C. Constantine

1.3k citations

67 papers · 1.0k indexed · h-index 17

Impact in

Condensed Matter Physics top 5%
- GaN-based semiconductor devices and materials
Electrical and Electronic Engineering top 5%
- Semiconductor materials and devices
- Plasma Diagnostics and Applications
- Advancements in Semiconductor Devices and Circuit Design

Papers in ⓘ

Electrical and Electronic Engineering 65
- Semiconductor materials and devices 53
- Plasma Diagnostics and Applications 27
- Advancements in Photolithography Techniques 14
- Advancements in Semiconductor Devices and Circuit Design 6
Condensed Matter Physics 16
- GaN-based semiconductor devices and materials 16

Co-authors: S. J. Pearton (42 shared papers)R. J. Shul (25 shared papers)C. Barratt (17 shared papers)C. R. Abernathy (22 shared papers)F. Ren (22 shared papers)G McClellan (6 shared papers)D. J. Rieger (4 shared papers)W. S. Hobson (13 shared papers)
Journals: Journal of The Electrochemical Society (6 papers)Solid-State Electronics (6 papers)Applied Physics Letters (5 papers)Electronics Letters (5 papers)Semiconductor Science and Technology (3 papers)
Partner nations: United States Germany

In The Last Decade

C. Constantine

61 papers receiving 966 citations

Peers

Countries citing papers authored by C. Constantine

Since Specialization

Citations

This map shows the geographic impact of C. Constantine's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by C. Constantine with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites C. Constantine more than expected).

Fields of papers citing papers by C. Constantine

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by C. Constantine. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by C. Constantine. The network helps show where C. Constantine may publish in the future.

Co-authors

The 25 scholars most cited alongside C. Constantine, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with C. Constantine Line = papers co-authored together C. Constantine links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

Showing the 20 most-cited of 67 papers — load more, or switch the sort, to bring in the rest.

