankless by CCL
2026