Johannes Kretz

1.2k total citations
68 papers, 846 citations indexed

About

Johannes Kretz is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Johannes Kretz has authored 68 papers receiving a total of 846 indexed citations (citations by other indexed papers that have themselves been cited), including 52 papers in Electrical and Electronic Engineering, 25 papers in Biomedical Engineering and 20 papers in Surfaces, Coatings and Films. Recurrent topics in Johannes Kretz's work include Advancements in Photolithography Techniques (25 papers), Semiconductor materials and devices (24 papers) and Integrated Circuits and Semiconductor Failure Analysis (21 papers). Johannes Kretz is often cited by papers focused on Advancements in Photolithography Techniques (25 papers), Semiconductor materials and devices (24 papers) and Integrated Circuits and Semiconductor Failure Analysis (21 papers). Johannes Kretz collaborates with scholars based in Germany, Austria and United States. Johannes Kretz's co-authors include Hans W. P. Koops, M. Rudolph, M. Weber, J. Hartwich, W. Rösner, Lorenz Risch, Michael Specht, M. Städele, E. Landgraf and F. Hofmann and has published in prestigious journals such as Applied Physics Letters, Journal of The Electrochemical Society and Japanese Journal of Applied Physics.

In The Last Decade

Johannes Kretz

62 papers receiving 783 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Johannes Kretz Germany 15 533 246 207 198 181 68 846
Erik M. Secula United States 11 349 0.7× 124 0.5× 179 0.9× 47 0.2× 106 0.6× 156 591
A. Muray United States 10 553 1.0× 192 0.8× 587 2.8× 62 0.3× 64 0.4× 18 864
W. W. Molzen United States 12 520 1.0× 173 0.7× 170 0.8× 57 0.3× 65 0.4× 20 681
Maja Ðukić Switzerland 7 199 0.4× 118 0.5× 97 0.5× 131 0.7× 79 0.4× 9 436
S. Babin United States 13 530 1.0× 304 1.2× 181 0.9× 34 0.2× 33 0.2× 91 662
H. H. Harary United States 8 415 0.8× 40 0.2× 393 1.9× 68 0.3× 37 0.2× 10 793
T. Yoshida Japan 15 546 1.0× 43 0.2× 141 0.7× 30 0.2× 58 0.3× 108 656
F. Lorut France 11 298 0.6× 73 0.3× 113 0.5× 66 0.3× 17 0.1× 51 459
H. Namatsu Japan 16 1.0k 1.9× 90 0.4× 470 2.3× 31 0.2× 17 0.1× 33 1.2k
Birgit Päivänranta Finland 12 298 0.6× 226 0.9× 369 1.8× 10 0.1× 28 0.2× 18 631

Countries citing papers authored by Johannes Kretz

Since Specialization
Citations

This map shows the geographic impact of Johannes Kretz's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Johannes Kretz with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Johannes Kretz more than expected).

Fields of papers citing papers by Johannes Kretz

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Johannes Kretz. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Johannes Kretz. The network helps show where Johannes Kretz may publish in the future.

Co-authorship network of co-authors of Johannes Kretz

This figure shows the co-authorship network connecting the top 25 collaborators of Johannes Kretz. A scholar is included among the top collaborators of Johannes Kretz based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Johannes Kretz. Johannes Kretz is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Kretz, Johannes. (2015). Morphing Sound in Real Time through the Timbre Tunnel. The Journal of the Abraham Lincoln Association. 2015.
2.
Hohle, Christoph, et al.. (2009). Design verification for sub-70-nm DRAM nodes via metal fix using E-beam direct write. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7470. 747017–747017. 4 indexed citations
3.
Choi, Kang‐Hoon, et al.. (2009). Fast backscattering parameter determination in e-beam lithography with a modified doughnut test. Microelectronic Engineering. 86(12). 2408–2411. 5 indexed citations
4.
Hohle, Christoph, et al.. (2009). Fabrication of metrology test structures for future technology nodes using high-resolution variable-shaped e-beam direct write. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 72712M–72712M. 2 indexed citations
5.
Hohle, Christoph, et al.. (2007). Defect inspection of positive and negative sub-60nm resist pattern printed with variable shaped E-Beam direct write lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6517. 651711–651711. 2 indexed citations
6.
Beyer, Dirk, et al.. (2006). Evaluation of most recent chemically amplified resists for high resolution direct write using a Leica SB350 variable shaped beam writer. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 615347–615347. 1 indexed citations
7.
Graham, Anthony, J. Hartwich, Johannes Kretz, et al.. (2006). Comparison of Trimming Techniques for Sub-Lithographic Silicon Structures. Japanese Journal of Applied Physics. 45(6S). 5552–5552. 4 indexed citations
8.
Weber, W., W. Rösner, J. Hartwich, et al.. (2006). Planar Double Gate Transistors with Asymmetric Independent Gates. 20. 126–127. 2 indexed citations
9.
Hartwich, J., F. Hofmann, Johannes Kretz, et al.. (2005). Fabrication of ultra-thin-film SOI transistors using the recessed channel concept. Microelectronic Engineering. 78-79. 224–228. 2 indexed citations
10.
Weber, W., et al.. (2005). Electron beam lithography for nanometer-scale planar double-gate transistors. Microelectronic Engineering. 78-79. 206–211. 3 indexed citations
11.
Kretz, Johannes, et al.. (2005). Comparative study of calixarene and HSQ resist systems for the fabrication of sub-20nm MOSFET device demonstrators. Microelectronic Engineering. 78-79. 479–483. 13 indexed citations
12.
Rösner, W., E. Landgraf, Johannes Kretz, et al.. (2004). Nanoscale FinFETs for low power applications. Solid-State Electronics. 48(10-11). 1819–1823. 18 indexed citations
13.
Luyken, R.J., Michael Specht, W. Rösner, et al.. (2004). Drain leakage mechanisms in fully depleted SOI devices with undoped channel [MOSFETs]. 419–422. 1 indexed citations
14.
Schulz, T., C. Pacha, R.J. Luyken, et al.. (2003). Impact of technology parameters on device performance of UTB-SOI CMOS. Solid-State Electronics. 48(4). 521–527. 11 indexed citations
15.
Kretz, Johannes. (2000). Untersuchungen zur Schwingungsempfindlichkeit eines Hochregallagers. Stahlbau. 69(9). 719–726. 1 indexed citations
16.
Mühl, Thomas, et al.. (1998). Nanolithography of metal films using scanning force microscope patterned carbon masks. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 16(6). 3879–3882. 14 indexed citations
17.
Weber, M., Hans W. P. Koops, M. Rudolph, Johannes Kretz, & G. Schmidt. (1995). New compound quantum dot materials produced by electron-beam induced deposition. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 13(3). 1364–1368. 48 indexed citations
18.
Koops, Hans W. P., et al.. (1994). Characterization and Application of Materials Grown by Electron-Beam-Induced Deposition. Japanese Journal of Applied Physics. 33(12S). 7099–7099. 191 indexed citations
19.
Koops, Hans W. P., et al.. (1994). Combined lithographies for the reduction of stitching errors in lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 12(6). 3265–3269. 2 indexed citations
20.
Kretz, Johannes. (1958). Therapie und Praxis. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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