Sergey Zyryanov

1.1k total citations
50 papers, 863 citations indexed

About

Sergey Zyryanov is a scholar working on Electrical and Electronic Engineering, Mechanics of Materials and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Sergey Zyryanov has authored 50 papers receiving a total of 863 indexed citations (citations by other indexed papers that have themselves been cited), including 44 papers in Electrical and Electronic Engineering, 27 papers in Mechanics of Materials and 21 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Sergey Zyryanov's work include Metal and Thin Film Mechanics (26 papers), Semiconductor materials and devices (23 papers) and Copper Interconnects and Reliability (21 papers). Sergey Zyryanov is often cited by papers focused on Metal and Thin Film Mechanics (26 papers), Semiconductor materials and devices (23 papers) and Copper Interconnects and Reliability (21 papers). Sergey Zyryanov collaborates with scholars based in Russia, Belgium and China. Sergey Zyryanov's co-authors include D. V. Lopaev, Т. В. Рахимова, A. T. Rakhimov, Yu. A. Mankelevich, A I Zotovich, Mikhaı̈l R. Baklanov, A. S. Kovalev, О. В. Прошина, D. G. Voloshin and A.N. Vasilieva and has published in prestigious journals such as SHILAP Revista de lepidopterología, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

Sergey Zyryanov

50 papers receiving 832 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Sergey Zyryanov Russia 18 763 389 299 206 204 50 863
JJ Beulens Netherlands 14 666 0.9× 364 0.9× 112 0.4× 78 0.4× 282 1.4× 24 814
I. Jauberteau France 13 312 0.4× 248 0.6× 52 0.2× 117 0.6× 250 1.2× 50 534
B. Grolleau France 16 690 0.9× 192 0.5× 58 0.2× 71 0.3× 407 2.0× 28 834
Y. Catherine France 20 953 1.2× 466 1.2× 65 0.2× 77 0.4× 1.0k 5.1× 29 1.4k
Kazuhiro Karahashi Japan 18 842 1.1× 242 0.6× 91 0.3× 16 0.1× 399 2.0× 57 977
Ludovic de Poucques France 19 476 0.6× 534 1.4× 64 0.2× 13 0.1× 496 2.4× 51 771
Shigeru Nishimatsu Japan 16 820 1.1× 131 0.3× 89 0.3× 26 0.1× 307 1.5× 36 918
S. Mariazzi Italy 13 136 0.2× 288 0.7× 54 0.2× 24 0.1× 234 1.1× 58 507
Yoshio Manabe Japan 10 278 0.4× 94 0.2× 200 0.7× 19 0.1× 261 1.3× 25 616
D. Magni Switzerland 5 292 0.4× 81 0.2× 29 0.1× 88 0.4× 183 0.9× 9 448

Countries citing papers authored by Sergey Zyryanov

Since Specialization
Citations

This map shows the geographic impact of Sergey Zyryanov's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Sergey Zyryanov with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Sergey Zyryanov more than expected).

Fields of papers citing papers by Sergey Zyryanov

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Sergey Zyryanov. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Sergey Zyryanov. The network helps show where Sergey Zyryanov may publish in the future.

