James R. Von Ehr

506 total citations
11 papers, 377 citations indexed

About

James R. Von Ehr is a scholar working on Atomic and Molecular Physics, and Optics, Electrical and Electronic Engineering and Biomedical Engineering. According to data from OpenAlex, James R. Von Ehr has authored 11 papers receiving a total of 377 indexed citations (citations by other indexed papers that have themselves been cited), including 8 papers in Atomic and Molecular Physics, and Optics, 6 papers in Electrical and Electronic Engineering and 4 papers in Biomedical Engineering. Recurrent topics in James R. Von Ehr's work include Force Microscopy Techniques and Applications (5 papers), Surface and Thin Film Phenomena (3 papers) and Semiconductor materials and devices (3 papers). James R. Von Ehr is often cited by papers focused on Force Microscopy Techniques and Applications (5 papers), Surface and Thin Film Phenomena (3 papers) and Semiconductor materials and devices (3 papers). James R. Von Ehr collaborates with scholars based in United States and Singapore. James R. Von Ehr's co-authors include George D. Skidmore, Min-Feng Yu, Rodney S. Ruoff, Kevin D. Ausman, Mark J. Dyer, Henry W. Rohrs, John N. Randall, Joshua B. Ballard, James H. G. Owen and Haijun Xu and has published in prestigious journals such as Applied Physics Letters, Nanotechnology and Microelectronic Engineering.

In The Last Decade

James R. Von Ehr

10 papers receiving 348 citations

Peers

Countries citing papers authored by James R. Von Ehr

Since Specialization

Citations

This map shows the geographic impact of James R. Von Ehr's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by James R. Von Ehr with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites James R. Von Ehr more than expected).

Fields of papers citing papers by James R. Von Ehr

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by James R. Von Ehr. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by James R. Von Ehr. The network helps show where James R. Von Ehr may publish in the future.

Co-authorship network of co-authors of James R. Von Ehr

This figure shows the co-authorship network connecting the top 25 collaborators of James R. Von Ehr. A scholar is included among the top collaborators of James R. Von Ehr based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with James R. Von Ehr. James R. Von Ehr is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

Sort: Min cites: Since: Top N: Style:

11 of 11 papers shown

#	Work	Indexed citations
1	Digital atomic scale fabrication an inverse Moore's Law – A path to atomically precise manufacturing 2018 ·Micro and Nano Engineering ·John N. Randall, James H. G. Owen, (unknown), (unknown), James R. Von Ehr, Joshua B. Ballard, Erik Henriksen	20
2	Pattern transfer of hydrogen depassivation lithography patterns into silicon with atomically traceable placement and size control 2014 ·Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·Joshua B. Ballard, James H. G. Owen, William R. Owen, (unknown), (unknown), John N. Randall, James R. Von Ehr, Stephen McDonnell, Don D. Dick, Robert M. Wallace, Yves J. Chabal, (unknown), David L. Jaeger, Richard F. Reidy, Joseph Fu, (unknown), Kai Li, Richard M. Silver	18
3	Multimode hydrogen depassivation lithography: A method for optimizing atomically precise write times 2013 ·Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·Joshua B. Ballard, T. W. Sisson, James H. G. Owen, William R. Owen, (unknown), (unknown), John N. Randall, James R. Von Ehr	27
4	Automated Scanning Tunneling Microscope image analysis of Si (100):H 2×1 surfaces 2012 ·Microelectronic Engineering ·John N. Randall, James R. Von Ehr, Joshua B. Ballard, James H. G. Owen, (unknown)	6
5	Patterned atomic layer epitaxy of Si/Si(001):H 2011 ·Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·James H. G. Owen, Joshua B. Ballard, John N. Randall, (unknown), James R. Von Ehr	16
6	Using patterned H-resist for controlled three-dimensional growth of nanostructures 2011 ·Applied Physics Letters ·Kuan Eng Johnson Goh, (unknown), Haijun Xu, Joshua B. Ballard, John N. Randall, James R. Von Ehr	10
7	Atomic precision patterning on Si: An opportunity for a digitized process 2009 ·Microelectronic Engineering ·John N. Randall, Joshua B. Ballard, Joseph W. Lyding, Scott Schmucker, James R. Von Ehr, Rahul Saini, Haijun Xu, (unknown)	13
8	Atomic precision lithography on Si 2009 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·John N. Randall, Joseph W. Lyding, Scott Schmucker, James R. Von Ehr, Joshua B. Ballard, Rahul Saini, Haijun Xu, (unknown)	48
9	Theoretical Analysis of Diamond Mechanosynthesis. Part III. Positional C 2 Deposition on Diamond C(110) Surfac eUsin gSi/Ge/Sn-Base dDime rPlacemen tTools 2006 ·Jingping Peng, Robert A. Freitas, Ralph C. Merkle, James R. Von Ehr, John N. Randall, George D. Skidmore	2
10	Fabrication of high-density nanostructures with an atomic force microscope 2004 ·Applied Physics Letters ·Junfu Liu, James R. Von Ehr, (unknown), R. E. Stallcup, John N. Randall, (unknown)	14
11	Three-dimensional manipulation of carbon nanotubes under a scanning electron microscope 1999 ·Nanotechnology ·Min-Feng Yu, Mark J. Dyer, George D. Skidmore, Henry W. Rohrs, (unknown), Kevin D. Ausman, James R. Von Ehr, Rodney S. Ruoff	203

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact