J. Angilello

1.2k total citations
33 papers, 956 citations indexed

About

J. Angilello is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Materials Chemistry. According to data from OpenAlex, J. Angilello has authored 33 papers receiving a total of 956 indexed citations (citations by other indexed papers that have themselves been cited), including 17 papers in Electrical and Electronic Engineering, 14 papers in Atomic and Molecular Physics, and Optics and 12 papers in Materials Chemistry. Recurrent topics in J. Angilello's work include Semiconductor materials and interfaces (9 papers), Semiconductor materials and devices (8 papers) and Copper Interconnects and Reliability (7 papers). J. Angilello is often cited by papers focused on Semiconductor materials and interfaces (9 papers), Semiconductor materials and devices (8 papers) and Copper Interconnects and Reliability (7 papers). J. Angilello collaborates with scholars based in United States and Italy. J. Angilello's co-authors include E. A. Irene, E. Tierney, G. S. Cargill, K. L. Kavanagh, J. J. Cuomo, Joyce C. Liu, Chin‐An Chang, A. Segmüller, K. N. Tu and J. O. Olowolafe and has published in prestigious journals such as Science, Physical Review Letters and Applied Physics Letters.

In The Last Decade

J. Angilello

32 papers receiving 893 citations

Author Peers

Peers are selected by citation overlap in the author's most active subfields. citations · hero ref

Author Last Decade Papers Cites
J. Angilello 539 419 344 186 174 33 956
T. B. Light 472 0.9× 344 0.8× 449 1.3× 93 0.5× 104 0.6× 20 827
Johan Nijs 665 1.2× 437 1.0× 192 0.6× 141 0.8× 347 2.0× 67 1.1k
H. Norström 660 1.2× 277 0.7× 255 0.7× 94 0.5× 246 1.4× 69 857
J. W. Steeds 363 0.7× 702 1.7× 239 0.7× 105 0.6× 229 1.3× 49 1.1k
K. Y. Ahn 456 0.8× 317 0.8× 443 1.3× 398 2.1× 173 1.0× 67 1000
K. K. Shih 502 0.9× 358 0.9× 474 1.4× 67 0.4× 220 1.3× 39 850
C. D. Capio 465 0.9× 381 0.9× 286 0.8× 132 0.7× 93 0.5× 17 733
S. D. Ferris 544 1.0× 327 0.8× 270 0.8× 100 0.5× 110 0.6× 20 975
John L. Vossen 536 1.0× 364 0.9× 134 0.4× 116 0.6× 266 1.5× 18 823
Y. E. Strausser 691 1.3× 383 0.9× 367 1.1× 123 0.7× 152 0.9× 35 1.0k

Countries citing papers authored by J. Angilello

Since Specialization
Citations

This map shows the geographic impact of J. Angilello's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by J. Angilello with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites J. Angilello more than expected).

Fields of papers citing papers by J. Angilello

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by J. Angilello. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by J. Angilello. The network helps show where J. Angilello may publish in the future.