Co-authorship network of co-authors of Sergey Zyryanov

This figure shows the co-authorship network connecting the top 25 collaborators of Sergey Zyryanov. A scholar is included among the top collaborators of Sergey Zyryanov based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Sergey Zyryanov. Sergey Zyryanov is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Booth, Jean‐Paul, Olivier Guaitella, Shu Zhang, et al.. (2023). Oxygen atom and ozone kinetics in the afterglow of a pulse-modulated DC discharge in pure O2: an experimental and modelling study of surface mechanisms and ozone vibrational kinetics. Plasma Sources Science and Technology. 32(9). 95016–95016. 9 indexed citations
2.
Booth, Jean‐Paul, Olivier Guaitella, D. V. Lopaev, et al.. (2022). Quenching of O 2 (b 1 Σ g + ) by O( 3 P) atoms. Effect of gas temperature. Plasma Sources Science and Technology. 31(6). 65012–65012. 17 indexed citations
3.
Lopaev, D. V., A I Zotovich, О. В. Прошина, et al.. (2022). Effect of an electron beam on a dual-frequency capacitive rf plasma: experiment and simulation *. Plasma Sources Science and Technology. 31(9). 94001–94001. 8 indexed citations
4.
Lopaev, D. V., A I Zotovich, Sergey Zyryanov, et al.. (2022). Effect of H atoms and UV wideband radiation on cured low-k OSG films. Journal of Physics D Applied Physics. 55(25). 255206–255206. 2 indexed citations
5.
Lopaev, D. V., et al.. (2022). Dynamics of H atoms surface recombination in low-temperature plasma. Journal of Applied Physics. 132(19). 3 indexed citations
6.
Lopaev, D. V., et al.. (2021). ‘Virtual IED sensor’ for df rf CCP discharges. Plasma Sources Science and Technology. 30(7). 75020–75020. 12 indexed citations
7.
Booth, Jean‐Paul, Olivier Guaitella, J. Santos Sousa, et al.. (2020). Determination of absolute O( 3 P) and O 2 (a 1 Δ g ) densities and kinetics in fully modulated O 2 dc glow discharges from the O 2 (X 3 Σ g ) afterglow recovery dynamics. Plasma Sources Science and Technology. 29(11). 115009–115009. 22 indexed citations
8.
Lopaev, D. V., Sergey Zyryanov, A I Zotovich, et al.. (2020). Damage to porous SiCOH low- k dielectrics by O, N and F atoms at lowered temperatures. Journal of Physics D Applied Physics. 53(17). 175203–175203. 9 indexed citations
9.
Lopaev, D. V., et al.. (2019). Volume and surface loss of O( 3 P) atoms in O 2 RF discharge in quartz tube at intermediate pressures (10–100 Torr). Journal of Physics D Applied Physics. 52(39). 395203–395203. 3 indexed citations
10.
Воронина, Е. Н., D. V. Lopaev, Т. В. Рахимова, et al.. (2019). Pore sealing mechanism in OSG low‐k films under ion bombardment. Plasma Processes and Polymers. 17(2). 5 indexed citations
11.
Lopaev, D. V., et al.. (2019). Ion composition of rf CCP in Ar/H 2 mixtures. Plasma Sources Science and Technology. 28(9). 95017–95017. 8 indexed citations
12.
Booth, Jean‐Paul, Olivier Guaitella, Cyril Drag, et al.. (2019). Oxygen (3P) atom recombination on a Pyrex surface in an O2 plasma. Plasma Sources Science and Technology. 28(5). 55005–55005. 50 indexed citations
13.
Прошина, О. В., Т. В. Рахимова, A. S. Kovalev, et al.. (2019). Experimental and PIC MCC study of electron cooling—re-heating and plasma density decay in low pressure rf ccp argon afterglow. Plasma Sources Science and Technology. 29(1). 15015–15015. 20 indexed citations
14.
Lopaev, D. V., et al.. (2019). Electron energy probability function in plasma controlled by high-energy run-away electrons. Plasma Sources Science and Technology. 29(2). 25026–25026. 6 indexed citations
15.
Zotovich, A I, Nigel P. Hacker, С. А. Климин, et al.. (2018). Low-k protection from F radicals and VUV photons using a multilayer pore grafting approach. Journal of Physics D Applied Physics. 51(32). 325202–325202. 7 indexed citations
16.
Lopaev, D. V., Yu. A. Mankelevich, Т. В. Рахимова, et al.. (2017). Damage and etching of ultra low-kmaterials in fluorocarbon plasma at lowered temperatures. Journal of Physics D Applied Physics. 50(48). 485202–485202. 7 indexed citations
17.
Lopaev, D. V., et al.. (2017). Photoabsorption and damage of OSG low‐k films by VUV emission at 140–160 nm. Plasma Processes and Polymers. 15(3). 8 indexed citations
18.
Рахимова, Т. В., A. T. Rakhimov, Yu. A. Mankelevich, et al.. (2013). Modification of organosilicate glasses low-k films under extreme and vacuum ultraviolet radiation. Applied Physics Letters. 102(11). 30 indexed citations
19.
Zyryanov, Sergey, A. S. Kovalev, D. V. Lopaev, et al.. (2011). Loss of hydrogen atoms in H2 plasma on the surfaces of materials used in EUV lithography. Plasma Physics Reports. 37(10). 881–889. 8 indexed citations
20.
Braginsky, O.V., A. S. Kovalev, D. V. Lopaev, et al.. (2010). The mechanism of low-k SiOCH film modification by oxygen atoms. Journal of Applied Physics. 108(7). 51 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Rankless by CCL
2026