E. Pargon

1.3k total citations
86 papers, 990 citations indexed

About

E. Pargon is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, E. Pargon has authored 86 papers receiving a total of 990 indexed citations (citations by other indexed papers that have themselves been cited), including 78 papers in Electrical and Electronic Engineering, 21 papers in Biomedical Engineering and 17 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in E. Pargon's work include Semiconductor materials and devices (39 papers), Advancements in Photolithography Techniques (26 papers) and Integrated Circuits and Semiconductor Failure Analysis (20 papers). E. Pargon is often cited by papers focused on Semiconductor materials and devices (39 papers), Advancements in Photolithography Techniques (26 papers) and Integrated Circuits and Semiconductor Failure Analysis (20 papers). E. Pargon collaborates with scholars based in France, Canada and United States. E. Pargon's co-authors include O. Joubert, Marc Fouchier, Camille Petit‐Etienne, K. Menguelti, M. Martin, Corrado Sciancalepore, Thorsten Lill, Laurène Youssef, L. Vallier and J. Foucher and has published in prestigious journals such as Physical Review Letters, Nature Communications and Applied Physics Letters.

In The Last Decade

E. Pargon

84 papers receiving 962 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
E. Pargon France 17 848 281 210 148 141 86 990
M. Martin France 20 964 1.1× 618 2.2× 279 1.3× 225 1.5× 71 0.5× 71 1.1k
Camille Petit‐Etienne France 15 567 0.7× 218 0.8× 112 0.5× 246 1.7× 87 0.6× 58 768
C. Gourgon France 17 658 0.8× 460 1.6× 551 2.6× 141 1.0× 90 0.6× 78 1.0k
Elmar Platzgummer Austria 17 436 0.5× 480 1.7× 380 1.8× 221 1.5× 72 0.5× 80 1.0k
Christophe Mihalcea United States 9 167 0.2× 333 1.2× 326 1.6× 154 1.0× 84 0.6× 18 650
Soham Saha United States 15 587 0.7× 514 1.8× 400 1.9× 137 0.9× 34 0.2× 33 992
Ségolène Callard France 15 417 0.5× 386 1.4× 251 1.2× 205 1.4× 28 0.2× 36 679
Yasuto Hijikata Japan 19 1.1k 1.3× 286 1.0× 126 0.6× 437 3.0× 81 0.6× 117 1.4k
Daniel Guidotti United States 18 705 0.8× 293 1.0× 114 0.5× 119 0.8× 69 0.5× 81 975

Countries citing papers authored by E. Pargon

Since Specialization
Citations

This map shows the geographic impact of E. Pargon's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by E. Pargon with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites E. Pargon more than expected).

Fields of papers citing papers by E. Pargon

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by E. Pargon. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by E. Pargon. The network helps show where E. Pargon may publish in the future.

Co-authorship network of co-authors of E. Pargon

This figure shows the co-authorship network connecting the top 25 collaborators of E. Pargon. A scholar is included among the top collaborators of E. Pargon based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with E. Pargon. E. Pargon is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Pargon, E., et al.. (2025). KOH Wet Etching Mechanisms of III–N Nanopillars: Impact of Temperature and Concentration. ACS Applied Materials & Interfaces. 17(20). 29836–29846. 1 indexed citations
2.
Chrétien, Jérémie, E. Pargon, Jinyoun Cho, et al.. (2024). Enhancing minority carrier lifetime in Ge: Insights from HF and HCl cleaning procedures. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 42(1). 1 indexed citations
3.
Petit‐Etienne, Camille, et al.. (2024). Faceting mechanisms of GaN nanopillar under KOH wet etching. Materials Science in Semiconductor Processing. 173. 108095–108095. 5 indexed citations
4.
Borghi, Massimo, Houssein El Dirani, Laurène Youssef, et al.. (2023). Reconfigurable Silicon Photonic Chip for the Generation Of Frequency-Bin-Entangled Qudits. Physical Review Applied. 19(6). 18 indexed citations
5.
Borghi, Massimo, Houssein El Dirani, Laurène Youssef, et al.. (2023). Programmable frequency-bin quantum states in a nano-engineered silicon device. Nature Communications. 14(1). 176–176. 40 indexed citations
6.
Grassani, Davide, Laurène Youssef, Camille Petit‐Etienne, et al.. (2022). Extending thermal stability of short-living soliton states in silicon nitride microring resonators. Optics Continuum. 1(7). 1516–1516. 5 indexed citations
7.
Dirani, Houssein El, Laurène Youssef, Davide Grassani, et al.. (2022). Nonlinear coupling of linearly uncoupled resonators through a Mach–Zehnder interferometer. Applied Physics Letters. 121(20). 3 indexed citations
8.
Pargon, E., Guillaume Gay, Camille Petit‐Etienne, et al.. (2022). Multijunction solar cell mesa isolation: Correlation between process, morphology and cell performance. Solar Energy Materials and Solar Cells. 239. 111643–111643. 2 indexed citations
9.
Pargon, E., Guillaume Gay, Camille Petit‐Etienne, et al.. (2022). Multijunction solar cell mesa isolation: A comparative study. AIP conference proceedings. 2550. 20003–20003. 2 indexed citations
10.
Landesman, Jean-Pierre, Ray LaPierre, Christophe Levallois, et al.. (2021). Low temperature micro-photoluminescence spectroscopy of microstructures with InAsP/InP strained quantum wells. Journal of Physics D Applied Physics. 54(44). 445106–445106. 1 indexed citations
11.
Pargon, E., Guillaume Gay, Camille Petit‐Etienne, et al.. (2021). Anisotropic and low damage III-V/Ge heterostructure etching for multijunction solar cell fabrication with passivated sidewalls. Micro and Nano Engineering. 11. 100083–100083. 6 indexed citations
12.
Dirani, Houssein El, Laurène Youssef, Davide Grassani, et al.. (2021). Suppression of Parasitic Nonlinear Processes in Spontaneous Four-Wave Mixing with Linearly Uncoupled Resonators. Physical Review Letters. 127(3). 33901–33901. 14 indexed citations
13.
Dirani, Houssein El, Laurène Youssef, Camille Petit‐Etienne, et al.. (2020). Microcomb Source Based on InP DFB / Si3N4 Microring Butt-Coupling. Journal of Lightwave Technology. 38(19). 5517–5525. 8 indexed citations
14.
Wilmart, Quentin, Philippe Grosse, Benoı̂t Charbonnier, et al.. (2019). Ultra Low-Loss Silicon Waveguides for 200 mm Photonics Platform. 1–2. 5 indexed citations
15.
Salem, B., Guillaume Gay, M. Martin, et al.. (2017). Sub-10 nm plasma nanopatterning of InGaAs with nearly vertical and smooth sidewalls for advanced n-fin field effect transistors on silicon. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 35(2). 5 indexed citations
16.
Garnier, Philippe, et al.. (2015). Investigation of the TiN/photoresist interface degradation during a wet etch. Microelectronic Engineering. 135. 7–12. 6 indexed citations
17.
Jussot, Julien, et al.. (2014). Line width roughness reduction strategies for patterns exposed via electron beam lithography. HAL (Le Centre pour la Communication Scientifique Directe). 6 indexed citations
18.
Mellhaoui, X., et al.. (2008). Plasma etching of HfO2 in metal gate CMOS devices. Microelectronic Engineering. 86(4-6). 965–967. 13 indexed citations
19.
Pargon, E., Maxime Darnon, O. Joubert, et al.. (2005). Towards a controlled patterning of 10 nm silicon gates in high density plasmas. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 23(5). 1913–1923. 25 indexed citations
20.
Vallier, L., J. Foucher, E. Pargon, et al.. (2003). Chemical topography analyses of silicon gates etched in HBr/Cl2/O2 and HBr/Cl2/O2/CF4 high density plasmas. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 21(2). 904–911. 21 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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