Co-authorship network of co-authors of J. Angilello

This figure shows the co-authorship network connecting the top 25 collaborators of J. Angilello. A scholar is included among the top collaborators of J. Angilello based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with J. Angilello. J. Angilello is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Goorsky, Mark S., Subramanian S. Iyer, K. Eberl, et al.. (1992). Thermal stability of Si1−xCx/Si strained layer superlattices. Applied Physics Letters. 60(22). 2758–2760. 43 indexed citations
2.
Plaskett, T. S., P. Fumagalli, T. R. McGuire, et al.. (1992). Preparation and some properties of sputtered Co/U-As multilayers. IEEE Transactions on Magnetics. 28(5). 2659–2661. 3 indexed citations
3.
Thompson, R. D. & J. Angilello. (1990). In-Situ Strain Measurement Via X-Ray Diffraction. MRS Proceedings. 208. 1 indexed citations
4.
Chang, Chin‐An, Joyce C. Liu, & J. Angilello. (1990). Epitaxy of (100) Cu on (100) Si by evaporation near room temperatures: In-plane epitaxial relation and channeling analysis. Applied Physics Letters. 57(21). 2239–2240. 53 indexed citations
5.
Giess, E. A., R. L. Sandstrom, W. J. Gallagher, et al.. (1990). Lanthanide gallate perovskite-type substrates for epitaxial, high-T c superconducting Ba 2 YCu 3 O 7-δ films. IBM Journal of Research and Development. 34(6). 916–926. 56 indexed citations
6.
Harwit, Alex, Paul Pukite, J. Angilello, & Subramanian S. Iyer. (1990). Properties of diamond structure SnGe films grown by molecular beam epitaxy. Thin Solid Films. 184(1-2). 395–401. 25 indexed citations
7.
Thompson, R. D., J. Angilello, & K. N. Tu. (1990). Crystallization kinetics of amorphous NiSix films. Thin Solid Films. 188(2). 259–265. 5 indexed citations
8.
Angilello, J., R. D. Thompson, & K. N. Tu. (1989). High-speed X-ray diffraction and in situ resistivity measurements at temperatures of 100 to 1000 K. Journal of Applied Crystallography. 22(6). 523–527. 3 indexed citations
9.
Cargill, G. S., J. Angilello, & K. L. Kavanagh. (1988). Lattice Compression from Conduction Electrons in Heavily Doped Si:As. Physical Review Letters. 61(15). 1748–1751. 101 indexed citations
10.
Souk, Jun H., Armin Segmüller, & J. Angilello. (1987). Oriented growth of ultrathin tungsten films on sapphire substrates. Journal of Applied Physics. 62(2). 509–512. 21 indexed citations
11.
Angilello, J., et al.. (1987). Stresses and radiation damage in Ar+ and Ti+ ion-implanted silicon. Journal of Applied Physics. 62(5). 1688–1693. 3 indexed citations
12.
Murakami, Masanori, et al.. (1983). Thermal stability of Pb-alloy Josephson junction electrode materials. VII. Concentration range of single ε-phase Pb-Bi films used in counterelectrodes. Journal of Applied Physics. 54(2). 738–742. 6 indexed citations
13.
Lahiri, S. K., et al.. (1982). Precise lattice parameter determination of PtHg4. Journal of Applied Crystallography. 15(1). 100–101. 8 indexed citations
14.
Angilello, J., J. E. E. Baglin, F. Cardone, et al.. (1981). Tantalum silicide films deposited by dc sputtering. Journal of Electronic Materials. 10(1). 59–93. 25 indexed citations
15.
Angilello, J., F. M. d’Heurle, S. Petersson, & A. Segmüller. (1980). Observations of stresses in thin films of palladium and platinum silicides on silicon. Journal of Vacuum Science and Technology. 17(1). 471–475. 32 indexed citations
16.
Shafer, M. W., et al.. (1979). Preparation and Characterization of Ruthenium Dioxide Crystals. Journal of The Electrochemical Society. 126(9). 1625–1628. 20 indexed citations
17.
d’Heurle, F. M., et al.. (1977). 2.22 The deposition by evaporation of CuAl alloy films. Vacuum. 27(4). 321–327. 15 indexed citations
18.
Angilello, J., R. M. Potemski, & G. R. Woolhouse. (1975). Etch pits and dislocations in {100} GaAs wafers. Journal of Applied Physics. 46(5). 2315–2316. 15 indexed citations
19.
Mäder, Sebastian, A. E. Blakeslee, & J. Angilello. (1974). The interpretation of dislocation contrast in x-ray topographs of GaAs1−x Px. Journal of Applied Physics. 45(11). 4730–4734. 33 indexed citations
20.
Reisman, Arnold, et al.. (1973). The epitaxial growth of ZnO on sapphire and MgAl spinel using the vapor phase reaction of Zn and H2O. Journal of Electronic Materials. 2(2). 177–189. 15 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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