John L. Vossen
- Electrical and Electronic Engineering top 10%
- Materials Chemistry top 10%
- Mechanics of Materials top 5%
- Biomedical Engineering
- Atomic and Molecular Physics, and Optics
- Co-authors
- M. H. FrancombeR. C. RossJ. A. AmickG.L. SchnableWerner KernJ. H. ThomasS.H. TalisaG. A. N. Connell
- Topics
- Semiconductor materials and devices (4 papers)Copper Interconnects and Reliability (3 papers)Optical Coatings and Gratings (3 papers)
- Partner nations
- United States
In The Last Decade
John L. Vossen
16 papers receiving 741 citations
Hit Papers
Peers
Comparison fields: 5 of 56
- Electrical and Electronic Engineering 536
- Materials Chemistry 364
- Mechanics of Materials 266
- Biomedical Engineering 135
- Atomic and Molecular Physics, and Optics 134
Countries citing papers authored by John L. Vossen
This map shows the geographic impact of John L. Vossen's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by John L. Vossen with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites John L. Vossen more than expected).
Fields of papers citing papers by John L. Vossen
This network shows the impact of papers produced by John L. Vossen. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by John L. Vossen. The network helps show where John L. Vossen may publish in the future.
Co-authorship network of co-authors of John L. Vossen
This figure shows the co-authorship network connecting the top 25 collaborators of John L. Vossen. A scholar is included among the top collaborators of John L. Vossen based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with John L. Vossen. John L. Vossen is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | Physics of Thin Films | 24 |
| 2 | Modeling of film deposition for microelectronic applications | 27 |
| 3 | Homojunction and quantum-well infrared detectors | 9 |
| 4 | Mechanic and dielectric properties | 6 |
| 5 | Thin films for emerging applications | 5 |
| 6 | Thin films for advanced electronic devices | 9 |
| 7 | 1 | |
| 8 | Contemporary preparative techniques | 13 |
| 9 | Physics of thin films. Volume 13 | 1 |
| 10 | 16 | |
| 11 | 22 | |
| 12 | 0 | |
| 13 | 0 | |
| 14 | 2 | |
| 15 | 12 | |
| 16 | Thin Film Processesbreakdown → | 654 |
| 17 | 21 | |
| 18 | 1 |
About John L. Vossen
John L. Vossen is a scholar working on Surfaces, Coatings and Films, History and Philosophy of Science and Electronic, Optical and Magnetic Materials, having authored 18 papers that have together received 823 indexed citations. Recurring topics across this work include Semiconductor materials and devices (4 papers), Copper Interconnects and Reliability (3 papers) and Optical Coatings and Gratings (3 papers). The work is most often cited by research in Mechanics of Materials (266 citations), Surfaces, Coatings and Films (66 citations) and Electrical and Electronic Engineering (536 citations). John L. Vossen has collaborated with scholars based in United States. Frequent co-authors include M. H. Francombe, R. C. Ross, J. A. Amick, G.L. Schnable, Werner Kern, J. H. Thomas, S.H. Talisa, G. A. N. Connell, P. R. Emtage and J.D. Adam. Their work appears in journals such as Applied Physics Letters, Physics Today and Journal of The Electrochemical Society.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.