H. Schellevis

1.1k citations
63 papers · 877 indexed · h-index 17

Impact in

    • Advancements in Semiconductor Devices and Circuit Design
    • Semiconductor materials and devices
    • 3D IC and TSV technologies
    • Radio Frequency Integrated Circuit Design
    • Silicon Carbide Semiconductor Technologies
    • Electronic Packaging and Soldering Technologies
    • Thermal properties of materials

Papers in

H. Schellevis

58 papers receiving 816 citations

Peers

H. Schellevis
Comparison fields: 5 of 50
  • Electrical and Electronic Engineering 623
  • Materials Chemistry 277
  • Bioengineering 33
  • Biomedical Engineering 256
  • Inorganic Chemistry 79
Replace Zhouling Wu with:
Zhouling Wu United States
Jörgen Olsson Sweden
Mikael Råsander Sweden
Sie‐Wook Jeon South Korea
Edmund P. Burte Germany
Frederik Edler Germany
Sang Jik Kwon South Korea
Takayuki Aoyama Japan
Tan Fu Lei Taiwan
H. Schellevis relative to Zhouling Wu United States Zhouling Wu's profile →
Citations per field
00.5×2.9×
Zhouling Wu · 1×
Citations per year

Countries citing papers authored by H. Schellevis

Since Specialization
Citations

This map shows the geographic impact of H. Schellevis's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by H. Schellevis with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites H. Schellevis more than expected).

Fields of papers citing papers by H. Schellevis

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by H. Schellevis. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by H. Schellevis. The network helps show where H. Schellevis may publish in the future.

Co-authors

The 25 scholars most cited alongside H. Schellevis, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with H. Schellevis Line = papers co-authored together H. Schellevis links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown
#Work
1 20130
2 201320
3
Contact resistance of low-temperature carbon nanotube vertical interconnects | NIST
20121
4 20113
5 20114
6 20109
7 20085
8 200827
9 20086
10 20083
11 20087
12 200722
13 20065
14 20068
15 200459
16 20034
17 200312
18 20031
19 20038
20 199796

About H. Schellevis

H. Schellevis is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics, Condensed Matter Physics, Biomedical Engineering and Electronic, Optical and Magnetic Materials, having authored 63 papers that have together received 877 indexed citations. Recurring topics across this work include 3D IC and TSV technologies (15 papers), Acoustic Wave Resonator Technologies (12 papers), Thin-Film Transistor Technologies (11 papers), Semiconductor materials and devices (10 papers), Radio Frequency Integrated Circuit Design (9 papers), Advancements in Semiconductor Devices and Circuit Design (9 papers), Semiconductor materials and interfaces (8 papers) and Mechanical and Optical Resonators (8 papers). The work is most often cited by research in Electrical and Electronic Engineering (623 citations), Materials Chemistry (277 citations), Bioengineering (33 citations), Biomedical Engineering (256 citations) and Inorganic Chemistry (79 citations). H. Schellevis has collaborated with scholars based in Netherlands, United States and Italy. Frequent co-authors include Lis K. Nanver, P.M. Sarro, N. Nenadović, J.W. Slotboom, Ryoichi Ishihara, Vincenzo d’Alessandro, L. La Spina, Freek Kapteijn, Jacob A. Moulijn and C.J.M. van Rijn. Their work appears in journals such as IEEE Electron Device Letters, IEEE Journal of Solid-State Circuits, Sensors and Actuators A Physical, IEEE Microwave and Wireless Components Letters and IEEE Transactions on Electron Devices.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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