Richard A. Lawson

717 citations

67 papers · 538 indexed · h-index 13

Co-authors: Clifford L. Henderson Laren M. Tolbert Peter J. Ludovice Andrew J. Peters David E. Noga Wang Yueh Todd R. Younkin Jing Cheng
Topics: Advancements in Photolithography Techniques (42 papers)Nanofabrication and Lithography Techniques (27 papers)Block Copolymer Self-Assembly (25 papers)
Cited by: Surfaces, Coatings and Films Electrical and Electronic Engineering Biomedical Engineering
Journals: Advanced Functional Materials Journal of The Electrochemical Society Nanotechnology
Partner nations: United States

In The Last Decade

Richard A. Lawson

67 papers receiving 528 citations

Peers

Countries citing papers authored by Richard A. Lawson

Since Specialization

Citations

This map shows the geographic impact of Richard A. Lawson's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Richard A. Lawson with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Richard A. Lawson more than expected).

Fields of papers citing papers by Richard A. Lawson

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Richard A. Lawson. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Richard A. Lawson. The network helps show where Richard A. Lawson may publish in the future.

Co-authorship network of co-authors of Richard A. Lawson

This figure shows the co-authorship network connecting the top 25 collaborators of Richard A. Lawson. A scholar is included among the top collaborators of Richard A. Lawson based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Richard A. Lawson. Richard A. Lawson is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Effect of chemoepitaxial guiding underlayer design on the pattern quality and shape of aligned lamellae for fabrication of line-space patterns 2015 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown),Andrew J. Peters,Richard A. Lawson,Peter J. Ludovice,Clifford L. Henderson	3
2	Simulation study of the effect of molar mass dispersity on domain interfacial roughness in lamellae forming block copolymers for directed self-assembly 2015 ·Nanotechnology ·Andrew J. Peters,Richard A. Lawson,(unknown),Peter J. Ludovice,Clifford L. Henderson	10
3	Effect of molecular resist structure on glass transition temperature and lithographic performance in epoxide functionalized negative tone resists 2015 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown),Richard A. Lawson,(unknown),(unknown),Mark Neisser,Laren M. Tolbert,Clifford L. Henderson	5
4	Optimizing performance in cross-linking negative-tone molecular resists 2015 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Richard A. Lawson,(unknown),(unknown),(unknown),Mark Neisser,Laren M. Tolbert,Clifford L. Henderson	4
5	Simulation study of the effect of differences in block energy and density on the self-assembly of block copolymers 2014 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Richard A. Lawson,Andrew J. Peters,(unknown),Peter J. Ludovice,Clifford L. Henderson	4
6	Predicting process windows for pattern density multiplication using block copolymer directed self-assembly in conjunction with chemoepitaxial guiding layers 2014 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown),Andrew J. Peters,Richard A. Lawson,Peter J. Ludovice,Clifford L. Henderson	1
7	Simulation study of the effect of differences in block energy and density on the self-assembly of block copolymers 2014 ·Journal of Micro/Nanolithography MEMS and MOEMS ·Richard A. Lawson,Andrew J. Peters,(unknown),Peter J. Ludovice,Clifford L. Henderson	10
8	Positive tone cross-linked resists based on photoacid inhibition of cross linking 2014 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Richard A. Lawson,(unknown),Mark Neisser,Laren M. Tolbert,Clifford L. Henderson	3
9	PS-b-PAA as a high χ polymer for directed self-assembly: a study of solvent and thermal annealing processes for PS-b-PAA 2013 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jing Cheng,Richard A. Lawson,(unknown),(unknown),Laren M. Tolbert,Clifford L. Henderson	2
10	PS-b-PHOST as a high χ block copolymers for directed self assembly: optimization of underlayer and solvent anneal processes 2013 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown),(unknown),Jing Cheng,Andrew J. Peters,Richard A. Lawson,Laren M. Tolbert,Clifford L. Henderson	2
11	Tuning domain size of block copolymers for directed self assembly using polymer blending: molecular dynamics simulation studies 2013 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Richard A. Lawson,Andrew J. Peters,Peter J. Ludovice,Clifford L. Henderson	7
12	Postiive tone resists based on network deploymerization of molecular resists 2013 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Richard A. Lawson,Jing Cheng,(unknown),Laren M. Tolbert,Clifford L. Henderson	1
13	Resist surface crosslinking using amine-based reactive rinses to mitagate pattern collapse in thin film lithography 2012 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown),Richard A. Lawson,Laren M. Tolbert,Clifford L. Henderson	1
14	Developing directly photodefinable substrate guiding layers for block copolymer directed self-assembly (DSA) patterning 2011 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jing Cheng,Richard A. Lawson,(unknown),Laren M. Tolbert,Clifford L. Henderson	7
15	Methods to explore and prevent pattern collapse in thin film lithography 2010 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·David E. Noga,(unknown),Richard A. Lawson,Laren M. Tolbert,Clifford L. Henderson	8
16	Single component molecular resists containing bound photoacid generator functionality 2009 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Richard A. Lawson,Laren M. Tolbert,Clifford L. Henderson	15
17	Water-developable negative-tone single-molecule resists: high-sensitivity nonchemically amplified resists 2008 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Richard A. Lawson,(unknown),Wang Yueh,Laren M. Tolbert,Clifford L. Henderson	8
18	Single molecule chemically amplified resists based on ionic and non-ionic PAGs 2008 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Richard A. Lawson,(unknown),Wang Yueh,Laren M. Tolbert,Clifford L. Henderson	17
19	Mesoscale simulation of molecular resists: The effect of PAG distribution homogeneity on LER 2008 ·Microelectronic Engineering ·Richard A. Lawson,Clifford L. Henderson	22
20	Influence of solubility switching mechanism on resist performance in molecular glass resists 2007 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Richard A. Lawson,(unknown),Clifford L. Henderson,(unknown),Laren M. Tolbert,Wang Yueh	18

About Richard A. Lawson

Richard A. Lawson is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering and Biomedical Engineering, having authored 67 papers that have together received 538 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (42 papers), Nanofabrication and Lithography Techniques (27 papers) and Block Copolymer Self-Assembly (25 papers). The work is most often cited by research in Surfaces, Coatings and Films (110 citations), Electrical and Electronic Engineering (344 citations) and Biomedical Engineering (245 citations). Richard A. Lawson has collaborated with scholars based in United States. Frequent co-authors include Clifford L. Henderson, Laren M. Tolbert, Peter J. Ludovice, Andrew J. Peters, David E. Noga, Wang Yueh, Todd R. Younkin, Jing Cheng, Mark Neisser and Hossein Sojoudi. Their work appears in journals such as Advanced Functional Materials, Journal of The Electrochemical Society and Nanotechnology.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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