E. Pargon

1.3k citations

86 papers · 990 indexed · h-index 17

Impact in

Electrical and Electronic Engineering top 5%
- Semiconductor materials and devices
- Advancements in Photolithography Techniques
- Photonic and Optical Devices
- Integrated Circuits and Semiconductor Failure Analysis
- Plasma Diagnostics and Applications
Surfaces, Coatings and Films top 10%

Papers in ⓘ

Electrical and Electronic Engineering 78
- Semiconductor materials and devices 39
- Advancements in Photolithography Techniques 26
- Integrated Circuits and Semiconductor Failure Analysis 20
- Plasma Diagnostics and Applications 13
- Photonic and Optical Devices 13
Surfaces, Coatings and Films 9

Co-authors: O. Joubert (23 shared papers)Camille Petit‐Etienne (33 shared papers)Marc Fouchier (18 shared papers)K. Menguelti (10 shared papers)M. Martin (10 shared papers)Corrado Sciancalepore (13 shared papers)Thorsten Lill (5 shared papers)Laurène Youssef (11 shared papers)
Journals: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena (8 papers)Journal of Applied Physics (7 papers)Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (6 papers)Materials Science in Semiconductor Processing (3 papers)Microelectronic Engineering (3 papers)
Partner nations: France Canada United States

In The Last Decade

E. Pargon

84 papers receiving 962 citations

Peers

Countries citing papers authored by E. Pargon

Since Specialization

Citations

This map shows the geographic impact of E. Pargon's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by E. Pargon with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites E. Pargon more than expected).

Fields of papers citing papers by E. Pargon

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by E. Pargon. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by E. Pargon. The network helps show where E. Pargon may publish in the future.

Co-authors

The 25 scholars most cited alongside E. Pargon, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with E. Pargon Line = papers co-authored together E. Pargon links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

Showing the 20 most-cited of 86 papers — load more, or switch the sort, to bring in the rest.