#	Work
1	Inductively coupled plasma etching of GaN Applied Physics Letters ·R. J. Shul, G McClellan, S.A. Casalnuovo, D. J. Rieger, S. J. Pearton, C. Constantine, C. Barratt, R. F. Karlicek, Cao Vinh Tran, M. Schurman	1996	178
2	High-density plasma etching of compound semiconductors Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·R. J. Shul, G McClellan, R. D. Briggs, D. J. Rieger, S. J. Pearton, C. R. Abernathy, J. W. Lee, C. Constantine, C. Barratt	1997	93
3	Plasma etching of III–V semiconductors in CH4/H2/Ar electron cyclotron resonance discharges Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ·C. Constantine, D. Johnson, S. J. Pearton, U. K. Chakrabarti, A. B. Emerson, W. S. Hobson, A. P. Kinsella	1990	79
4	Dry etching of thin-film InN, AlN and GaN Semiconductor Science and Technology ·S. J. Pearton, C. R. Abernathy, F. Ren, J. R. Lothian, P. Wisk, A. Katz, C. Constantine	1993	48
5	Electron cyclotron resonance plasma etching of InP in CH4/H2/Ar Applied Physics Letters ·S. J. Pearton, U. K. Chakrabarti, A. P. Kinsella, D. Johnson, C. Constantine	1990	46
6	Comparison of dry etch techniques for GaN Electronics Letters ·R. J. Shul, G McClellan, S. J. Pearton, C. R. Abernathy, C. Constantine, C. Barratt	1996	45
7	Smooth, low-bias plasma etching of InP in microwave Cl2/CH4/H2 mixtures Applied Physics Letters ·C. Constantine, C. Barratt, S. J. Pearton, F. Ren, J. R. Lothian	1992	37
8	Chlorine-Based Plasma Etching of GaN MRS Proceedings ·R. J. Shul, R. D. Briggs, S. J. Pearton, C. B. Vartuli, C. R. Abernathy, J. W. Lee, C. Constantine, C. Barratt	1996	28
9	Comparison of inductively coupled plasma Cl2 and Cl4/H2 etching of III-nitrides Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Hyun Cho, C. B. Vartuli, S. M. Donovan, C. R. Abernathy, S. J. Pearton, R. J. Shul, C. Constantine	1998	28
10	Comparison of CH4/H2/Ar reactive ion etching and electron cyclotron resonance plasma etching of In-based III–V alloys Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·S. J. Pearton, U. K. Chakrabarti, A. Katz, A. P. Perley, W. S. Hobson, C. Constantine	1991	26
11	Microwave CI ₂ /H ₂ discharges for high rate etching of InP Electronics Letters ·C. Constantine, C. Barratt, S. J. Pearton, F. Ren, J. R. Lothian	1992	24
12	Anisotropic electron cyclotron resonance etchingof GaInP/AlGaInP heterostructures Electronics Letters ·R. J. Shul, R.P. Schneider, C. Constantine	1994	22
13	Etching of Ga-based III - V semiconductors in inductively coupled Ar and -based plasma chemistries Plasma Sources Science and Technology ·Jun‐Hyeop Lee, C. R. Abernathy, S. J. Pearton, C. Constantine, R. J. Shul, W. S. Hobson	1997	20
14	Inductively Coupled Plasma Etching of III‐V Nitrides in CH 4 / H 2 / Ar and CH 4 / H 2 / N 2 Chemistries Journal of The Electrochemical Society ·C. B. Vartuli, S. J. Pearton, J. W. Lee, J. D. MacKenzie, C. R. Abernathy, R. J. Shul, C. Constantine, C. Barratt	1997	18
15	CH4/H2/Ar/Cl2 electron cyclotron resonance plasma etching of via holes for InP-based microwave devices Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Rohit Khare, J.J. Brown, Meng Hu, D. Pierson, M.A. Melendes, C. Constantine	1994	18
16	Dry etching of via connections for InP power devices Electronics Letters ·C. Constantine, C. Barratt, S. J. Pearton, F. Ren, J. R. Lothian, W. S. Hobson, A. Katz, Ling Yang, P.C. Chao	1993	17
17	Dry etch damage in inductively coupled plasma exposed GaAs/AlGaAs heterojunction bipolar transistors Applied Physics Letters ·F. Ren, J. W. Lee, C. R. Abernathy, S. J. Pearton, C. Constantine, C. Barratt, R. J. Shul	1997	17
18	Etching of GaAs/AlGaAs rib waveguide structures using BCl3/Cl2/N2/Ar electron cyclotron resonance Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·C. Constantine, R. J. Shul, Charles T. Sullivan, M.B. Snipes, G McClellan, M. J. Hafich, Charles T. Fuller, Jeffrey Mileham, S. J. Pearton	1995	15
19	Effect of ECR plasma on the luminescence efficiency of InGaAs and InP Solid-State Electronics ·F. Ren, D. Noel Buckley, K.M. Lee, S. J. Pearton, R. A. Bartynski, C. Constantine, W. S. Hobson, R. A. Hamm, Peng Chao	1995	14
20	Optical emission end point detection for via hole etching in InP and GaAs power device structures Materials Science and Engineering B ·S. J. Pearton, F. Ren, C. R. Abernathy, C. Constantine	1994	14

About C. Constantine

C. Constantine is a scholar working on Electrical and Electronic Engineering, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Materials Chemistry and Surfaces, Coatings and Films, having authored 67 papers that have together received 1.0k indexed citations. Recurring topics across this work include Semiconductor materials and devices (53 papers), Plasma Diagnostics and Applications (27 papers), GaN-based semiconductor devices and materials (16 papers), Semiconductor Quantum Structures and Devices (15 papers), Advancements in Photolithography Techniques (14 papers), Advancements in Semiconductor Devices and Circuit Design (6 papers), Optical Coatings and Gratings (6 papers) and Copper Interconnects and Reliability (5 papers). The work is most often cited by research in Condensed Matter Physics (452 citations), Electrical and Electronic Engineering (880 citations), Surfaces, Coatings and Films (68 citations), Mechanics of Materials (212 citations) and Atomic and Molecular Physics, and Optics (224 citations). C. Constantine has collaborated with scholars based in United States and Germany. Frequent co-authors include S. J. Pearton, R. J. Shul, C. Barratt, C. R. Abernathy, F. Ren, G McClellan, D. J. Rieger, W. S. Hobson, D. Johnson and U. K. Chakrabarti. Their work appears in journals such as Journal of The Electrochemical Society, Solid-State Electronics, Applied Physics Letters, Electronics Letters and Semiconductor Science and Technology.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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