#	Work
1	Ultralow-loss tightly confining Si₃N₄ waveguides and high-Q microresonators Optics Express ·Houssein El Dirani, Laurène Youssef, Camille Petit‐Etienne, S. Kerdilès, Philippe Grosse, Christelle Monat, E. Pargon, Corrado Sciancalepore	2019	87
2	Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm photoresists Journal of Applied Physics ·E. Pargon, K. Menguelti, M. Martin, Arnaud Bazin, Odette Chaix‐Pluchery, Claire Sourd, S. Derrough, Thorsten Lill, O. Joubert	2009	63
3	Impact of chemistry on profile control of resist masked silicon gates etched in high density halogen-based plasmas Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·X. Detter, R. Palla, I. Thomas-Boutherin, E. Pargon, G. Cunge, O. Joubert, L. Vallier	2003	42
4	An atomic force microscopy-based method for line edge roughness measurement Journal of Applied Physics ·Marc Fouchier, E. Pargon, Benjamin Bardet	2013	42
5	Unbiased line width roughness measurements with critical dimension scanning electron microscopy and critical dimension atomic force microscopy Journal of Applied Physics ·L. Azarnouche, E. Pargon, K. Menguelti, Marc Fouchier, D. Fuard, P. Gouraud, C. Vérove, O. Joubert	2012	41
6	Programmable frequency-bin quantum states in a nano-engineered silicon device Nature Communications ·Marco Clementi, Federico Andrea Sabattoli, Massimo Borghi, Linda Gianini, Noemi Tagliavacche, Houssein El Dirani, Laurène Youssef, Nicola Bergamasco, Camille Petit‐Etienne, E. Pargon, J. E. Sipe, Marco Liscidini, Corrado Sciancalepore, Mattéo Galli, Daniele Bajoni	2023	40
7	Plasma impact on 193 nm photoresist linewidth roughness: Role of plasma vacuum ultraviolet light Applied Physics Letters ·E. Pargon, M. Martin, K. Menguelti, L. Azarnouche, J. Foucher, O. Joubert	2009	39
8	Linewidth roughness transfer measured by critical dimension atomic force microscopy during plasma patterning of polysilicon gate transistors Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·E. Pargon, M. Martin, J. Thiault, O. Joubert, J. Foucher, Thorsten Lill	2008	37
9	Improvement of Sidewall Roughness of Submicron SOI Waveguides by Hydrogen Plasma and Annealing IEEE Photonics Technology Letters ·Cyril Bellegarde, E. Pargon, Corrado Sciancalepore, Camille Petit‐Etienne, Vincent Hugues, Daniel Robin-Brosse, Jean‐Michel Hartmann, Philippe Lyan	2018	35
10	Benefits of plasma treatments on critical dimension control and line width roughness transfer during gate patterning Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·L. Azarnouche, E. Pargon, K. Menguelti, Marc Fouchier, Olivier Joubert, P. Gouraud, Christophe Verove	2012	28
11	HBr Plasma Treatment Versus VUV Light Treatment to Improve 193 nm Photoresist Pattern Linewidth Roughness Plasma Processes and Polymers ·E. Pargon, L. Azarnouche, Marc Fouchier, K. Menguelti, Raluca Tiron, Claire Sourd, O. Joubert	2011	27
12	Towards a controlled patterning of 10 nm silicon gates in high density plasmas Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·E. Pargon, Maxime Darnon, O. Joubert, T. Chevolleau, L. Vallier, L. Mollard, Thorsten Lill	2005	25
13	Chemical topography analyses of silicon gates etched in HBr/Cl2/O2 and HBr/Cl2/O2/CF4 high density plasmas HAL (Le Centre pour la Communication Scientifique Directe) ·L. Vallier, J. Foucher, X. Detter, E. Pargon, O. Joubert, G. Cunge, Thorsten Lill	2003	21
14	A Complete Si Photonics Platform Embedding Ultra-Low Loss Waveguides for O- and C-Band Journal of Lightwave Technology ·Quentin Wilmart, S. Brision, Jean‐Michel Hartmann, A. Myko, Karen Ribaud, Camille Petit‐Etienne, Laurène Youssef, Daivid Fowler, Benoı̂t Charbonnier, Corrado Sciancalepore, E. Pargon, Stéphane Bernabé, Bertrand Szelag	2020	20
15	Reconfigurable Silicon Photonic Chip for the Generation Of Frequency-Bin-Entangled Qudits Physical Review Applied ·Massimo Borghi, Noemi Tagliavacche, Federico Andrea Sabattoli, Houssein El Dirani, Laurène Youssef, Camille Petit‐Etienne, E. Pargon, J. E. Sipe, Marco Liscidini, Corrado Sciancalepore, Mattéo Galli, Daniele Bajoni	2023	18
16	Vacuum ultra violet absorption spectroscopy of 193 nm photoresists Applied Physics A ·Marc Fouchier, E. Pargon, L. Azarnouche, K. Menguelti, O. Joubert, Thomas Cardolaccia, Young Chan Bae	2011	17
17	Influence of plasma process on III-V/Ge multijunction solar cell via etching Solar Energy Materials and Solar Cells ·Mathieu de Lafontaine, E. Pargon, Camille Petit‐Etienne, Guillaume Gay, Abdelatif Jaouad, Marie-Josée Gour, Maïté Volatier, S. Fafard, Vincent Aimez, Maxime Darnon	2019	17
18	Two-step cycling process alternating implantation and remote plasma etching for topographically selective etching: Application to Si3N4 spacer etching Journal of Applied Physics ·Vincent Renaud, Camille Petit‐Etienne, Jean‐Paul Barnes, Jérémie Bisserier, O. Joubert, E. Pargon	2019	15
19	Poly-Si/TiN/Mo/HfO2 gate stack etching in high-density plasmas Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·O. Luere, E. Pargon, L. Vallier, O. Joubert	2011	15
20	Impact of HBr and Ar cure plasma treatments on 193nm photoresists Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Arnaud Bazin, E. Pargon, X. Mellhaoui, Damien Perret, Bénédicte Mortini, O. Joubert	2008	15

About E. Pargon

E. Pargon is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films, Condensed Matter Physics, Electronic, Optical and Magnetic Materials and Atomic and Molecular Physics, and Optics, having authored 86 papers that have together received 990 indexed citations. Recurring topics across this work include Semiconductor materials and devices (39 papers), Advancements in Photolithography Techniques (26 papers), Integrated Circuits and Semiconductor Failure Analysis (20 papers), Plasma Diagnostics and Applications (13 papers), Photonic and Optical Devices (13 papers), Advanced Surface Polishing Techniques (11 papers), Metal and Thin Film Mechanics (10 papers) and GaN-based semiconductor devices and materials (10 papers). The work is most often cited by research in Electrical and Electronic Engineering (848 citations), Surfaces, Coatings and Films (79 citations), Atomic and Molecular Physics, and Optics (281 citations), Electronic, Optical and Magnetic Materials (112 citations) and Mechanics of Materials (141 citations). E. Pargon has collaborated with scholars based in France, Canada and United States. Frequent co-authors include O. Joubert, Camille Petit‐Etienne, Marc Fouchier, K. Menguelti, M. Martin, Corrado Sciancalepore, Thorsten Lill, Laurène Youssef, L. Vallier and J. Foucher. Their work appears in journals such as Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, Journal of Applied Physics, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films, Materials Science in Semiconductor Processing and Microelectronic Engineering.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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